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A low-migration, oxygen-resistant photoinitiator, its preparation method and application

PendingCN122080261AEfficient light curingOvercome the oxygen inhibition effectIron saltsCarboxylic acid
This invention relates to the field of photopolymerization materials technology, and more particularly to a low-migration, oxygen-resistant photoinitiator, its preparation method, and applications, applicable to environmentally friendly coatings, 3D printing resins, and biomedical adhesives. The nano-photoinitiator of this invention is prepared from a trivalent iron salt compound and an organic ligand containing a carboxylic acid group; it generates initiating free radicals under ultraviolet and / or visible light irradiation, which are used to initiate the free radical polymerization reaction of unsaturated monomers. The system of this invention can still achieve rapid and complete curing in an air environment, significantly reducing or avoiding the oxygen inhibition effect commonly found in traditional free radical photocuring, and exhibits high stability; simultaneously, it has advantages such as wide availability of raw materials, low cost, easy aqueous phase conversion, and reduced potential irritation and migration risks, thus improving the system's biocompatibility and environmental friendliness.
Owner:QINGDAO UNIV OF SCI & TECH