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Photocurable polyetheretherketone oligomer and preparation method thereof

A polyetheretherketone and oligomer technology is applied in the field of photocurable polyetheretherketone oligomer and its preparation, and achieves the effects of simple method, easy molecular structure, and easy availability of raw materials

Active Publication Date: 2018-06-15
LANZHOU INST OF CHEM PHYSICS CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, there is no clear report on the photosensitive properties of polyetheretherketone. If polyether ether ketone is used as a high-performance photosensitive resin, it has the ability to cure quickly, but it is still a kind of polyetheretherketone in essence. The main molecular structure of polyether ether ketone exists in the resin system, but what needs to be solved is how to design and synthesize the main chain structure to prepare polymers with photosensitive properties, especially for UV absorption and curing molding

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0030] Add 21.82 g of difluorobenzophenone and 12.11 g of hydroquinone to 100 mL of N,N-dimethylacetamide and 30 mL of toluene at room temperature, stir for 1 hour, and add catalyst anhydrous carbonic acid after complete dissolution Potassium 13.81 g, then gradually heated up to 130°C for 5 hours for salt formation reaction, finally heated to 170°C for 10 hours, cooled to room temperature to obtain a viscous solution. Add a small amount of N,N-dimethylacetamide to dilute the viscous solution, then add the catalyst dibutyltin dilaurate 0.248g, stir well, add 3.1g isocyanoethyl methacrylate, react at 80°C for 6 hours, cool to room temperature, pour the reaction viscous liquid into 500 mL acetone to precipitate solid matter, filter and wash with 1L deionized water twice, then wash with 500 mL acetone and 500 mL deionized water mixture three times, at 55°C Vacuum drying to obtain photocurable polyetheretherketone oligomer PEEK-IEM.

Embodiment 2

[0032]At room temperature, add 96.69 g of 4,4-difluorotriphenyl ketone and 132.44 g of 4,4-dihydroxydiphenyl ether into 500 mL of N,N-dimethylacetamide and 150 mL of toluene, stir for 1 hour, and wait After completely dissolving, add 44.23g of catalyst anhydrous potassium carbonate, then gradually raise the temperature to 140°C for 5 hours of reaction, reflux the toluene to bring out water and aliquot the toluene for salt formation reaction, finally heat to 170°C for 5 hours, cool to room temperature, and get viscous solution. Add 150 mL of N,N-dimethylacetamide to dilute the viscous solution, then add 2.54 g of dibutyltin dilaurate as a catalyst, stir well, add 25.4 g of isocyanoethyl acrylate, react at 100 °C for 6 hours, and cool to At room temperature, pour the reaction viscous liquid into 1000 mL of acetone to precipitate solid matter, filter and wash with 2 L of deionized water twice, then wash with 500 mL of acetone and 1 L of deionized water for 3 times, at 55 °C Vacu...

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PUM

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Abstract

The invention discloses a photocurable polyetheretherketone oligomer. The photocurable polyetheretherketone oligomer has molecular weight of 1000 to 10000 and has a general structural formula shown inthe description. In the formula, n is greater than or equal to 1 and less than or equal to 10, R1 represents one or more of groups shown in the description, R2 represents one or more of groups shownin the description, R3 represents one or more of O and groups shown in the description and R4 represents one of H and CH3. The invention also discloses a preparation method of the photocurable polyetheretherketone oligomer. The preparation method improves the solubility of polyetheretherketone in an active diluent, realizes the unsaturation and molecular weight controllable preparation of the polyetheretherketone oligomer and solves the problems of dissolution difficulty and melting difficulty. Through use of the active double bond, the polyetheretherketone resin can be directly and fast curedand molded without the conventional high-temperature molding method.

Description

technical field [0001] The invention belongs to the field of high-performance photocurable resins, and relates to a photocurable polyether ether ketone oligomer and a preparation method thereof. The oligomer is used in the fields of fast-curing electrical insulation, aerospace parts manufacturing, automotive component manufacturing, and high-performance resins that can be rapidly molded to manufacture complex components. Background technique [0002] As the most important product of polyaryletherketone, polyether ether ketone has excellent comprehensive properties, such as high heat resistance, abrasion resistance, chemical corrosion resistance, and excellent electrical properties due to its special molecular structure. properties and excellent self-lubricating properties. Since the first successful research and development by Imperial Chemical Company in 1977, PEEK has developed into a variety of products including films, composite materials, foam plastics and plates after...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C08G8/02C08G8/30
CPCC08G8/02C08G8/30
Inventor 王晓龙郭玉雄张亮闫昌友马正峰周峰
Owner LANZHOU INST OF CHEM PHYSICS CHINESE ACAD OF SCI
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