Curing composition for nano-imprint lithography and pattern forming method using the same

A curable composition and nano-imprinting technology, applied in photosensitive materials for optomechanical equipment, optics, optomechanical equipment, etc., can solve substrate cracking, no etching process and stripping process, etchant and resist Deterioration of agent wettability and other problems

Inactive Publication Date: 2008-04-02
FUJIFILM CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In the coating method of spinning after dripping at the center, although good coating uniformity can be obtained, for example, when using a large substrate with an angle of 1 m, the anti-corrosion film that is shaken off during rotation (during rotation) is discarded. The amount of etchant is quite large, and in addition, the cracking of the substrate caused by high-speed rotation and the problem of ensuring the production tact time (tact time)
In addition, there is a problem that since the coating performance in the method of spinning after dripping at the center depends on the rotation speed during rotation and the coating amount of the resist, it should be further applied to the fifth-generation substrate that is being enlarged. , there is no general-purpose motor that can provide the required acceleration, and when such a motor is specially ordered, the component cost increases
[0036] However, the curable composition for nanoimprint lithography used in nanoimprint is technically Difficulty further increased
[0037] (4) When a hydrophobic resist film is used in order to improve the peelability with the mold, the wettability of the etching solution and the resist is further deteriorated, and

Method used

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  • Curing composition for nano-imprint lithography and pattern forming method using the same
  • Curing composition for nano-imprint lithography and pattern forming method using the same
  • Curing composition for nano-imprint lithography and pattern forming method using the same

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0410] As polymerizable unsaturated monomers, accurately weigh 19.496g of γ-butyrolactone acrylate monomer (R-01), 68.24g of tripropylene glycol diacrylate monomer (S-04), ethylene oxide modified three Methylolpropane triacrylate (S-05) 9.748g; As a photopolymerization initiator, precise name 2,4,6-trimethylbenzoyl-ethoxyphenyl-phosphine oxide (Lucirin TPO manufactured by BASF Corporation) -L) (P-1) 2.50g; as a surfactant, precisely called EFTOP EF-122A (fluorosurfactant, W-1) 0.02g, mixed at room temperature for 24 hours to prepare a uniform solution. The composition ratio of the polymerizable unsaturated monomer used here is shown in Table 1, and the compounding ratio of a composition is shown in Table 2.

[0411] This prepared composition was spin-coated on a 4-inch glass substrate with a thickness of 0.7 mm on which an aluminum (Al) coating film with a film thickness of 4000 angstroms was formed to a coating thickness of 5.0 μm. The coating base film that spin coating is ...

Embodiment 2

[0413] As a polymerizable unsaturated monomer, accurately weigh 38.97 g of α-acryloyloxy-β, β-dimethyl-γ-butyrolactone monomer (R-2) and neopentyl glycol hydroxytrimethylacetate Diacrylate monomer (S-2) 48.71g, propylene oxide modified trimethylolpropane triacrylate (S-6) 9.742g; as a photopolymerization initiator, it is called 2,4,6-trimethyl 2.5 g of benzoyl-ethoxyphenyl-phosphine oxide (Lucirin TPO-L manufactured by BASF Corporation) (P-1); Fluorosilicone-based surfactant, W-3), mixed at room temperature for 24 hours to prepare a homogeneous solution. This composition was exposed and patterned in the same manner as in Example 1, and the characteristics of the composition were examined. The results are shown in Table 3. From the results of Table 3, it can be seen that the composition of the present invention can comprehensively satisfy photocurability, adhesion, mold release, film residue, pattern shape, applicability (spin coatability, slit coatability) ), etching.

Embodiment 3～ Embodiment 27

[0415] In the same manner as in Example 1, the polymerizable unsaturated monomers shown in Table 1 were mixed at the ratios shown in Table 2 to prepare the compositions described in Table 2. This prepared composition was patterned in the same manner as in Example 1, and the characteristics of the composition were examined. The results are shown in Table 3. Any one of the compositions of Examples 3 to 27 can comprehensively satisfy photocurability, adhesiveness, release property, residual film property, pattern shape, applicability (spin coatability, slit coatability), Etching.

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Abstract

The invention provides a good combination which has the photocurablity, sealing property, mold release, residual film, pattern figure, coating properties and the etching adaptation. The invention adopts a curable combination used for nano impressing photoetching, which is characterized by comprising 88-99 mass% of polymerized unsaturated monomer, 0.1-11 mass% of photopolymerization initiator and at least one of a 0.001-5 mass% of surfactant containing fluorin, a siloxane surfactant and a fluorin-siloxane surfactant. The polymerized unsaturated monomer comprises one 1-functional group polymerized unsaturated monomer of not less than 10 mass%, wherein the 1-functional group polymerized unsaturated monomer has a portion containing the olefinic unsaturated bond and a portion containing at least a heteroatom.

Description

technical field [0001] The present invention relates to a curable composition for nanoimprint lithography and a pattern forming method using the same. Background technique [0002] The nanoimprint method is a technology that develops the embossing technology known in optical disc manufacturing, and presses a metal mold prototype (generally called a mold, master plate, template, etc.) formed with a concave-convex pattern onto a resist, Make it mechanically deform, and transfer the fine pattern precisely. Once the mold is made, nanostructures can be easily and repeatedly molded, so it is economical, and since it is a nanofabrication technology with less harmful waste and discharge, it is expected to be applied to various fields in recent years. [0003] In the nanoimprint method, there are two proposals: that is, the case of using thermoplastic resin as the material to be processed (S.Chou et al.: Appl.Phys.Lett Vol.67, 3114 (1995)) and the case of using nanoimprint Case of ...

Claims

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Application Information

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IPC IPC(8): G03F7/027G03F7/075G03F7/004G03F7/00
CPCC08F2/48C08F16/32C08F36/20C08F220/20C08G59/4246C08G65/18C09D171/02G03F7/0002G03F7/027
Inventor 高柳丘河边保雅
Owner FUJIFILM CORP
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