Resin monomer skeleton-derivative ketone compound photoinitiator
A technology of ketone compounds and resin monomers, applied in the field of photoinitiators, can solve problems such as reducing curing efficiency
Active Publication Date: 2011-01-12
SHENZHEN UV-CHEMTECH CO LTD
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The third is that in terms of reaction kinetics, such substances generate a large number of photoactive free radicals in a local area when they are illuminated. A considerable part of these high-concentration free radicals will quench each other instead of initiating system polymerization, thereby reducing the curing efficiency apparently.
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Abstract
The invention discloses resin monomer skeleton-derivative ketone compounds with the structural formula of I to IV, comprising aminoketone compounds, thioxanthone compounds, benzophenone compounds, hydroxyketone compounds and benzoinketal compounds. The compounds are jointly characterized by being converted from common resin monomer structure so as to obtain chemical structure compatible with resin. The compounds can be used as photoinitiator for the photopolymerization of olefin unsaturated compounds or mixture containing the olefin unsaturated compounds.
Description
【Technical field】 The invention relates to the technical field of photoinitiators, in particular to a class of ketone compounds derived from a resin monomer skeleton, their preparation method, and a photopolymerization initiator of an ethylenically unsaturated compound system containing such compounds as active ingredients. The ketone compounds include novel aminoketones, thioxanthones, benzophenones, hydroxyketones, and benzoin ketal compounds. 【Background technique】 Irgacure 907, benzophenone (BP), and Irgacure 651 are three widely used free radical polymerization photoinitiators, all of which belong to the backbone products of current commercially available photoinitiators. The former is often compared with the hydrogen abstraction photoinitiator sulfur The xanthone compound ITX is used in combination. One of the major problems common to their application is the release of volatile aldehydes causing unpleasant odors. For example, 907, because its structure contains sulf...
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IPC IPC(8): C07D295/108C07D295/135C07D251/30C07D335/16C07D409/14C07D303/27C07C323/52C07C49/84C07C69/16C07C69/40C07C69/75C07C323/12C08F2/48
Inventor 王智刚王衍超张永波赵新阳宋怀海
Owner SHENZHEN UV-CHEMTECH CO LTD
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