The invention provides a solar silicon wafer cleaning agent including 1 wt%-15 wt% of heterogeneous alcohol polyoxyethylene ether, 1 wt%-15 wt% of propanediol ether, 0.5 wt%-10 wt% of ethylene diamine tetraacetic acid tetrasodium salt, greater than zero and less than or equal to 10 wt% of an anionic surfactant, greater than zero and less than or equal to 20 wt% of a pH regulator, and the balance being water. The anionic surfactant and heterogeneous alcohol polyoxyethylene ether are adopted to compound, so that the cleaning agent has stronger cleaning ability; propanediol ether is selected as a solvent, and the kind of solvent is an organic solvent with low toxicity and no stimulation; meanwhile, ethylene diamine tetraacetic acid tetrasodium salt is also selected as a metal ion complexing agent, and copper, iron and other metal ions on the surface of a silicon wafer can be effectively removed; and finally, the pH regulator is selected to adjust the pH value of the cleaning agent, oil stains on the surface of the silicon wafer are effectively removed, and the cleaning effect is lasting and durable.