Solar silicon wafer cleaning agent

A technology of solar silicon wafers and cleaning agents, applied in detergent compounding agents, detergent compositions, organic cleaning compositions, etc., can solve the problems of odor stimulation, easy volatilization, and insufficient durability of cleaning agents, etc., and achieve biodegradable performance Excellent cleaning ability, long-lasting and durable, biodegradable performance, low toxicity and low stimulation effect

Active Publication Date: 2014-01-01
ZHEJIANG SHUNLIAN INTELLIGENT EQUIP CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The solvents of the above two cleaning agents are volatile organic solvents, which are more volatile when used at 60~70°C, causing certain odor irritation, and also make the performance of the cleaning agent not durable enough

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0039] 5wt% of secondary isomeric alcohol polyoxyethylene ether, 2.5wt% of fatty alcohol sulfate, 5wt% of propylene glycol methyl ether, 10wt% of sodium hydroxide, 0.5wt% of ethylenediaminetetraacetic acid tetrasodium salt and The remaining water is evenly mixed to obtain a solar silicon wafer cleaning agent. When cleaning solar silicon wafers, the cleaning agent and water are formulated into a solution with a mass ratio of 1:20, and placed in an ultrasonic cleaning tank at 55°C to clean the silicon wafers.

Embodiment 2

[0041] 7.5wt% of secondary isomeric alcohol polyoxyethylene ether, 2.5wt% of fatty alcohol polyoxyethylene ether sulfate, 5wt% of propylene glycol dimethyl ether, 10wt% of triethanolamine, 1wt% of ethylenediaminetetraacetic acid The tetrasodium salt and the remaining water are mixed uniformly to obtain a solar silicon wafer cleaning agent. When cleaning solar silicon wafers, the cleaning agent and water are formulated into a solution with a mass ratio of 1:40, and placed in an ultrasonic cleaning tank at 50°C to clean the silicon wafers.

Embodiment 3

[0043] 10wt% of secondary isomeric alcohol polyoxyethylene ether, 1wt% of fatty alcohol polyoxyethylene ether carboxylate, 10wt% of dipropylene glycol methyl ether, 10wt% of sodium silicate, 10wt% of sodium hydroxide, 3wt% % Ethylenediaminetetraacetic acid tetrasodium salt and the remaining water are mixed uniformly to obtain a solar silicon wafer cleaning agent. When cleaning solar silicon wafers, the cleaning agent and water are formulated into a solution with a mass ratio of 1:50, and placed in an ultrasonic cleaning tank at 60°C to clean the silicon wafers.

[0044] The cleaning agent prepared by the present invention is alkaline, the cleaning rate is above 99%, the surface of the silicon wafer after cleaning is clean, the color is consistent, and there is no variegation. Compared with the cleaning agent of the prior art, the cleaning agent of the present invention cleans the silicon wafer The number increased by 30%.

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PUM

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Abstract

The invention provides a solar silicon wafer cleaning agent including 1 wt%-15 wt% of heterogeneous alcohol polyoxyethylene ether, 1 wt%-15 wt% of propanediol ether, 0.5 wt%-10 wt% of ethylene diamine tetraacetic acid tetrasodium salt, greater than zero and less than or equal to 10 wt% of an anionic surfactant, greater than zero and less than or equal to 20 wt% of a pH regulator, and the balance being water. The anionic surfactant and heterogeneous alcohol polyoxyethylene ether are adopted to compound, so that the cleaning agent has stronger cleaning ability; propanediol ether is selected as a solvent, and the kind of solvent is an organic solvent with low toxicity and no stimulation; meanwhile, ethylene diamine tetraacetic acid tetrasodium salt is also selected as a metal ion complexing agent, and copper, iron and other metal ions on the surface of a silicon wafer can be effectively removed; and finally, the pH regulator is selected to adjust the pH value of the cleaning agent, oil stains on the surface of the silicon wafer are effectively removed, and the cleaning effect is lasting and durable.

Description

Technical field [0001] The invention relates to the technical field of cleaning agents for the electronics industry, in particular to a cleaning agent for solar silicon wafers. Background technique [0002] Solar energy is an inexhaustible new energy and renewable energy. The development and utilization of solar energy resources are extremely important for saving conventional energy, protecting the natural environment, promoting economic development and improving people's lives. Solar photovoltaic power generation has the advantages of unlimited resources, no pollution, direct conversion of sunlight into electrical energy, reliable operation and long life span. Therefore, solar photovoltaic power generation is the most promising field in the solar energy application industry. [0003] Solar silicon wafer is one of the main materials of solar photovoltaic power generation products-solar cells. In the production process of cutting silicon rods into silicon wafers, a large amount of...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C11D1/83C11D3/60C11D3/33C11D3/30C11D3/04C11D3/08
Inventor 支田田周君杨长剑
Owner ZHEJIANG SHUNLIAN INTELLIGENT EQUIP CO LTD
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