A photo
resist composition contains a
polymer resin, a first photo acid generator (PAG) requiring a first
dose of actinic energy to generate a first photo acid, and a photo base generator (PBG) requiring a second
dose of actinic energy, different from the first
dose, to generate a photo base. The amounts and types of components in the photo
resist are selected to produce a
hybrid resist image. Either the first photo acid or photo base acts as a catalyst for a
chemical transformation in the resist to induce a
solubility change. The other compound is formulated in
material type and loading in the resist such that it acts as a
quenching agent. The catalyst is formed at low doses to induce the
solubility change and the
quenching agent is formed at higher doses to counterbalance the presence of the catalyst. Accordingly, the same frequency doubling effect of conventional
hybrid resist compositions may be obtained, however, either a line or a space may be formed at the edge of an
aerial image. Feature size may also be influenced by incorporating a
quenching agent into the resist composition that does not require photo generation.