7 results about "Absorption contrast" patented technology

This invention belongs to the field of micro / nano fabrication and optical testing technology, specifically relating to a high-resolution test card for dielectric materials in the EUV and soft X-ray bands. The test card includes a substrate and a Siemens star test pattern formed thereon. The test card uses silsesquioxane (HSQ) as the structural material and is fabricated using electron beam lithography. The structural height can reach 500 nm with a minimum linewidth of 10 nm. This invention utilizes the dual absorption and strong phase modulation capabilities of HSQ in the EUV / soft X-ray bands, making it suitable for both absorption contrast and phase contrast imaging modes in system resolution calibration and performance evaluation. This test card offers advantages such as standardized patterns, high resolution, adjustable contrast, and good fabrication consistency, providing crucial metrological support for the performance testing of high-end EUV / soft X-ray optical imaging and lithography systems.

This invention provides a method for forming a modulator, comprising: providing a substrate; forming a dielectric layer on the surface of the substrate; forming multiple rows of spaced first trenches within the dielectric layer and the substrate, the first trenches being strip-shaped; sequentially forming an N++ germanium-silicon layer, an N+ germanium-silicon layer, a quantum well, a P+ germanium-silicon layer, and a P++ germanium-silicon layer within the first trenches, wherein the quantum well comprises at least three stacked combinations of germanium material layers and germanium-silicon material layers, in each combination, the germanium-silicon material layer being located on the surface of the germanium material layer; and forming second trenches within the dielectric layer and the substrate on both sides of each first trench along a second direction, the lengths of each second trench being different in the first direction. This invention improves the absorption contrast between modulators while reducing heat damage.

The present application belongs to the field of micro-nano processing and X-ray optical testing technology, and particularly relates to a high-resolution test card in hard X-ray band and a preparation method thereof. The test card adopts electron beam lithography combined with proximity effect correction technology to prepare an HSQ template pattern, forms a Siemens star structure with a minimum line width of 10 nm and a height of 500 nm, and then covers a metal working layer on the template surface through atomic layer deposition technology. The HSQ template pattern has a duty cycle less than 1, effectively improving the aspect ratio of the pattern. The covering of the metal working layer doubles the line density of the final pattern. The present application breaks through the resolution limit of the traditional test card, solves the problem of preparation of high-aspect-ratio nano structures, and has simple and reliable process, and is suitable for resolution calibration of absorption contrast and phase contrast imaging systems in hard X-ray band, thereby providing key technical support for performance evaluation of high-end X-ray optical systems.

In some embodiments, an X-ray system comprises a work-station and a mammography apparatus. The mammography apparatus can comprise: a breast positioning area; an absorption contrast imaging apparatus; and a diffractometer for analyzing structure of tissue within a breast. The absorption contrast imaging apparatus and the diffractometer can be configured to move in order to interchangeably align with the breast positioning area. The work-station can be configured to control the mammography apparatus, and to process data received from the mammography apparatus. In some embodiments, a method of controlling an X-ray system comprises: measuring the denseness of the breast tissue using an absorption contrast imaging apparatus; processing the absorption contrast imaging measurement results using the work-station to determine coordinates of potential cancer sites; performing measurements at the coordinates of the potential cancer sites using the diffractometer; and processing the diffractometer measurement results to perform diagnostics.

The invention relates to a method for characterizing the gender of the embryo of an egg (O) from the presence of an organ within the embryo of the egg, said method comprising steps of: Preparation of the egg, consisting of placing the egg (O) in a lying position on a support, the longitudinal axis (X) of the egg being parallel to said support on which it rests, Waiting the egg (O) thus positioned so that the embryo of the egg migrates towards the top of the egg, Mechanical agitation of the egg by rotation of the egg around its longitudinal axis (X), in order to optimize the positioning of said organ as close as possible to the shell, During the mechanical agitation step, emission through the egg, by a light source (E), of a light flux, and acquisition of several images of the egg, Analysis of the images of the egg (O) generated,the presence of said organ being revealed by absorption contrast between the constituent components of the egg (O) containing blood and said organ of the embryo containing melanin. Figure to be published with the abstract: Figure 3,

A method of controlling an X-ray system can include placing a breast of a patient into a breast compression assembly including a breast positioning area. Denseness of tissue of the breast is measured using an absorption contrast imaging apparatus, and the results are transmitted to a work-station. The absorption contrast imaging measurement results are processed using the work-station to determine coordinates of potential cancer sites in the tissue. The absorption contrast imaging apparatus is moved away from the breast positioning area, and a diffractometer is moved into the breast positioning. Measurements are performed at the coordinates of the potential cancer sites using a diffractometer, and the results are transmitted to the work-station. The obtained diffractometer measurement results are processed using the work-station to perform analysis of the diffractometer measurement results, and to perform diagnostics using the analyzed diffractometer measurement results.

The application discloses a gear defect recognition method and system based on deep learning, and relates to the technical field of optical detection of gear defects. The gear defect recognition method based on deep learning collects multispectral reflectance image data of a gear to be recognized, which is the reflectance value of each pixel in the multispectral reflectance image at multiple wave bands; and extracts an asymmetric absorption offset value and an absorption contrast value pixel by pixel, and performs adaptive confidence-guided filtering and curvature enhancement processing guided by a preset wave band to generate an enhanced spectral feature map; a pre-trained gear defect recognition network performs dynamic convolution and attention bias, outputs a gear defect map, and performs eccentric screening and evaluation processing. The application recognizes defects of the gear to be recognized through a gear defect evaluation value, so that gear grinding burns and surface contaminants such as oil stains and carbon black can be effectively distinguished, the false detection and missed detection rates are reduced, and the gear defect recognition precision is improved.