The invention relates to the field of
crystal preparation, in particular to a production device and a preparation method of
monocrystalline silicon, the
monocrystalline silicon and an
insulated gate bipolar transistor. The apparatus for producing
monocrystalline silicon comprises: a
crucible for placing and melting a
raw material; the heating module is arranged around the
crucible and comprises a fixed heater at the upper part and a movable heater at the lower part, and the movable heater moves along the lifting direction of the
crystal bar so as to accurately control the
crystal growth
temperature gradient and the
oxygen diffusion transmission mode at different stages of
crystal growth; and the
magnetic field module is used for applying an asymmetric hook-shaped
magnetic field in the
crystal growth process so as to inhibit
convection of raw materials in the
crucible, reduce the
oxygen concentration and improve the radial uniformity of
oxygen. According to the technical scheme, on the basis of 300mm N-type monocrystalline
silicon, under
low oxygen (lt; 5ppma), ROGlt; and on the basis of 10%, the target of low potential type defect density can also be achieved, so that the high-quality requirements, including ultralow
oxygen content, low defect density and the like, of an IGBT (Insulated Gate Bipolar Translator) on a
silicon single crystal substrate are met. The efficient preparation of the ultralow-oxygen N-type
silicon single crystal is realized by combining a heater with a novel structure with a CUSP
magnetic field technology and matching with crystal pulling process parameter optimization. According to the silicon
single crystal prepared by the method, the performance and the reliability of an IGBT (Insulated Gate Bipolar Translator) can be remarkably improved, the production cost is reduced, and the requirements of modern power electronic devices on high-performance silicon-based materials are met.