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114results about How to "Reduced shutdown current" patented technology

Semiconductor integrated circuit

To reduce power consumption of a semiconductor integrated circuit and to reduce delay of the operation in the semiconductor integrated circuit, a plurality of sequential circuits included in a storage circuit each include a transistor whose channel formation region is formed with an oxide semiconductor, and a capacitor whose one electrode is electrically connected to a node that is brought into a floating state when the transistor is turned off. By using an oxide semiconductor for the channel formation region of the transistor, the transistor with an extremely low off-state current (leakage current) can be realized. Thus, by turning off the transistor in a period during which power supply voltage is not supplied to the storage circuit, the potential in that period of the node to which one electrode of the capacitor is electrically connected can be kept constant or almost constant. Consequently, the above objects can be achieved.
Owner:SEMICON ENERGY LAB CO LTD

Stacked oxide material, semiconductor device, and method for manufacturing the semiconductor device

One embodiment is a method for manufacturing a stacked oxide material, including the steps of forming an oxide component over a base component; forming a first oxide crystal component which grows from a surface toward an inside of the oxide component by heat treatment, and leaving an amorphous component just above a surface of the base component; and stacking a second oxide crystal component over the first oxide crystal component. In particular, the first oxide crystal component and the second oxide crystal component have common c-axes. Same-axis (axial) growth in the case of homo-crystal growth or hetero-crystal growth is caused.
Owner:SEMICON ENERGY LAB CO LTD

Semiconductor device and display device including semiconductor device

ActiveUS20160343866A1Stable semiconductor characteristicSimple manufacturing processTransistorSolid-state devicesDisplay deviceSemiconductor
The reliability of a transistor including an oxide semiconductor can be improved by suppressing a change in electrical characteristics. A transistor included in a semiconductor device includes a first oxide semiconductor film over a first insulating film, a gate insulating film over the first oxide semiconductor film, a second oxide semiconductor film over the gate insulating film, and a second insulating film over the first oxide semiconductor film and the second oxide semiconductor film. The first oxide semiconductor film includes a channel region in contact with the gate insulating film, a source region in contact with the second insulating film, and a drain region in contact with the second insulating film. The second oxide semiconductor film has a higher carrier density than the first oxide semiconductor film.
Owner:SEMICON ENERGY LAB CO LTD

Stacked oxide material, semiconductor device, and method for manufacturing the semiconductor device

One embodiment is a method for manufacturing a stacked oxide material, including the steps of forming a first oxide component over a base component, causing crystal growth which proceeds from a surface toward an inside of the first oxide component by first heat treatment to form a first oxide crystal component at least partly in contact with the base component, forming a second oxide component over the first oxide crystal component; and causing crystal growth by second heat treatment using the first oxide crystal component as a seed to form a second oxide crystal component.
Owner:SEMICON ENERGY LAB CO LTD

Semiconductor integrated device

To reduce power consumption of a semiconductor integrated circuit and to reduce delay of the operation in the semiconductor integrated circuit, a plurality of sequential circuits included in a storage circuit each include a transistor whose channel formation region is formed with an oxide semiconductor, and a capacitor whose one electrode is electrically connected to a node that is brought into a floating state when the transistor is turned off. By using an oxide semiconductor for the channel formation region of the transistor, the transistor with an extremely low off-state current (leakage current) can be realized. Thus, by turning off the transistor in a period during which power supply voltage is not supplied to the storage circuit, the potential in that period of the node to which one electrode of the capacitor is electrically connected can be kept constant or almost constant. Consequently, the above objects can be achieved.
Owner:SEMICON ENERGY LAB CO LTD

Semiconductor device

ActiveUS20110122670A1Limitation number of operationEasily multivalued informationTransistorSemiconductor/solid-state device detailsHemt circuitsSemiconductor
An object of the present invention is to provide a semiconductor device combining transistors integrating on a same substrate transistors including an oxide semiconductor in their channel formation region and transistors including non-oxide semiconductor in their channel formation region. An application of the present invention is to realize substantially non-volatile semiconductor memories which do not require specific erasing operation and do not suffer from damages due to repeated writing operation. Furthermore, the semiconductor device is well adapted to store multivalued data. Manufacturing methods, application circuits and driving / reading methods are explained in details in the description.
Owner:SEMICON ENERGY LAB CO LTD

Memory device and semiconductor device

It is an object to provide a memory device whose power consumption can be suppressed and a semiconductor device including the memory device. As a switching element for holding electric charge accumulated in a transistor which functions as a memory element, a transistor including an oxide semiconductor film as an active layer is provided for each memory cell in the memory device. The transistor which is used as a memory element has a first gate electrode, a second gate electrode, a semiconductor film located between the first gate electrode and the second gate electrode, a first insulating film located between the first gate electrode and the semiconductor film, a second insulating film located between the second gate electrode and the semiconductor film, and a source electrode and a drain electrode in contact with the semiconductor film.
Owner:SEMICON ENERGY LAB CO LTD

Semiconductor device

ActiveUS8339828B2Limitation number of operationEasily multivalued informationTransistorSemiconductor/solid-state device detailsPower semiconductor deviceSemiconductor
An object of the present invention is to provide a semiconductor device combining transistors integrating on a same substrate transistors including an oxide semiconductor in their channel formation region and transistors including non-oxide semiconductor in their channel formation region. An application of the present invention is to realize substantially non-volatile semiconductor memories which do not require specific erasing operation and do not suffer from damages due to repeated writing operation. Furthermore, the semiconductor device is well adapted to store multivalued data. Manufacturing methods, application circuits and driving / reading methods are explained in details in the description.
Owner:SEMICON ENERGY LAB CO LTD

Semiconductor device and measurement device

A semiconductor device includes an oxide semiconductor layer over a first oxide layer; first source and drain electrodes over the oxide semiconductor layer; second source and drain electrodes over the first source and drain electrodes respectively; a second oxide layer over the first source and drain electrodes; a gate insulating layer over the second source and drain electrodes and the second oxide layer; and a gate electrode overlapping the oxide semiconductor layer with the gate insulating layer provided therebetween. The structure in which the oxide semiconductor layer is sandwiched by the oxide layers can suppress the entry of impurities into the oxide semiconductor layer. The structure in which the oxide semiconductor layer is contacting with the source and drain electrodes can prevent increasing resistance between the source and the drain comparing one in which an oxide semiconductor layer is electrically connected to source and drain electrodes through an oxide layer.
Owner:SEMICON ENERGY LAB CO LTD

Stacked oxide material, semiconductor device, and method for manufacturing the semiconductor device

One embodiment is a method for manufacturing a stacked oxide material, including the steps of forming an oxide component over a base component; forming a first oxide crystal component which grows from a surface toward an inside of the oxide component by heat treatment, and leaving an amorphous component just above a surface of the base component; and stacking a second oxide crystal component over the first oxide crystal component. In particular, the first oxide crystal component and the second oxide crystal component have common c-axes. Same-axis (axial) growth in the case of homo-crystal growth or hetero-crystal growth is caused.
Owner:SEMICON ENERGY LAB CO LTD

Semiconductor device

An n-channel transistor or a p-channel transistor provided with a second gate electrode for controlling a threshold voltage in addition to a normal gate electrode is used for a complementary logic circuit. In addition, an insulated gate field-effect transistor with an extremely low off-state current is used as a switching element to control the potential of the second gate electrode. A channel formation region of the transistor which functions as a switching element includes a semiconductor material whose band gap is wider than that of a silicon semiconductor and whose intrinsic carrier density is lower than that of silicon.
Owner:SEMICON ENERGY LAB CO LTD

Semiconductor device and method for manufacturing the same

To reduce defects in an oxide semiconductor film in a semiconductor device. To improve the electrical characteristics and the reliability of a semiconductor device including an oxide semiconductor film. In a semiconductor device including a transistor including a gate electrode formed over a substrate, a gate insulating film covering the gate electrode, a multilayer film overlapping with the gate electrode with the gate insulating film provided therebetween, and a pair of electrodes in contact with the multilayer film, a first oxide insulating film covering the transistor, and a second oxide insulating film formed over the first oxide insulating film, the multilayer film includes an oxide semiconductor film and an oxide film containing In or Ga, the first oxide insulating film is an oxide insulating film through which oxygen is permeated, and the second oxide insulating film is an oxide insulating film containing more oxygen than that in the stoichiometric composition.
Owner:SEMICON ENERGY LAB CO LTD

Semiconductor device and display device including the semiconductor device

The reliability of a transistor including an oxide semiconductor is improved. The transistor in a semiconductor device includes a first oxide semiconductor film over a first insulating film, a gate insulating film over the first oxide semiconductor film, a second oxide semiconductor film over the gate insulating film, and a second insulating film over the first oxide semiconductor film and the second oxide semiconductor film. The first oxide semiconductor film includes a channel region overlapping with the second oxide semiconductor film, a source region and a drain region each in contact with the second insulating film. The channel region includes a first layer and a second layer in contact with a top surface of the first layer and covering a side surface of the first layer in the channel width direction. The second oxide semiconductor film has a higher carrier density than the first oxide semiconductor film.
Owner:SEMICON ENERGY LAB CO LTD

Display device

To provide a novel display device without deterioration of display quality, the display device includes a display panel including a pixel portion that displays still images at a frame frequency of 30 Hz or less, a temperature sensing unit that senses the temperature of the display panel, a memory device that stores a correction table containing correction data, and a control circuit to which correction data selected from the correction table is input in accordance with an output of the temperature sensing unit. The pixel portion includes a plurality of pixels. Each of the pixels includes a transistor, a display element, and a capacitor. The control circuit outputs a voltage based on the correction data input to the control circuit, to the capacitor included in each of the pixels.
Owner:SEMICON ENERGY LAB CO LTD

Thin film transistor, display device having thin film transistor, and method for manufacturing the same

A thin film transistor with excellent electric characteristics, a display device having the thin film transistor, and a method for manufacturing the thin film transistor and the display device in a high yield are provided. In the thin film transistor, a gate electrode, a gate insulating film, crystal grains that mainly contain silicon and are provided for a surface of the gate insulating film, a semiconductor film that mainly contains germanium and covers the crystal grains and the gate insulating film, and a buffer layer in contact with the semiconductor film that mainly contains germanium overlap with one another. Further, the display device has the thin film transistor.
Owner:SEMICON ENERGY LAB CO LTD

Display device, semiconductor device, and driving method thereof

An object is to provide a semiconductor device with improved operation. The semiconductor device includes a first transistor, and a second transistor electrically connected to a gate of the first transistor. A first terminal of the first transistor is electrically connected to a first line. A second terminal of the first transistor is electrically connected to a second line. The gate of the first transistor is electrically connected to a first terminal or a second terminal of the second transistor.
Owner:SEMICON ENERGY LAB CO LTD

Semiconductor device and program

A semiconductor device having an eye-friendly display function is provided. When a display portion displays text, a difference between a gray level of the text and a gray level of a background of the text is reduced depending on a scrolling speed of a screen of the display portion. In other words, during fast scrolling, text visibility is lowered by bringing the gray level of the text closer to the gray level of the background. This can prevent a user from following the text with eyes at the time of fast scrolling, thereby eliminating unnecessary movement of eye muscles and reducing stimuli to the optic nerve. In this manner, eye strain can be reduced.
Owner:SEMICON ENERGY LAB CO LTD

Stacked oxide material, semiconductor device, and method for manufacturing the semiconductor device

One embodiment is a method for manufacturing a stacked oxide material, including the steps of forming a first oxide component over a base component, causing crystal growth which proceeds from a surface toward an inside of the first oxide component by first heat treatment to form a first oxide crystal component at least partly in contact with the base component, forming a second oxide component over the first oxide crystal component; and causing crystal growth by second heat treatment using the first oxide crystal component as a seed to form a second oxide crystal component.
Owner:SEMICON ENERGY LAB CO LTD

Display device and electronic device including the same

One embodiment of the present invention provides a highly reliably display device in which a high mobility is achieved in an oxide semiconductor. A first oxide component is formed over a base component. Crystal growth proceeds from a surface toward an inside of the first oxide component by a first heat treatment, so that a first oxide crystal component is formed in contact with at least part of the base component. A second oxide component is formed over the first oxide crystal component. Crystal growth is performed by a second heat treatment using the first oxide crystal component as a seed, so that a second oxide crystal component is formed. Thus, a stacked oxide material is formed. A transistor with a high mobility is formed using the stacked oxide material and a driver circuit is formed using the transistor.
Owner:SEMICON ENERGY LAB CO LTD

Display device

InactiveUS20140184484A1Reduce eye fatigueWithout deterioration of display qualityStatic indicating devicesNon-linear opticsDriver circuitDisplay device
To provide a novel display device where display quality does not deteriorate. The display device includes a display portion configured to display a still image at a frame frequency of 30 Hz or lower. The display portion includes a driver circuit, a plurality of wirings, and a pixel portion. The pixel portion comprises a plurality of pixels. Each of the plurality of pixels comprises a transistor, a display element, and a capacitor. A channel is formed in an oxide semiconductor layer included in the transistor. A gate of the transistor is electrically connected to one of the plurality of wirings. The driver circuit performs scanning where the plurality of wirings in one of odd-numbered rows and even-numbered rows are sequentially selected and scanning where the plurality of wirings in the other of the odd-numbered rows and the even-numbered rows are sequentially selected.
Owner:SEMICON ENERGY LAB CO LTD

Semiconductor device

ActiveUS20120012837A1Increase degree of integrationHighly integratedTransistorSolid-state devicesStorage cellMemory cell
A semiconductor device with a novel structure in which stored data can be retained even when power is not supplied, and does not have a limitation on the number of write cycles. The semiconductor device includes a memory cell including a first transistor, a second transistor, and an insulating layer placed between a source region or a drain region of the first transistor and a channel formation region of the second transistor. The first transistor and the second transistor are provided to at least partly overlap with each other. The insulating layer and a gate insulating layer of the second transistor satisfy the following formula: (ta / tb)×(εra / εrb)<0.1, where ta represents the thickness of the gate insulating layer, tb represents the thickness of the insulating layer, εra represents the dielectric constant of the gate insulating layer, and εrb represents the dielectric constant of the insulating layer.
Owner:SEMICON ENERGY LAB CO LTD

Nonaqueous secondary battery and separator

A secondary battery in which convection in an electrolyte solution occurs easily is provided. A secondary battery whose electrolyte solution can be replaced is provided. A nonaqueous secondary battery includes a positive electrode, a negative electrode, a separator, and an electrolyte solution, and the separator includes grooves capable of making convection in the electrolyte solution occur easily. The nonaqueous secondary battery has at least one expected installation direction, and the grooves in the separator are preferably formed so as to be perpendicular to an expected installation surface. The exterior body includes a first opening for injection of an inert gas into the exterior body and a second opening for expelling or injection of an electrolyte solution from or into the exterior body. An electrolyte solution replacement apparatus has a function of injecting the inert gas through the first opening and expelling or injecting the electrolyte solution through the second opening.
Owner:SEMICON ENERGY LAB CO LTD

Semiconductor Device

In a transistor including an oxide semiconductor, a change in electrical characteristics is suppressed and reliability is improved. The transistor includes an oxide semiconductor film over a first insulating film; a second insulating film over the oxide semiconductor film; a metal oxide film over the second insulating film; a gate electrode over the metal oxide film; and a third insulating film over the oxide semiconductor film and the gate electrode. The oxide semiconductor film includes a channel region overlapping with the gate electrode, a source region in contact with the third insulating film, and a drain region in contact with the third insulating film. The source region and the drain region contain one or more of hydrogen, boron, carbon, nitrogen, fluorine, phosphorus, sulfur, chlorine, titanium, and a rare gas.
Owner:SEMICON ENERGY LAB CO LTD

Display device and electronic device

A display device that performs image correction in accordance with external light environment is provided. The display device includes a host device and an optical sensor. In addition, the display device includes a processing circuit. The host device has a function of performing arithmetic processing using a neural network on software and a function of performing supervised learning with the neural network. The processing circuit has a function of performing arithmetic processing using a neural network on hardware. The optical sensor has a function of obtaining illuminance of external light. The obtained illuminance of external light is inputted to the host device, and a luminance and color tone preferred by users are regarded as teacher data, whereby learning is performed on the neural network of the host device. A weight coefficient obtained through the learning is used as a weight coefficient of the neural network of the processing circuit. By inputting illuminance of external light to the processing circuit, set values of luminance and color tone selected by the users are calculated in the neural network of the processing circuit.
Owner:SEMICON ENERGY LAB CO LTD

Semiconductor device and method for driving semiconductor device

A semiconductor device with a novel structure is provided, in which the operation voltage is reduced or the storage capacity is increased by reducing variation in the threshold voltages of memory cells after writing. The semiconductor device includes a plurality of memory cells each including a transistor including an oxide semiconductor and a transistor including a material other than an oxide semiconductor, a driver circuit that drives the plurality of memory cells, and a potential generating circuit that generates a plurality of potentials supplied to the driver circuit. The driver circuit includes a data buffer, a writing circuit that writes one potential of the plurality of potentials into each of the plurality of memory cells as data, a reading circuit that reads the data written into the memory cells, and a verifying circuit that verifies whether the read data agrees with data held in the data buffer or not.
Owner:SEMICON ENERGY LAB CO LTD

Thin film transistor and method of producing the same, display device, image sensor, x-ray sensor, and x-ray digital imaging device

A thin film transistor includes a gate electrode; a gate insulating film which contacts the gate electrode; an oxide semiconductor layer which includes a first region represented by In(a) Ga(b) Zn(c) O(d), wherein 0<a≦37 / 60, 3a / 7−3 / 14≦b≦91a / 74−17 / 40, b>0, 0<c<3 / 5, a+b+c=1, and d>0, and a second region represented by In(p) Ga(q) Zn(r) O(s), wherein q / (p+q)>0.250, p>0, q>0, r>0, and s>0, and located farther than the first region with respect to the gate electrode and which is arranged facing the gate electrode with the gate insulating film provided therebetween; and a source electrode and a drain electrode which are arranged so as to be apart from each other and are capable of being electrically conducted through the oxide semiconductor layer.
Owner:SAMSUNG DISPLAY CO LTD

Signal processing circuit

A signal processing circuit including a nonvolatile storage circuit with a novel structure. The signal processing circuit includes a circuit that is supplied with a power supply voltage and has a first node to which a first high power supply potential is applied, and a nonvolatile storage circuit for holding a potential of the first node. The nonvolatile storage circuit includes a transistor whose channel is formed in an oxide semiconductor layer, and a second node that is brought into a floating state when the transistor is turned off. A second high power supply potential or a ground potential is input to a gate of the transistor. When the power supply voltage is not supplied, the ground potential is input to the gate of the transistor and the transistor is kept off. The second high power supply potential is higher than the first high power supply potential.
Owner:SEMICON ENERGY LAB CO LTD

Semiconductor device

A semiconductor device with a novel structure in which stored data can be retained even when power is not supplied, and does not have a limitation on the number of write cycles. The semiconductor device includes a memory cell including a first transistor, a second transistor, and an insulating layer placed between a source region or a drain region of the first transistor and a channel formation region of the second transistor. The first transistor and the second transistor are provided to at least partly overlap with each other. The insulating layer and a gate insulating layer of the second transistor satisfy the following formula: (ta / tb)×(∈ra / ∈rb)<0.1, where ta represents the thickness of the gate insulating layer, tb represents the thickness of the insulating layer, ∈ra represents the dielectric constant of the gate insulating layer, and ∈rb represents the dielectric constant of the insulating layer.
Owner:SEMICON ENERGY LAB CO LTD
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