The invention discloses a
diffusion technology for preparing a Se battery by using an
etching process. According to the
diffusion technology, the gradient
diffusion temperature, the source flow and the
oxygen flow are adopted; and the diffusion technology specifically comprises the following steps of: a, putting a
silicon sheet into a diffusion furnace; b, rising the temperature to 840-850 DEG C, introducing
nitrogen and
oxygen from a carrying source, keeping the temperature, gradually reducing the flow of a diffusion source, adding the flow of the
oxygen and lasting the whole process for 10-30min; c, increasing the temperature to 860-870 DEG C, and keeping for 5-15min; and d, reducing the temperature and finishing the diffusion. By utilizing the diffusion technology for preparing the Se battery by using the
etching process, high enough
surface concentration and phosphorosilicate glass thickness are ensured with very good
phosphorus concentration distribution curves, and a very low emitter
saturation current and a very wide
process window are ensured for a later
etching method in etching a high sheet
resistor.