The invention relates to the technical field of integrated circuits, in particular to a
simulation test method and device for a
semiconductor device. The method comprises the following steps: acquiring
simulation parameter information of a first target device, wherein the
simulation parameter information of the first target device comprises a first nuclear blocking correction parameter value; performing a
simulation test based on the simulation parameter information of the first target device, and obtaining simulation transverse
ion doping concentration distribution and a simulation
threshold voltage value of the preset region; updating simulation parameter information of the first target device; performing a
simulation test based on the updated simulation parameter information of the first target device, and obtaining another simulation transverse
ion doping concentration distribution and another simulation
threshold voltage value of the preset area; and taking the simulation
threshold voltage value with the highest matching degree with the actual threshold
voltage value of the first target device in all the simulation threshold
voltage values as a target threshold
voltage value, and determining the simulation transverse
ion doping concentration distribution corresponding to the target threshold voltage value as target transverse
ion doping concentration distribution.