The present application relates to a kind of
ion implantation equipment and
solar cell manufacturing method.The
ion implantation is applied to
copper indium gallium selenide (CIGS) thin film preparation device, the preparation device includes process cavity, the process cavity is used to form CIGS thin film on substrate, the
ion implantation equipment includes: ion accommodating cavity, in the process cavity, the ion accommodating cavity includes release port, the release port is located below the substrate formed with CIGS thin film;
Ion generating component, in the ion accommodating cavity, for producing
alkali metal ions in the ion accommodating cavity;
Ion acceleration component, in the process cavity, for the
alkali metal ions generated by the ion generating component are accelerated, so that the
alkali metal ions are emitted from the release port, and are directed to the CIGS thin film.This technical solution can accurately control the distribution gradient and concentration of the required alkali
metal ions, obtain the perfect distribution of alkali
metal ion gradient, enhance the performance of CIGS thin film, save
energy consumption.