Method for making CIS film based on neutral pH condition double potential step electrodeposit
An electrodeposition, bipotential technology, applied in circuits, electrical components, semiconductor devices, etc., can solve problems such as limitations and difficulty in finding deposition potentials
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[0017] The embodiment of the present invention uses chemically pure raw materials. The composition of the electrodeposition solution of the specific embodiment is shown in Table 1, and the parameters of the bipotential step deposition are shown in Table 2.
[0018] Table 1
[0019]
No.
CuCl 2 (mM)
InCl 3 (mM)
SeO 2 (mM)
C 6 h 5 Na 3 o 7- 2H 2 O(mM)
pH
1
2.0
1.0
3.0
15
6.5
2
1.2
0.8
2.0
15
6.5
3
1.0
0.6
1.6
14
7.0
4
1.0
0.6
1.6
14
7.0
5
1.0
2.0
3.0
15
6.5
6
1.0
0.6
1.6
14
7.0
[0020] Table 2
[0021]
No.
Step potential point 1 / continuous
Time (mV / s)
Step potential point 2 / continuous
Time (mV / s)
Cycles
...
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