The invention relates to an alkali metal doping method for preparing a CIGS absorbing layer on a flexible substrate, and belongs to the technical field of copper indium gallium selenide (CIGS) thin film solar cells. The alkali metal doping method comprises that a CIGS absorbing layer is deposited by using a co-evaporation process; and with the increase of Cu content in the absorbing layer, the thin film growth experiences a copper-poor to copper-rich process, in the copper-rich process, when Cu(In+Ga)>1 in a CIGS thin film, the evaporation of the Cu element is stopped so that the slightly copper-rich CIGS thin film can finally become copper-poor, then the In and Ga atoms are evaporated until the deposition thickness is 1/10-3/10 of the thickness of the absorbing layer, in this process, an alkali metal compound is co-evaporated, the doping amount is 0.08-0.12% of the atomic ratio with respect to the CIGS thin film, the temperature of the substrate is reduced to the room temperature, and the CIGS thin film having a thickness of 1-3 <mu>m is obtained. The invention has the advantages of having a simplified process, a high production efficiency and thin film crystal high-quality, increasing the carrier concentration of the absorbing layer, lowering the resistivity, improving the electrical properties of the thin film cell, thus improving the photoelectric conversion efficiency of the CIGS thin film solar cell and the like.