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Silicate glass with high strain point and application thereof

A silicate glass, high-strain technology, applied in the field of glass, can solve the problems of low annealing point, easy deformation, large thermal shock of glass, etc., and achieve the effect of high hardness

Active Publication Date: 2012-10-10
HENAN ANCAI HI-TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0002] The glass substrate mainly has thermal performance requirements and chemical stability requirements. The material matrix of ordinary soda-lime-silica glass determines its low annealing point and low hardness. After heat treatment during coating, the glass undergoes the process of thermal expansion and contraction. The thermal shock of the glass is relatively large, and it is easy to deform

Method used

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Examples

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Embodiment Construction

[0020] The technical scheme of the present invention is described below with specific examples, but protection scope of the present invention is not limited thereto:

[0021] Tables 1 and 2 list the compositions of the glass oxides of Examples 1-10 (No. 1-10) and Comparative Examples 1 and 2 (No. 11 and No. 12).

[0022] The glass preparation process of each embodiment is as follows: Calculate the amount of raw materials (according to 500g glass batching) according to the composition of the oxide mass percentage in the table, accurately weigh, mix evenly, fill in a platinum-rhodium crucible in a high-temperature melting furnace, 1530 ° C Melt at high temperature for 6 hours, during the melting period, stir 3 times with a platinum rod, so that the glass can be melted evenly and clarified. The molten glass solution is poured into blocks, placed in a muffle furnace, and after annealing treatment within the main annealing temperature range of 650°C-590°C (cooling rate 1°C / min),...

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Abstract

The invention belongs to the technical field of glass, and in particular relates to silicate glass with high strain point and application thereof. According to mass percent of oxide, the silicate glass with the high strain point comprises the following components: 56-70 percent of SiO2, 4.0-12.0 percent of Al2O3, 4.0-12.0 percent of CaO, 2.0-7.0 percent of MgO, 0-5.0 percent of SrO, 0-5.0 percent of BaO, 3.0-14.0 percent of Na2O, 0-7.0 percent of K2O, 1.5-6.0 percent of ZrO2, 0-1.0 percent of TiO2 and 0-1.0 percent of CeO2. The glass with the stain point being over 560 DEG C is high in hardness, is suitable for a CIGS (Copper Indium Gallium Selenide) film battery substrate, and is suitable to be used as a cover plate glass of medium and high-grade touch screens after chemical tempering.

Description

technical field [0001] The invention belongs to the technical field of glass, in particular to a silicate glass with a high strain point and its application. Background technique [0002] The glass substrate mainly has thermal performance requirements and chemical stability requirements. The material matrix of ordinary soda-lime-silica glass determines its low annealing point and low hardness. After heat treatment during coating, the glass undergoes the process of thermal expansion and contraction. The thermal shock of glass is relatively large, and it is prone to deformation. Due to the continuous launch of new products that are increasingly environmentally friendly, energy-saving and thinner, and the ultra-thin glass substrate has the advantages of flexibility, light weight, transparency, and good insulation properties, the ultra-thin glass substrate has received more demand. As the requirements for touch screen cover glass are getting higher and higher, medium and high-e...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C03C3/095C03C3/087
Inventor 蔡志端苍利民阎韬胡海明江红心王丽会韩晓宇
Owner HENAN ANCAI HI-TECH
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