Copper indium gallium selenide (CIGS) three-dimensional nano structure array prepared by self-assembled electrodeposition-free mode based on solution method
A copper indium gallium selenide, three-dimensional nanotechnology, applied in the field of nanomaterials, can solve the problems of poor control of CIGS array morphology, high cost of electrodeposition, complicated template removal, etc., to achieve simple template removal and high growth speed , low cost effect
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Embodiment 1
[0030] This embodiment includes the following steps:
[0031] 1. Use CuCl 2 , InCl 3 , CaCl 3 , and H 2 SeO 2 Solution according to Cu 2+ : In 3+ : Ga 3+ : SeO 3 2 =1:3:4:2 molar ratio to prepare the original mixed solution.
[0032] 2. Stir the original mixed solution fully and evenly, adjust the pH value of the solution to 2.0 with NaOH solution, and obtain the growth solution of copper indium gallium selenide.
[0033] 3. Use the high-field phosphoric acid alumina template prepared by two-step anodization as the substrate, with a diameter of 20nm, sputter a layer of metal molybdenum by magnetron sputtering, and the background vacuum is 4×1.0 -4 Pa, the working pressure is 12Mtorr, the power is 30w, and the sputtering time is 4 minutes, so as to serve as the substrate for growing copper indium gallium selenide nano-arrays.
[0034] 4. At room temperature, put the substrate prepared in Step 3 into the CuInGaSe growth solution with a pH value of 2.0. Grow for 30 minu...
Embodiment 2
[0038] 1. Add CuCl 2 , InCl 3 , CaCl 3 , and H 2 SeO 2 Solution according to Cu 2+ : In 3+ : Ga 3+ : SeO 3 2 =1:2:4:2 molar ratio to prepare the original mixed solution.
[0039] 2. Stir the original mixed solution fully and evenly, adjust the pH value of the solution to 2.1 with NaOH solution, and obtain a growth solution of copper indium gallium selenide.
[0040] 3. Use the high-field phosphoric acid alumina template prepared by two-step anodization as the substrate, with a diameter of 250nm, sputter a layer of metal molybdenum by magnetron sputtering, and the background vacuum is 3×1.0 -4 Pa, the working pressure is 8mtorr, the power is 50w, and the sputtering time is 20 minutes, so as to serve as the substrate for growing CIGS nano-arrays.
[0041] 4. At room temperature, put the substrate prepared in step 3 into the CuInGaSe growth solution with a pH value of 2.1. Grow for 40 minutes. Then the grown samples were taken out, rinsed with deionized water and drie...
Embodiment 3
[0044] 1. Use CuCl 2 , InCl 3 , CaCl 3 , and H 2 SeO 2 Solution according to Cu 2+ : In 3+ : Ga 3+ : SeO 3 2 =1:3:4:3 molar ratio to prepare the original mixed solution.
[0045] 2. Stir the original mixed solution fully and evenly, adjust the pH value of the solution to 2.2 with NaOH solution, and obtain the growth solution of copper indium gallium selenide.
[0046] 3. Use the high-field phosphoric acid alumina template prepared by two-step anodization as the substrate, with a diameter of 190nm, sputter a layer of metal molybdenum by magnetron sputtering, and the background vacuum is 6×1.0 -4 Pa, the working pressure is 10mtorr, the power is 80w, and the sputtering time is 10 minutes, so as to serve as the substrate for growing CIGS nano-arrays.
[0047] 4. At room temperature, put the substrate prepared in step 3 into the CuInGaSe growth solution with a pH value of 2.2. Grow for 5 minutes. Then the grown samples were taken out, rinsed with deionized water and dr...
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