The invention discloses hydride vapour phase epitaxy (HVPE) equipment. The hydride vapour phase epitaxy equipment comprises a water-cooling stainless steel vacuum chamber, an insulating layer, a source heater, a substrate heater, a chamber thermal insulation device, an internal reaction chamber, a substrate tray, a rotating mechanism, an air jet hole, a metal boat, a sample inlet, a sample outlet and the like. Compared with conventional HVPE equipment, the HVPE equipment provided by the invention has the advantages that firstly, the water-cooling stainless steel chamber is used for replacing a conventional quartz chamber, and secondly, a built-in heater in the vacuum chamber is used for replacing a conventional external heater.