A
surface acoustic wave device has a duty that is greater than about 0.5, attenuation outside the pass band is increased, and an undesirable
spurious response is effectively suppressed. The
surface acoustic wave device includes an LiNbO3 substrate having
Euler angles (0°±5°, θ±5°, 0°±10°), an
electrode that is provided on the LiNbO3 substrate and that includes an IDT
electrode primarily made of Cu, a first
silicon oxide film that is provided in an area other than an area in which the
electrode is arranged so as to have a thickness substantially equal to that of the electrode, and a second
silicon oxide film that is arranged so as to cover the electrode and the first
silicon oxide film, wherein the
surface acoustic wave device utilizes an SH wave, wherein a duty D of the IDT electrode 3 is at least about 0.52, and θ of the
Euler angles (0°±5, θ+5°, 0°±10°) is set so as to fall within a range that satisfies the following Inequality (1A) or (1B):(1) When 0.52≦D≦0.6, −10×D+92.5−100×C≦θ≦37.5×D2−57.75×D+104.075+5710×C2−1105.7×C+45.729 Inequality (1A)(2) When D>0.6, 86.5−100×C≦θ≦37.5×D2−57.75×D+104.075+5710×C2−1105.7λC+45.729 Inequality (1B)where D is a duty, and C is a thickness of the IDT.