The application relates to an AlGaInP-based
transverse mode semiconductor laser and a preparation method thereof. The
laser comprises, from bottom to top, a GaAs substrate, a GaAs buffer layer, a Ga 0.5 In 0.5 P lower
transition layer, an Al 0.5 In 0.5 P lower confinement layer, an (Al 1‑x1 Ga x1 ) y1 In 1‑y1 P graded lower
waveguide layer, a Ga 1‑x2 In x2 P first
quantum well, an (Al 1‑x3 Ga x3 ) y2 In 1‑y2 P
barrier layer, a Ga 1‑x4 In x4 P second
quantum well, an (Al 1‑ x5 Ga x5 ) y3 In 1‑y3 P graded upper
waveguide layer, an Al 0.5 In 0.5 P first upper confinement layer, an Al 0.5 In 0.5 P second upper confinement layer, a Ga 0.5 In 0.5 P upper
transition layer and a GaAs cap layer. The AlGaInP-based
transverse mode semiconductor laser provided by the application increases the thickness of the Al 0.5 In 0.5 P first upper confinement layer, reduces the
doping concentration of the Al 0.5 In 0.5 P first upper confinement layer, realizes the reduction of the difference of transverse refractive indexes, stabilizes the basic
transverse mode and improves the kink power, and avoids the influence of current
diffusion on electrical parameters after the thickness of the Al 0.5 In 0.5 P first upper confinement layer is increased.