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303 results about "Molecular beam" patented technology

A molecular beam is produced by allowing a gas at higher pressure to expand through a small orifice into a chamber at lower pressure to form a beam of particles (atoms, free radicals, molecules or ions) moving at approximately equal velocities, with very few collisions between the particles. Molecular beam is useful for fabricating thin films in molecular beam epitaxy and artificial structures such as quantum wells, quantum wires, and quantum dots. Molecular beams have also been applied as crossed molecular beams. The molecules in the molecular beam can be manipulated by electrical fields and magnetic fields. Molecules can be decelerated in a Stark decelerator or in a Zeeman slower.

Pulsed flow modulation gas chromatography mass spectrometry with supersonic molecular beams method and apparatus

There is provided a pulsed flow modulation gas chromatograph mass spectrometer with supersonic molecular beams apparatus and method for improved sample analysis. The apparatus includes a gas chromatograph with an injector for the analysis of sample compounds, a first analytical column in the gas chromatograph, a sample storage, a gas pulse generator, a pressure generator, a conduit for transferring the sample compounds into a second analytical column having a different polarity than the polarity of the first analytical column, a second gas pulse generator, a transfer line for transferring the sample compounds into a supersonic nozzle, a member for adding a makeup gas to the output gas flow of the second analytical column before the supersonic nozzle, an element for reducing the flow rate of the added makeup gas, a supersonic nozzle for the expansion of the sample with the combined second analytical column and added makeup gas, a fly-through electron ionization ion source, a mass analyzer, an ion detector for the detection of the ions of the sample compounds after their mass analysis, a data processor and presenter, and a repeater for repeating the cycle of the first gas pulse of relatively high flow rate followed by the second gas pulse of intermediate flow rate.
Owner:AMIRAV AVIV

Platinum diselenide crystal material and preparation method thereof

The invention discloses a platinum diselenide crystal material and a preparation method thereof. The preparation method comprises the following steps: 1) under a vacuum environment, evaporating and depositing a proper amount of high purity selenium on a metal platinum substrate; and 2) carrying out an annealing treatment, so that selenium atoms covering the surface of the substrate and platinum atoms on the substrate interact to form a two-dimensional ordered crystalline state membrane structure in a sandwich arrangement of selenium-platinum-selenium so as to obtain the platinum diselenide crystal material. The inorganic two-dimensional crystalline state material is a new member of a transitional metal disulfide compound family, expands the field of research on non-carbon based two-dimensional crystal materials, and has a wide application potential in future information electronics and apparatus development and research. According to the method disclosed by the invention, the platinum diselenide two-dimensional crystalline state material with a big area and a high quality is grown on a molecular beam epitaxial method, so that the electronic properties of the platinum diselenide crystalline state material and related applications and development are favorably researched.
Owner:INST OF PHYSICS - CHINESE ACAD OF SCI

Three-mesa p-Pi-n structured III-nitride semiconductor avalanche photodetector and preparation method thereof

InactiveCN104282793AAvoid premature breakdownSolve the problem of reverse premature breakdownFinal product manufactureSemiconductor devicesPhotodetectorElectrode Contact
The invention relates to the technical field of detectors, in particular to a three-mesa p-Pi-n structured III-nitride semiconductor avalanche photodetector and a preparation method of the three-mesa p-Pi-n structured III-nitride semiconductor avalanche photodetector. The three-mesa p-Pi-n structured III-nitride semiconductor avalanche photodetector comprises a substrate, a buffer layer, an n-type doping nitride ohmic electrode contact layer, a Pi-type nitride active layer, a p-type doping nitride layer, a p-type heavy-doping nitride ohmic contact layer, n-type ohmic contact electrodes and a p-type ohmic contact electrode, wherein the buffer layer, the n-type doping nitride ohmic electrode contact layer, the Pi-type nitride active layer, the p-type doping nitride layer and the p-type heavy-doping nitride ohmic contact layer are sequentially grown on the substrate through epitaxial growth methods such as a molecular beam epitaxial method or an organometallic chemical vapor deposition epitaxial method; the n-type ohmic contact electrodes are manufactured on the n-type layer, and the p-type ohmic contact electrode is manufactured on the p-type layer. The three-mesa p-Pi-n structured III-nitride semiconductor avalanche photodetector can solve the problems that a traditional p-i-n structured device leaks a large number of currents and the edge of the traditional p-i-n structured device can be broken through easily in advance; moreover, a three-mesa structure conducts double-suppression protection on edge electric fields of a strong electric field region and a weak electric field region of a p-Pi-n structured device, so that the edge electric field is effectively prevented from being broken through in advance.
Owner:SUN YAT SEN UNIV

Manufacturing method of passivated InAs/GaSb secondary category superlattice infrared detector

The invention relates to a manufacturing method of a passivated InAs / GaSb secondary category superlattice infrared detector. The method comprises the following steps that: a metal organic chemical vapor deposition method or a molecular beam epitaxial method is employed to enable a buffer layer, a secondary superlattice layer, an intrinsic secondary superlattice light absorption layer, an N type secondary superlattice layer, and an N type ohmic contact layer to be successively grown on a substrate, so that an epitaxial wafer is formed; a wet etching method or a dry etching method is employed to carry out corrosion or etching on the epitaxial wafer; a spin coating machine is used to coat a resin material on the surface of the etched epitaxial wafer; exposure is carried out; medium baking and developing are carried out as well as an upper electrode and light entering window and lower electrode windows are formed on the resin material-coated epitaxial wafer; an electrode material is manufactured; photoetching is carried out on the electrode material to form upper electrodes and lower electrodes. According to the invention, a passivated infrared detector that is manufactured by the provided manufacturing method has low dark currents and ROA is increased; besides, the method has characteristics of simple manufacturing technology, strong passivation film strength and good passivation effect and the like.
Owner:INST OF SEMICONDUCTORS - CHINESE ACAD OF SCI

Method for preparing cuprous oxide film

The invention discloses a method for preparing a cuprous oxide film. The method comprises the following steps: step (1), selecting a monocrystal substrate and carrying out cleaning, and then introducing the cleaned monocrystal substrate into an ultrahigh vacuum film preparation system; step (2), carrying out heat treatment on the monocrystal substrate under the ultrahigh vacuum situation so as to remove surface impurities thereof; step (3), depositing a Cu film on the substrate surface processed in the step (2) under the condition that the air pressure is less than or equal to 10<-8>mbar, wherein the temperature of the substrate is in a range from 0 DEG C to 700 DEG C; step (4), carrying out oxidation treatment on the Cu film by utilizing radio frequency oxygen plasma; and step (5), carrying out annealing for 10 to 30 mins at the temperature of 600 to 900 DEG C and then reducing the temperature to a room temperature and taking the film out. According to the invention, growth of the Cu film with high quality is realized by utilizing an ultrahigh vacuum molecular beam epitaxial technology and a strong oxidizing property of an active oxygen atom. And the prepared Cu2O monocrystal film is expected to be applied in fields including a solar thin-film cell and an optoelectronic device and the like.
Owner:INST OF PHYSICS - CHINESE ACAD OF SCI

Fluorescent pool for atmosphere Hox free radical real-time measurement

The invention discloses a fluorescent pool for atmosphere Hox free radical real-time measurement. The fluorescent pool comprises a gas flow tube, a laser tube, and a fluorescence detection tube. A vacuum pump is used to extract the gas to be detected into the gas flow tube through a pinhole-shaped molecular beam splitter; an N2 shielding gas inlet is formed in the side of the gas inlet of the gas flow tube to ensure the sampling stability and low loss. 308 nm laser emitted and tuned by a laser is guided in the laser tube, and OH free radicals in the gas to be detected in the center of the fluorescent pool is excited to generate fluorescence; a plurality of diaphragms are mounted in the laser tube to reduce influence of laser stray light; a lens assembly and a reflector collect the excited fluorescent signals; the fluorescent signals pass through an optical filter and are detected through a photomultiplier; NO gas is introduced in the gas flow tube through an NO annular intake tube; the HO2 free radicals are converted to OH free radicals, and then the HO2 free radicals are compared and measured. The fluorescent pool can respectively measure the concentration of the OH free radicals and the HO2 free radicals, and can be applied to measurement and study of the concentration of HOx which is an important radical for the atmosphere oxidability.
Owner:ANHUI INST OF OPTICS & FINE MECHANICS - CHINESE ACAD OF SCI

Device for in-situ detection of catalytic reaction intermediate and product and detection method

The invention relates to a device for in-situ detection of catalytic reaction intermediates and products, including a tubular catalytic reactor, a catalytic reaction chamber pressure control system, a sampling cone, an ionization chamber, a mass analysis system, and a vacuum system; The catalytic reactor includes a catalytic reaction chamber and a hollow reaction tube, both of which communicate with each other; the sampling cone is in the shape of a hollow cone, coaxially arranged with the hollow reaction tube, and the cone mouth is aligned with the outlet of the hollow reaction tube; the sampling cone and the ionization The cavity is connected, and the ion focusing electrostatic lens of the mass analysis system is set in the ionization cavity; the molecular beam enters the ion focusing electrostatic lens through the sampling cone, and completes ionization under the action of the ionization source, and enters the mass In-situ detection in the analysis system; the catalytic reaction chamber pressure control system controls the pressure in the catalytic reaction chamber; the vacuum system pumps the pressure in the catalytic reaction chamber, ionization chamber, and mass spectrometer of the mass analysis system respectively. vacuum.
Owner:SHANGHAI JIAO TONG UNIV

Monolithically-integrated multi-functional ultraviolet/solar blind ultraviolet two-color detector and fabrication method thereof

The invention relates to an ultraviolet/solar blind ultraviolet two-color detector, in particular to a monolithically-integrated multi-functional ultraviolet/solar blind ultraviolet two-color detector and a fabrication method thereof. A layer of gallium oxide thin film is deposited on a silicon carbide substrate by a laser molecular beam epitaxial technology, and then a layer of titanium/gold thin film is deposited on the silicon carbide substrate and the gallium oxide thin film by a mask plate through a radio frequency magnetron sputtering technology to be used as an electrode. The monolithically-integrated multi-functional two-color ultraviolet detector fabricated according to the method has the advantages of reaction sensitivity, performance stability and low dark current, the functions of ultraviolet flame detection and ultraviolet intensity detection of a solar blind region can be separately achieved in different voltage modes, and the monolithically-integrated multi-functional two-color ultraviolet detector can be used for detecting fire alarm, high-voltage line corona and solar ultraviolet intensity; and moreover, the fabrication method has the characteristics of high process controllability, high universality, restorability of repeated tests and great application prospect, and is simple to operate.
Owner:东港智科产业园有限公司

Back shining type ZnO base ultraviolet imaging solid state focal plane detection array and its preparation

The invention relates to a backlight ZnO-based ultraviolet imaging solid focal plane surveying array and preparation, which on the sapphire (0001)substrate of double-face polishing, uses laser molecular beam to epitaxially grow a MgxZn1-xO(BexZn1-xO) nesa heavily doped with Al, then epitaxially growing a MgyZn1-yO layer without adulterant, sensitive to ultraviolet light. Then a MgzZn1-zO ohm contact epitaxial layer heavily doped with Al is gengerated on the upper surface. An array pixel cell structure is formed by using a photoetching and ICP ion etching method, then uses RF magnetron sputtering to plate a SiO2 passivation layer, based on the etched graph. An Al contact of electrodes etched by reactive ion uses a method of evaporation plated film to form a metallic contact, for rapid annealing activation of an ultraviolet sensitive active layer to form an ohm contact, thus getting a backlight ZnO-based ultraviolet imaging solid focal plane surveying array. The invention and the matched Si-CMOS readout circuit chip are interconnected through indium bumps, which are put on the focal plane of the ultraviolet lens, added with the corresponding image processing, memory circuit and software to form a complete ultraviolet imaging device.
Owner:XI AN JIAOTONG UNIV
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