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1701 results about "Ultraviolet detectors" patented technology

Preparation method of zinc-oxide nanorod array film

InactiveCN103397382AImprove UV Luminescence PerformanceHigh UV Luminescence PerformancePolycrystalline material growthAfter-treatment detailsNanogeneratorHexamethylenetetramine
The invention belongs to the technical field of semiconductor film preparation, and particularly relates to a preparation method of a zinc-oxide nanorod array film. The technical scheme adopted by the invention is as follows: the preparation method comprises the following steps of: (1) on the basis of adopting height (001)-oriented ZnO as a seed layer, putting the ZnO seed layer into an aqueous solution of zinc nitrate (Zn(NO3)2), polyethyleneimine (PEI) and hexamethylenetetramine (HMT) for epitaxial growth to obtain a (001) preferred-orientation ultralong ZnO nanorod array film; (2) carrying out fast annealing treatment on the film, and improving the photoluminescence performance of the ZnO array film. The technology has the advantages that the continuous growth of the ZnO nanorod at the temperature higher than 100 DEG C can be realized; due to the high-temperature growth condition, the crystallization quality of the nanorod is improved, the internal defects are obviously reduced; the zinc-oxide nanorod array film has excellent photoelectric performance, and is more conductive to being applied in photoelectric devices such as dye-sensitized solar batteries, ultraviolet detectors, field-effect transistors, light-emitting diodes and nanogenerators.
Owner:UNIV OF JINAN

Method for preparing titanium dioxide ultraviolet photoelectric detector

The invention discloses a method for preparing a titanium dioxide ultraviolet photoelectric detector, relates to a semiconductor photoelectric detection device, and provides a titanium dioxide ultraviolet photoelectric detector with low dark current and a preparation method thereof. The detector has a metal-semiconductor-metal structure, and comprises an insulating substrate, a polycrystal TiO2 film deposited on the insulating substrate by using magnetron sputtering technology and an interdigital metal electrode prepared on the TiO2 film by using magnetron sputtering or electron beam evaporation technology from the bottom to the top. The high-quality polycrystal TiO2 film is deposited by adopting optimized sputtering process parameters, and the deposited film has ideal chemical proportion and high compactness and crystallinity. The MSM structural ultraviolet detector prepared by using the film as a matrix has the advantages of high response degree, low dark current, high ultraviolet visible suppression ratio and the like. The preparation method has simple process and low cost; if the detector is manufactured on a Si-based substrate, the method can be compatible with the mature Si process; and the method is favorable for photoelectric integration and easy for industrialization.
Owner:XIAMEN UNIV

Ultraviolet photoelectric microsensor device for monitoring water quality on line and monitoring method

The invention discloses an ultraviolet photoelectric microsensor device used for monitoring water quality on line, which comprises an ultraviolet light source, an ultraviolet detector, a data acquisition and transmission module, a bracket and a seal cover. A water flow sample to be monitored is placed between the ultraviolet light source and the ultraviolet detector, wherein the ultraviolet light source and the ultraviolet detector are fixed on the bracket, two ends of the ultraviolet light source are connected with a power supply through a lead, and two ends of the ultraviolet detector are connected with the data acquisition and transmission module through a lead. The ultraviolet photoelectric microsenser device is characterized in that the ultraviolet light source, the ultraviolet detector and the stand are encapsulated in the seal cover, the ultraviolet detector comprises a GaN based Schottky type ultraviolet detector, and a response window of the ultraviolet detector corresponds to the center wavelength of an LED; and the ultraviolet light source consists of 3-7 ultraviolet LEDs with the wavelength covering a region ranging from 200nm to 400nm. The device has small volume and low power consumption, can timely and accurately monitor the change conditions of environmental pollution indexes (such as TOC (Total Organic Carbon), COD (Chemical Oxygen Demand) and the like), and has wide application prospect.
Owner:NANJING UNIV

Silicon-based ultraviolet photoelectric detector based on graphene and fabrication method of silicon-based ultraviolet photoelectric detector

The invention discloses a silicon-based ultraviolet photoelectric detector based on graphene. The silicon-based ultraviolet photoelectric detector comprises an epitaxial silicon substrate, an isolation layer, a silicon window, a top electrode and a graphene thin film which are sequentially laminated, and the epitaxial silicon substrate is provided with a heavily-doped layer and a light-doped layer. The fabrication method comprises the following steps of sequentially planting the isolation layer and the top electrode on the epitaxial silicon substrate after the epitaxial silicon substrate is fabricated, etching the silicon window, and moving the graphene thin film in the silicon window and the top electrode for complete fabrication. An ultra-shallow junction design formed by a graphene/silicon structure is used for improving ultraviolet wave band response; the surface recombination is reduced by epitaxial growth of a thin silicon light-doped structure on an upper surface of the heavily-doped bottom layer, the ultraviolet response is effectively improved, the visible light response is suppressed, and the spectral selectivity detection is achieved; and with the adoption of the high-conductivity graphene thin film, extra ultraviolet light is absorbed, and the ultraviolet sensitivity and the response speed can be improved and are approximate to or even exceed a theoretical performance limit of a traditional silicon-based ultraviolet detector.
Owner:杭州紫元科技有限公司

Ultraviolet focal plane readout circuit and method based on pixel level analog-to-digital conversion

The invention discloses an ultraviolet focal plane readout circuit and method based on pixel level analog-to-digital conversion. The ultraviolet focal plane readout circuit comprises a front end electric charge integrator, a pixel level analog-to-digital conversion module, a row/column selecting control circuit, an induction amplifier and an output level buffering device, wherein the front end electric charge integrator is used for integrating a weak photo-generated current of an ultraviolet detector so as to convert the current into a voltage; the pixel level analog-to-digital conversion module can quantitatively simulate the voltage in a pixel, and a quantitative result can be latched; each unit on a focal plane can be selected by the row/column selecting control circuit; the induction amplifier inducts and amplifies the quantitative result in the pixel and sends the amplified quantitative result into an output bus; the output level buffering device is used for increasing output driving capacity of a circuit, and output signals are sequentially output in a serial mode. According to the readout circuit, signals of the ultraviolet detector are directly converted into digital signals, interference of noise to the signals is reduced by reducing a simulation signal transmission path, on-chip analog-to-digital conversion is achieved, the signal to noise ratio of an ultraviolet focal plane chip is effectively improved, and the readout circuit can be applied to detection and imaging of the weak ultraviolet signals.
Owner:SHANGHAI INST OF TECHNICAL PHYSICS - CHINESE ACAD OF SCI

Ultraviolet detector manufacturing method

The invention belongs to the technical field of photoelectric detection, and particularly discloses an ultraviolet detector manufacturing method which is achieved by gradient assembly of multi-size zinc oxide quantum dots in multiple layers of graphene. According to the ultraviolet detector manufacturing method, structure and performance advantages of the ZnO quantum dots and the graphene are combined, and collochemistry is adopted as the basic method to obtain the ZnO quantum dots with different sizes, and the band gaps of the ZnO quantum dots vary from the near ultraviolet area to the deep ultraviolet area; wet chemistry is adopted to prepare single-layer oxidized graphene, carboxyl functional group modification is then carried out on the surface of the single-layer oxidized graphene so that ZnO quantum dots with a single size can be suitable for being assembled on the surface of the single-layer oxidized graphene, and then the ZnO quantum dots (QD) with different sizes are used as active materials of ultraviolet response to construct a multi-layer sandwich type structure. According to the ultraviolet detector manufacturing method, gold, or platinum or ITO is used as electrode materials, a horizontal distribution type strip-shaped or itnerdigital electrode structure is designed, and then an ultraviolet detector is obtained and inter-band absorption response from near ultraviolet to deep ultraviolet is achieved.
Owner:JIANGSU UNIV

Ultraviolet detector and preparation method thereof

The invention discloses an ultraviolet detector. A gallium oxide / zinc oxide based core shell nano-rod structure layer is arranged between a quartz substrate and a transparent contact electrode of the detector, wherein the contact electrode is an ITO conductive thin film which is deposited on a glass substrate and is provided with a 0.2cm channel; the gallium oxide / zinc oxide based core shell nano-rod structure layer is composed of a ZnO nano-array seed layer and a beta-Ga2O3 layer which grows on the surface of the ZnO nano-array seed layer, the beta-Ga2O3 layer is composed of a nano beta-Ga2O3 crystal with a spherical shape, and the average size of the nano beta-Ga2O3 crystal is 30nm. The core shell nano-rod structure layer can be used for preparing a beta-Ga2O3 / ZnO core shell nano-rod structure through the steps of taking the ZnO nano-array as a carrier, adopting gallium nitrate and hexamethylenetetramine as materials, firstly growing a GaOOH precursor on the surface of ZnO by using a low-temperature water solution, and then implementing high-temperature heating. The preparation method disclosed by the invention is simple in process and low in reaction temperature; and in addition, prepared products have very good photoresponse to the ultraviolet light.
Owner:DALIAN NATIONALITIES UNIVERSITY

Semiconductor device and manufacturing method thereof

The invention provides a semiconductor device, comprising a substrate, a gate electrode on the substrate, a gate insulating layer on the gate electrode, an amorphous oxide semiconductor on the gate insulating layer and source and drain metal electrodes on the amorphous oxide semiconductor at two sides of the gate electrode, and the basic structure is a TFT ultraviolet detector. The semiconductor is an amorphous oxide semiconductor with a broad bang [band] gap (>3.0eV), and the material component can be a ZnO semiconductor doped with In, specifically comprising InGaZnO, InZanO, HfInZnO, TaInZnO, ZrInZnO, YInZnO, AlInZnO and SnInZnO; wherein the atomic counting ratio of [In] to a sum of [In] and [a third metal] is from 35% to 80%, and the atomic counting ratio of [Zn] to a sum of [In] and [Zn] is from 40% to 85%. Preferable atomic counting ratio of elements is that the ratio of [In], [the third metal], [Zn], and [O] is 1:1:1:1 or 1:1:1:2 or 2:2:2:1, or 1:1:1:4, etc. In addition, the semiconductor can be of a material such as In2O3, ZTO, ITO, ZnO, SnOx in an amorphous state. The TFT ultraviolet detector based on the invention has advantages of high efficiency, low cost and evenness for a large area due to the adoption of the amorphous oxide semiconductor.
Owner:INST OF MICROELECTRONICS CHINESE ACAD OF SCI

Ultraviolet photo-detector with nano heterogeneous composite structure and preparation method thereof

The invention discloses an ultraviolet photo-detector structure based on a TiO2/ZnO nano heterogeneous composite structure. The bottommost layer of the ultraviolet photo-detector structure is made of a substrate material, inter-digital electrodes are arranged on the bottommost layer; the bottommost layer is covered by a ZnO thin film; ZnO nanorods are arranged on the thin film; and the surfaces of the nanoroads are of TiO2 nanostructures. The invention also discloses a preparation method of the ultraviolet photo-detector. The preparation method comprises the following steps: (1) plating metal electrodes on the substrate thin sheet to form the inter-digital electrodes; (2) plating the ZnO thin film; (3) synthesizing a ZnO nanorod array; and (5) forming the TiO2 nanostructures on the surfaces of the ZnO nanorods. According to the ultraviolet photo-detector, the TiO2 nanostructures are introduced while ultrahigh current gain of the ZnO ultraviolet detector is kept, the influence of a ZnO surface oxygen cavity trap state can be eliminated by forming a heterogeneous junction, meanwhile, carrier separation is quickened and composition is reduced, the sensitivity and the photocurrent gain of the detector are certainly and obviously improved, and in addition, the chemical stability of the detector is obviously improved because of wrapping of TiO2.
Owner:HUAZHONG UNIV OF SCI & TECH
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