Amorphous Ga2O3 solar-blind ultraviolet detector and preparation method and application thereof
An ultraviolet detector and detector technology, applied in semiconductor devices, final product manufacturing, sustainable manufacturing/processing, etc., can solve the problems of optical band gap change, poor structural repeatability, high cost, and achieve improved response speed, excellent Stable, stable performance
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Embodiment 1
[0039] This embodiment is used to illustrate the amorphous Ga of the present invention 2 o 3 Fabrication process of solar-blind UV detector. figure 1 The amorphous Ga of this embodiment 2 o 3 Schematic diagram of the structure of a solar-blind ultraviolet detector. Such as figure 1 As shown, the detector includes a deep ultraviolet ultrapure quartz substrate 1 , a gallium oxide thin film active layer 2 and an indium tin oxide interdigitated electrode 3 from bottom to top.
[0040] The specific preparation method of the sun-blind ultraviolet detector of the present embodiment is as follows:
[0041] 1) A 25mm×25mm×0.5mm far-ultraviolet ultrapure quartz substrate was ultrasonically cleaned, dried with dry high-purity nitrogen, and placed on a sample holder of the same size. After fixing the substrate, put it into the magnetron sputtering chamber equipped with a gallium oxide ceramic target (purity: 99.999%), raise the sample stage to the highest point (the distance between...
Embodiment 2
[0050] Prepare amorphous Ga of the present invention according to the method substantially identical with embodiment 1 2 o 3 The solar-blind ultraviolet detector, the difference is that in step 2), after the back vacuum is lowered to less than 5E-5Pa, 0.112 sccm of high-purity oxygen is introduced, and the vacuum in the cavity reaches 1.0E-3Pa. After stabilization, wait for 10 minutes, and when the oxygen flow rate and the vacuum in the chamber are stable, 10 sccm of high-purity argon gas is introduced, and the vacuum in the chamber reaches 1.6E-1Pa, and the Ga 2 o 3 film.
Embodiment 3
[0052] Prepare amorphous Ga of the present invention according to the method substantially identical with embodiment 1 2 o 3 The sun-blind ultraviolet detector, the difference is that in step 2) after the back vacuum is lowered to less than 5E-5Pa, 0.126 sccm of high-purity oxygen is introduced, and the vacuum in the cavity reaches 1.2E-3Pa. After stabilization, wait for 10 minutes. If the oxygen flow rate and the vacuum in the chamber are stable, then 10 sccm of high-purity argon gas is introduced, and the vacuum in the chamber reaches 1.6E-1Pa. Start sputtering Ga 2 o 3 film.
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