Preparation method of zinc-oxide nanorod array film
A technology of zinc oxide nanorods and nanorod arrays, which is applied in the field of preparation of zinc oxide nanorod array thin films, and can solve the problems of not being able to meet the performance requirements of ZnO nanorod array thin film devices, failing to obtain high crystallization quality, and poor crystallization quality , to achieve the effect of improving photoluminescence performance, excellent photoelectric performance, and improving crystal quality
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Embodiment 1
[0058] (1) Preparation of seed layer precursor solution: Dissolve equimolar amounts of zinc acetate and ethanolamine 0.3 M in sequence in ethanol, stir well, seal and homogenize for more than 4 h;
[0059] (2) Cleaning of the deposited substrate: The ITO conductive glass was ultrasonically cleaned with a 1:1:1 solution of ethanol:isopropanol:acetone for 30 min, then ultrasonically cleaned with deionized water for 10 min and dried.
[0060] (3) Spin coating ZnO precursor solution: transfer the deposition substrate to a homogenizer, add the precursor solution prepared in step (1) dropwise, and spin at 6000 rpm for 30 s after uniform dispersion.
[0061] (4) Evaporation of solvent: Transfer the spin-coated substrate to a hot plate, and evaporate the solvent or pyrolyze it at 180-300°C for more than 5 min.
[0062] (5) Crystallization of the ZnO seed layer thin film: Transfer to a rapid annealing furnace, 300-800 ℃ rapid heat treatment for 30-60min, to obtain a solid ZnO seed laye...
Embodiment 2
[0069] The preparation method and test are the same as in Example 1, but the programmed heating process is changed, as Figure 7 Schematic diagram of step heating. Figure 8 is in equimolar amount of Zn(NO 3 ) 2 ·6H 2 O and hexamethylenetetramine at a concentration of 0.15 mol L -1 , add 60 mmol·L -1 Polyethylenimine growth solution, using Figure 7 According to the step heating process, the FESEM image of the cross-section of the obtained ZnO nanorod array film was grown under the condition of 80-150 ℃ step heating for 16 h. The ZnO nanorods prepared by this method have a diameter of 50-150 nm and a length of about 50 μm. It shows that the length of ZnO nanorods will decrease if the temperature rises too fast.
[0070] The photoluminescent performance of the ZnO nanorods obtained by this method is the same as that of the ZnO nanorods array thin film obtained by step heating in Example 1, which has good high intrinsic emission.
Embodiment 3
[0072] Preparation method and test are identical with embodiment 1, but the concentration of growth solution is 3 times of embodiment 1, the Zn(NO 3 ) 2 ·6H 2 O and hexamethylenetetramine at a concentration of 0.15 mol L -1 , add 60 mmol·L -1 Polyethyleneimine as epitaxial growth regulator of ZnO nanorods. Figure 9 The FESEM diagram of the cross-section of the ZnO array film prepared by this method shows that the diameter of the ZnO nanorods is 100-250 nm and the length is about 150 μm, indicating that increasing the concentration is beneficial to the increase of the length of the ZnO nanorods, but the diameter of the ZnO nanorods also increases .
[0073] The photoluminescent performance of the ZnO nanorods obtained by this method is the same as that of the ZnO nanorods array thin film obtained by step heating in Example 1, which has good high intrinsic emission.
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