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43 results about "Solvent vapor" patented technology

Process for the solvent separation and recovery of a vinyl lubricating oil base

ActiveCN117903835BHydrocarbon distillationSolvent vaporOrganic solvent
The application discloses a solvent separation and recovery process of a vinyl lubricating oil base oil, and comprises the following steps: step S1, obtaining organic solvent vapor and crude oil by removing the reaction liquid from a dissolving unit; step S2, obtaining refined solvent by refining the organic solvent vapor in a solvent rectification unit; step S3, obtaining tail gas condensate and tail gas non-condensable gas by condensing tail gas containing solvent vapor in a tail gas condensation recovery unit; and step S4, passing the tail gas non-condensable gas through a tail gas adsorption unit. The application mainly solves the problems of poor separation effect of reaction products, low product quality and inability to reach an industrial scale in the prior art.
Owner:CHINA PETROLEUM & CHEMICAL CORP +1

A pre-steam degreasing pipeline system

ActiveCN224486935USolvent vaporThermodynamics
The utility model discloses a kind of pre-vapor degreasing pipeline systems. A kind of pre-vapor degreasing pipeline system, including a working cavity, including vacuum pipeline, first pneumatic valve, drying condenser, second pneumatic valve and vacuum pump group are successively installed on vacuum pipeline from immediately adjacent working cavity side;It further includes the distillation tank for heating to produce solvent vapor, heater is installed at the bottom of distillation tank, distillation tank is docked working cavity by steam delivery pipeline, third pneumatic butterfly valve is installed on steam delivery pipeline;The bottom of working cavity is connected by a recovery pipeline with distillation tank, fourth pneumatic butterfly valve, circulating pump and fifth pneumatic valve are successively installed on recovery pipeline from working cavity to distillation tank.The utility model passes through pre-vapor degreasing pipeline system, high-temperature solvent vapor is sprayed to the surface of workpiece in working cavity, and then improve the cleaning effect to workpiece.The grease on workpiece after high-temperature solvent vapor treatment is stored in distillation tank by recovery pipeline.
Owner:ECOCLEAN MASCH (SHANGHAI) CO LTD

A continuous production apparatus for a hydrogen fuel cell gas diffusion layer

ActiveCN121641991BCell electrodesSolvent vaporThermodynamics
The present application relates to hydrogen fuel cell preparation equipment technical field, specifically relates to a kind of continuous preparation equipment of hydrogen fuel cell gas diffusion layer. Including unwinding roller and winding roller, coating area, drying zone and sintering zone are provided between the unwinding roller and winding roller, the coating area is equipped with coating unit, including coating die and air jet die, the air jet die is located downstream of the coating die along the substrate conveying direction, negative pressure suction groove is arranged between the coating die and the air jet die, the coating die and air jet die are respectively connected with pitch angle adjusting mechanism, the both sides of the coating die and the air jet die are equipped with lateral baffle along substrate width direction.This application constructs efficient and cooperative coating and flattening system by non-contact coating die, reverse flattening air jet die and intermediate negative pressure suction groove, removes excess air flow and solvent vapor in real time, and effectively inhibits slurry and air flow transverse diffusion through lateral baffle on both sides of coating.
Owner:XIE HYDROGEN (SHANGHAI) NEW ENERGY TECH CO LTD

Paint surface drying equipment

PendingCN121467285APretreated surfacesCoatingsTemperature controlSolvent vapor
The invention discloses paint surface drying equipment, which belongs to the field of paint surface drying equipment and is characterized in that a basic platform is constructed by an equipment bracket and a conveying belt, a drying area is isolated by a sealing cover, and accurate positioning and partitioned heating of a workpiece are realized by a built-in positioning cover structure. The drying spray pipe structure realizes'air supply-air exhaust 'alternate dynamic airflow circulation through a plurality of groups of independent pipelines, and solvent steam and moisture volatilized by a paint film are effectively taken away by combining the two-way airflow switching design of a heat preservation air pipe and a branch pipeline and the airflow guiding design of a horn-shaped air outlet, so that water vapor accumulation is avoided; and the arc dome of the positioning cover is integrated with a temperature-adjustable heating lamp tube, and is matched with a heat preservation layer and an intelligent temperature control system, so that the surface temperature of the paint film is accurately matched and uniformly heated. According to the equipment, the defects of paint film water spots, sagging and surface and interior dryness are thoroughly eliminated through a sectional type dynamic moisture removal and precise temperature control technical system, and the hardness and weather resistance of a paint film are improved.
Owner:ANQING YICHANG AUTO PARTS CO LTD +1

Polymerization solution singling system and method for singling polymerization solution

The application belongs to the technical field of spinning dope production, and discloses a polymerization liquid monomer removal system and a polymerization liquid monomer removal method. The polymerization liquid monomer removal system comprises a monomer removal tower, a reboiler, and a discharge port. The polymerization liquid enters the top of the monomer removal tower. The reboiler is in communication with the lower region of the monomer removal tower and transports solvent vapor into the monomer removal tower. The solvent vapor contacts the polymerization liquid to separate monomers in the polymerization liquid. The bottom of the reboiler has a discharge port. During the monomer removal process, liquid solvent continuously enters the reboiler, and the material at the bottom of the reboiler is continuously discharged through the discharge port. In the application, the material at the bottom of the reboiler is continuously discharged through the discharge port during the monomer removal process, which can timely discharge the precipitated impurities, ensure the purity of the solvent vapor, and further avoid the impurities entering the monomer removal tower with the vapor to affect the quality of the polymerization liquid.
Owner:JILIN TANGU CARBON FIBER CO LTD +1

Vacuum drying oven capable of recycling solvent

The utility model provides a vacuum drying oven capable of recovering a solvent, which is used for effectively recovering the evaporated solvent in the vacuum drying oven and comprises a vacuum drying oven body, a vacuum box cover, a vacuum box cover and a vacuum box cover, an air inlet and an air outlet of the condenser are formed in the lower end and the upper end respectively, and the air inlet is connected with the extraction opening of the vacuum drying box body; an air inlet of the vacuum pump is connected with an air outlet of the condenser; according to the vacuum drying box, the solvent outlet is formed in the bottom of the vacuum drying box body, so that the situation that solvent steam flows back to the bottom of the box body to be accumulated in the rising process after being evaporated out of materials can be avoided; the solvent evaporated in the vacuum drying box body is effectively recycled, waste of the solvent and corrosion of equipment are avoided, and the production cost is reduced.
Owner:SHANDONG GUYUCHUN BIOTECHNOLOGY CO LTD +1

Method for growing p-msb molecular crystal thin film based on solvent vapor assisted growth with controllable layer number

PendingCN122327349ASolvent vaporFilm base
This invention relates to organic functional thin films, specifically to a method for growing controllable number of layers using solvent vapor-assisted growth. p A method for preparing MSB molecular crystal thin films, and the application of these films in generating superoxide ions under light irradiation for antibacterial protection. This method addresses the limitations of existing solution drop casting epitaxy methods for preparing... p To address the problems of uncontrollable layer number, limited area, and insufficient reactive oxygen generation efficiency in MSB molecular crystal thin films, this invention utilizes toluene vapor atmospheres of varying concentrations to control the solvent evaporation rate, thereby achieving... p The few-layer, large-area, and uniform growth of MSB molecular crystal thin films allows for the regulation of molecular arrangement and electronic structure, promoting electron localization and efficient electron transfer to oxygen molecules under illumination, thus significantly improving the generation efficiency and stability of superoxide ions.
Owner:OPLUXCARE (WUHAN) TECHNOLOGY CO LTD

Wafer supporting structure for baking

ActiveCN224098106USolvent vaporWafer
The utility model relates to the technical field of semiconductor manufacturing, in particular to a wafer supporting structure for baking. The utility model provides a wafer supporting structure for baking, which can enable the side end supporting assembly and the middle supporting assembly to alternately support the lower surface of a wafer through a mode of arranging the side end supporting assembly, the lifting motor and the middle supporting assembly, thereby reducing the influence on the baking effect of the wafer caused by heat transfer blocking due to local shielding, and improving the baking quality of the wafer. The baking difference of the wafer is reduced; and 2, the side end supporting assembly lifts or sinks one side of the wafer, so that the wafer swings up and down during baking, the surface adhesive film flows and is redistributed through external force, the thickness uniformity of the adhesive film is improved, meanwhile, solvent steam is more easily diffused to the surface from the interior of the adhesive film, and the volatilization efficiency of the solvent steam is improved.
Owner:WUXI AODUOER AUTOMATION CO LTD

Enhanced bulk heterojunction devices prepared by thermal and solvent vapor annealing processes

PendingKR1020260113028AHeterojunctionSolvent vapor
A method for manufacturing a bulk heterojunction organic photovoltaic cell through a combination of thermal annealing and solvent vapor annealing is described. In an effort to improve the crystalline properties of a photoactive material, a bulk heterojunction film may be prepared by a known method, e.g., spin coating, and then exposed to one or more vaporized solvents and thermally annealed.
Owner:THE RGT UNIV OF MICHIGAN +1

Substrate processing apparatus and substrate processing method

This invention relates to a substrate processing apparatus and a substrate processing method. The substrate processing apparatus includes: a processing tank storing a processing liquid; a chamber surrounding the processing tank; a solvent vapor nozzle supplying solvent vapor into the chamber; a cleaning liquid nozzle supplying cleaning liquid into the chamber; and a control unit. The control unit performs an immersion process and a drying process at predetermined intervals. The immersion process involves immersing the substrate in the processing liquid stored in the processing tank, and the drying process uses solvent vapor supplied from the solvent vapor nozzle to dry the substrate, which has been processed in the processing liquid and then removed from the processing tank. The control unit supplies cleaning liquid into the chamber from the cleaning liquid nozzle and immerses the processing tank in the cleaning liquid stored in the chamber, thereby performing a chamber cleaning process to clean the chamber, including the outer wall of the processing tank.
Owner:SCREEN HOLDINGS CO LTD

Pattern-forming device, pattern-forming method, and storage medium

PCT designated stageWO2026014225A1Semiconductor/solid-state device manufacturingSolvent vaporProcess engineering
This pattern-forming device comprises: a solvent treatment compartment which has a chamber for accommodating a substrate and a supply port for solvent vapor, and in which a pattern-forming treatment for forming a pattern on the substrate by treating the substrate with the solvent vapor having been supplied into the chamber is performed; a heat treatment compartment which has a chamber for accommodating the substrate having been treated in the solvent treatment compartment and a heater for heating the substrate, and in which, through heating with the heater, a drying treatment is performed to dry the substrate on which the pattern has been formed; a conveyance mechanism which conveys the substrate between the solvent treatment compartment and the heat treatment compartment; and a housing which accommodates the solvent treatment compartment, the heat treatment compartment, and the conveyance mechanism in a shared accommodation space.
Owner:TOKYO ELECTRON LTD

High-stress-resistance PMMA (Polymethyl Methacrylate) composite film, preparation method and flexible OLED (Organic Light Emitting Diode) device

The invention relates to a high-stress-resistance PMMA composite film, a preparation method and a flexible OLED device.The preparation method comprises the steps that polymethyl methacrylate, a solvent and functional nano filler are fully mixed to form a film, the formed film is placed in a closed solvent steam environment to be slowly dried, a steam source is the solvent for dissolving the polymethyl methacrylate, the functional nano filler is taken as a functional nano filler, and the functional nano filler is taken as a functional nano filler to prepare the high-stress-resistance PMMA composite film. And inducing to form a nano wrinkled flow guide structure on the surface of the formed film to obtain the high-stress-resistance PMMA composite film. The composite film has excellent high optical transmittance, bending stress, curling stress and flexibility, and is adaptive to the use requirements of devices such as a polaroid, a packaging film and a light control film in a flexible OLED (Organic Light Emitting Diode).
Owner:ANHUI HEMEI MATERIALS TECH CO LTD

A copper-based pressure-sensitive chip electronic paste and a preparation method thereof

PendingCN122291130AEnsure high densityEliminate dead spots in deaerationUltrasonic cavitationSolvent vapor
This invention relates to the field of electronic materials technology, specifically disclosing a copper-based varistor chip electronic paste and its preparation method. The paste is composed of a specific ratio of sheet-like and nano-copper powder, a glass binder phase, an organic carrier, and functional additives. The preparation method employs a multi-stage vacuum dynamic degassing device. This device gently releases large bubbles through a pretreatment chamber, and utilizes a dynamic stirring mechanism with combined revolution, rotation, and reciprocating motions within the main degassing chamber to achieve strong shearing and agitation of the paste across its entire surface. Combined with ultrasonic cavitation, this deeply breaks down bubbles, thereby efficiently and thoroughly removing them. Simultaneously, the device integrates an online viscosity monitoring and intelligent solvent vapor compensation system, enabling real-time adjustment and stabilization of the paste's rheological properties. This invention effectively solves the problems of incomplete bubble removal and performance fluctuations caused by solvent evaporation, significantly improving the density, uniformity, and production consistency of the paste product.
Owner:FUJIAN RUISHENG ELECTRONIC TECH CO LTD

Connecting device for collecting and recycling organic gas in coating and drying process

ActiveCN223847730UPretreated surfacesDirt cleaningSolvent vaporWaste product
The utility model provides a connecting device for collecting and recycling organic gas in a coating and drying process, and relates to the technical field of coating and drying. The connecting device for collecting and recycling the organic gas in the coating and drying process comprises a connecting body, and the connecting body is provided with a connecting cavity. According to the connecting device for collecting and recycling the organic gas in the coating and drying process, by arranging the single variable-frequency regulating valve, the exhaust speed and the exhaust amount of the organic gas can be accurately controlled, production and quality stability are ensured, and the situation that the wind direction and the wind speed in a drying box and the stability of the temperature of the drying box are affected due to excessive exhaust of the organic gas is effectively prevented; the surface of the photosensitive liquid which is coated on the surface of the aluminum plate and is not dried generates wind lines and wind patterns, so that a product is scrapped; and the problems that solvent steam cannot be discharged in time, the temperature of the drying oven is increased, 'solvent drops' are formed in the drying oven and drop to the plate surface, waste products are generated, and even explosion danger is generated due to overhigh steam pressure are effectively prevented due to the fact that the discharge speed and discharge amount of organic gas are too small.
Owner:HUANGSHAN YINJIANG TECH +1

Closed rotatable extractor system

ActiveUS12649114B2Solid solvent extractionSolvent vaporPhysics
A closed rotatable extraction system includes at least two tubes where one tube accepts an extractable material, and the system can be evacuated through a valve in the system. At least one conduit comprises at least one flexible hose, bent ridged pipe, t-pipe, curved pipe, or any combination thereof. At least one valve that when open allows evacuation of the system, and optionally for introduction of a solvent for extraction. When the at least one valve is closed a solvent vapor atmosphere is defined as almost exclusively or exclusively the solvent vapor and has a gas pressure that is about the solvents vapor pressure or less in the closed rotatable extraction system. The closed rotatable extraction system or a portion thereof can involve a first rotation orientation for liquid transfer and a second orientation for a vapor transfer.
Owner:BREVETS LLC

Method for producing ethylene-vinyl alcohol copolymer

PendingCN121464160APolymer scienceSolvent vapor
A method for producing an ethylene-vinyl alcohol copolymer, which comprises: a step (I) wherein an ethylene-vinyl acetate copolymer in a solution of the ethylene-vinyl acetate copolymer is saponified using a base catalyst to obtain a solution of a partially saponified product of the ethylene-vinyl acetate copolymer having a degree of saponification of 10 mol% or more but less than 60 mol%; and a step (II) in which a solution of the partially saponified ethylene-vinyl acetate copolymer is supplied to the tower upper part of the tower reactor (A), solvent vapor is supplied to the tower lower part and discharged from the tower upper part, and the partially saponified ethylene-vinyl acetate copolymer is discharged from the tower lower part. A base catalyst is supplied to the tower reactor (A) at a position lower than the position at which the solution of the partially saponified ethylene-vinyl acetate copolymer is supplied, and the partially saponified ethylene-vinyl acetate copolymer is further saponified. The obtained ethylene-vinyl alcohol copolymer solution having a degree of saponification of 99-100 mol% is taken out from the bottom of the column. According to this production method, the ethylene-vinyl acetate copolymer can be efficiently saponified even when the ethylene-vinyl alcohol copolymer is continuously produced for a long period of time, and thus the ethylene-vinyl alcohol copolymer can be produced with good productivity.
Owner:KURARAY CO LTD

Hydrophobic anti-ultraviolet degradable polymer material with bionic micro-nano structure and preparation method of hydrophobic anti-ultraviolet degradable polymer material

The invention discloses a hydrophobic anti-ultraviolet degradable polymer material with a bionic micro-nano structure and a preparation method of the hydrophobic anti-ultraviolet degradable polymer material with the bionic micro-nano structure, a surface cross-linkable / inner-layer hydrophobic supported double-layer structure is constructed through double-layer co-extrusion, surface layer cross-linking is initiated through heat treatment, non-cross-linked parts on the surface are removed through selective etching of solvent vapor, and the hydrophobic anti-ultraviolet degradable polymer material with the bionic micro-nano structure is obtained. Finally, surface molecular chain micro-regions are rearranged and fixed through ultraviolet radiation, the chemical stability and durability of the structure are improved, a secondary nano-structure of the cross-linked bionic fruit epidermis wax with light stability is constructed on the surface of a degradable polymer, the structure ingeniously utilizes a physical scattering ultraviolet protection mechanism, and the mechanical property of the structure is improved. Meanwhile, the material is endowed with the super-hydrophobic characteristic, a long-acting and stable protective layer is constructed on the surface of the material, the ideal performance of durability in the early stage and rapid degradation in the later stage is achieved, and the material can be used for preparing high-end packaging materials, agricultural mulching films, outdoor protective coatings or photoelectric device protective layers.
Owner:INST OF BIOLOGICAL & MEDICAL ENG GUANGDONG ACAD OF SCI

Cleaning system and method

PCT designated stageWO2026117183A1Cleaning using liquidsSolvent vaporSolvent evaporation
Described herein is a cleaning system comprising an enclosure structure defining an enclosure space for receiving an article therewithin, and a solvent vaporizer for introducing solvent vapour into the enclosure space for interacting with the article to remove particles therefrom. The cleaning system further comprises a solvent processor for extracting the solvent vapor and the solvent condensate from the enclosure space. The solvent processor for generating a negative pressure for substantially extracting the solvent vapour away from the enclosure space. The cleaning system further comprises a filtration system for filtering the particles from the extracted solvent vapour and solvent condensate. The solvent vapour is condensed into solvent condensate prior to filtration thereof and at least a portion of the solvent condensate is subsequently re-introducable into the enclosure space as solvent vapour.
Owner:NANOWALL TECH PTE LTD

EVA stripping reaction tank cooling system and method for recycling photovoltaic modules

PendingCN122273461APurification automatic recycling cycleImprove recycling efficiencySolvent vaporCirculator pump
This invention relates to the field of photovoltaic module recycling, specifically disclosing a cooling system and method for an EVA stripping reaction tank used in photovoltaic module recycling. The system includes a dissolution reaction tank with a pressure relief port at the top and a reflux interface at the bottom; a pressure relief and condensation module, comprising a pressure relief valve and a condenser connected to the pressure relief port via a high-pressure pipeline; a filtration and purification module, comprising a filter tank connected to the condenser outlet; a circulation and reflux module, comprising a circulation pump connecting the filter tank and the reflux interface; and an intelligent control module, comprising a PLC controller and pressure and temperature sensors installed within the reaction tank. By constructing a closed-loop structure composed of the above modules and automatically controlling the system based on sensor signals via the intelligent control module, this system can safely release and efficiently condense the solvent vapor generated during the reaction, then purify and filter it before pumping it back to the reaction tank for recycling. This significantly reduces solvent consumption and operating costs while improving production safety and stability.
Owner:YIDAO INTELLIGENT ENVIRONMENTAL PROTECTION TECHNOLOGY (QUZHOU) CO LTD

A modification method of a full-textured perovskite / crystalline silicon laminated solar cell

This invention discloses a modification method for a fully textured perovskite / crystalline silicon tandem solar cell. The method involves a two-step annealing process using a vacuum-assisted two-step method. The inorganic compound film deposited in the first step is annealed using a mixed solvent vapor composed of a good solvent and a poor solvent. Since the good solvent can react with lead ions in the inorganic compound film to form intermediate complexes, it helps to delay the crystallization of the perovskite polycrystalline film during the second thermal annealing, thereby improving the crystallinity of the perovskite polycrystalline film. Simultaneously, the presence of the poor solvent in the mixed solvent vapor annealing ensures that the inorganic compound layer from the first step covers the entire textured surface of the crystalline silicon base cell, thus guaranteeing the excellent performance of the final fully textured perovskite / crystalline silicon tandem solar cell. This modification method is expected to promote the industrialization of fully textured perovskite / crystalline silicon tandem solar cells.
Owner:NANCHANG UNIV

Perovskite solar cell film preparation method

The invention discloses a preparation method of a perovskite solar cell film, which comprises the following steps of: attaching a perovskite film-forming solution on a scraping platform, scraping the perovskite film-forming solution to be flat by using a scraper, and then drying to volatilize solvent components of the solution to form the film. The method comprises the following steps: introducing solvent steam containing solvent components in a perovskite film-forming solution above a to-be-scraped area on a scraping platform to form a solvent atmosphere range covering the to-be-scraped area, then adding the perovskite film-forming solution, and scraping in the solvent atmosphere range; and then anti-solvent steam of an anti-solvent material containing a perovskite film forming solution is introduced above the scraped area to form an anti-solvent atmosphere range covering the scraped area. According to the method, the blade coating microenvironment can be better controlled, the prepared perovskite solar cell thin film can be formed only through one-time scraping of the scraper, the production efficiency is greatly improved, and good forming quality is achieved.
Owner:BEIJING UNIV OF CIVIL ENG & ARCHITECTURE

Method for producing ethylene-vinyl alcohol copolymer

PendingGB2644562APolymer scienceSolvent vapor
The method for producing an ethylene-vinyl alcohol copolymer has a step (I) in which an ethylene-vinyl acetate copolymer in a solution of an ethylene-vinyl acetate copolymer is saponified using an alkali catalyst to obtain a solution of a saponified ethylene-vinyl acetate copolymer having a degree of saponification of from 10 mol% to less than 60 mol% and a step (II) in which the solution of the saponified ethylene-vinyl acetate copolymer is supplied to top of a tower reactor (A), solvent vapor is supplied to the lower part and discharged from the top, and an alkali catalyst is supplied below the location at which the solution of the saponified ethylene-vinyl acetate copolymer is supplied to further saponify the saponified ethylene-vinyl acetate copolymer, and a solution of an ethylene-vinyl alcohol copolymer having a degree of saponification of from 99 mol% to 100 mol% obtained is removed from the tower bottom. According to this production method, even when an ethylene-vinyl alcohol copolymer is produced continuously for a long period of time, the ethylene-vinyl acetate copolymer can be saponified efficiently, so that the ethylene-vinyl alcohol copolymer can be produced at good productivity.
Owner:KURARAY CO LTD

Perovskite film coating equipment

PendingCN121988500APretreated surfacesCoatingsSolvent vaporMembrane surface
The invention discloses perovskite film coating equipment, and belongs to the technical field of photoelectric component coating. The perovskite film coating equipment comprises a conveying mechanism, a housing and a gas supply device, and further comprises a gate capable of dividing a space between the housing and the conveying mechanism into a cavity, a strip-shaped gas inlet and a strip-shaped gas outlet are formed in the side wall of the cavity, and the gas outlet is communicated with a stop valve; the partition plates divide the air inlet into a middle air channel and two side air channels, and the middle air channel directly faces the upper portion of the middle of the base material; the flow dividing mechanism communicates with the middle air channel and the two side air channels. One detection head is arranged above the middle part of the base material, and the other detection heads are symmetrically distributed above the two sides of the base material; the controller adjusts the air inlet flow proportion of the middle air channel and the two side air channels, so that the concentration of solvent vapor above the middle of the base material and the concentration of solvent vapor above the two sides of the base material are balanced. According to the perovskite film coating equipment, the uneven concentration of solvent vapor in the atmosphere environment where the surface of the perovskite film is located can be prevented, and the uniformity and compactness of the film layer are improved.
Owner:SHANGLUO UNIV

Solvent recovery system

This reduces the energy required to heat the desorption gas used to desorb the solvent. [Solution] A solvent recovery apparatus comprising: a cooling recovery unit to which untreated gas is supplied and solvent vapor contained in the untreated gas is cooled and condensed; an adsorption concentrator to which primary treated gas obtained by cooling and condensing the solvent vapor of the untreated gas in the cooling recovery unit is supplied; an adsorption rotor provided in the adsorption concentrator and having an adsorption region for adsorbing uncondensed solvent vapor contained in the primary treated gas and a desorption region for desorbing the solvent vapor adsorbed in the adsorption region; a desorption supply passage for supplying the untreated gas to the desorption region; and a desorption exhaust passage for discharging concentrated gas containing solvent vapor desorbed from the desorption region to the cooling recovery unit.
Owner:TAIKISHA LTD

Drying device and drying method thereof

The invention discloses a drying device and a drying method thereof, and relates to the technical field of drying devices.The drying device comprises a box body, a heating table and a diversion cone, the box body is provided with a drying cavity and an extraction opening, the extraction opening is formed in the top of the box body and communicates with the drying cavity, the extraction opening is used for being connected with extraction equipment, the heating table is arranged at the bottom of the drying cavity, and the diversion cone is arranged on the heating table. The heating table is used for bearing and heating a workpiece to be dried, the flow guide cone is arranged at the top of the drying cavity and provided with a conical surface, the vertex of the conical surface is opposite to the heating table, and the conical surface is used for guiding solvent steam generated by heating a solvent in the workpiece to the extraction opening; by means of the technical scheme, the risk that turbulent flow and vortex are locally generated in the flowing process of solvent steam can be reduced, stable and uniform streamline distribution of the solvent steam above a workpiece is facilitated, the solvent steam can be discharged smoothly, the drying uniformity of the workpiece can be improved, and then the finished product quality of the workpiece can be improved.
Owner:JIHUA LAB

On-line monitoring method for solvent volatilization rate and fluidity of silicon steel coating liquid circulating system

The invention discloses an online monitoring method for the solvent volatilization rate and fluidity of a silicon steel coating liquid circulation system. The method comprises the following steps: collecting the temperature of a coating liquid, the solvent vapor concentration of a gas space at the top of a circulation tank, the running power of a motor of a circulation pump and the circulation flow of the coating liquid in real time; the solvent volatilization rate and the coating liquid fluidity are calculated according to the collected data, the solvent loss amount in unit time is calculated through the solvent volatilization rate, and the starting frequency and duration of a solvent adding pump are controlled; setting an upper limit and a lower limit of viscosity, if the fluidity is greater than the upper limit, warning that the fluidity is poor; when the fluidity is lower than the lower limit, the solid content is low; and if the fluidity shows an irreversible continuous increasing trend, early warning is performed to prompt that the coating liquid is aged and needs to be replaced. According to the method, the defects of traditional coating liquid solvent volatilization rate and fluidity detection are overcome, key process data of the liquid solvent volatilization rate and fluidity are calculated through easily-detected parameters, and real-time sensing and accurate regulation and control of the state of the coating liquid in the circulation tank are achieved.
Owner:SHANGHAI BAOSTEEL IND TECHNOLOGICAL SERVICE

Substrate processing apparatus and control method for substrate processing apparatus

The concentration of the solvent in the solvent vapor supplied to the chamber is stabilized. [Solution] The controller of the substrate processing apparatus controls a pressure control regulator (62) based on the pressure measured by a pressure sensor that measures the pressure in the vapor generation tank (30), thereby adjusting the flow rate of inert gas supplied to the vapor generation tank (30) storing the solvent via a first inert gas supply pipe (61). When the pressure measured by the pressure sensor reaches a target value, the controller performs a gas supply process (S12) to stop the supply of the inert gas, and a steam supply process (S14) to supply the solvent vapor from the vapor generation tank (30) to the chamber (1) via the gas supply pipe (31) after stopping the supply of the inert gas.
Owner:SCREEN HOLDINGS CO LTD

High density spunbond nonwoven fabric and method of making same

This invention discloses a high-density spunbond nonwoven fabric and its preparation method, belonging to the technical field of PET textile materials. The nonwoven fabric of this invention is formed by laying and solidifying a core-sheath structure of composite fibers. The composite fibers include a matrix layer composed of carboxylated modified PET ionomer, and a conductive functional layer that spontaneously forms during spinning through a solvent vapor-induced phase separation effect and continuously coats the outer surface of the matrix layer. The conductive functional layer contains PEDOT:PSS and a phosphorus / nitrogen-containing ionic liquid. A transition layer with a concentration gradient of PET and PEDOT:PSS is provided between the matrix layer and the conductive functional layer. During preparation, PET, PEDOT:PSS, and the ionic liquid are mixed to form a spinning solution, which is then spun under high humidity. The conductive components spontaneously migrate to the fiber surface using the solvent vapor-induced phase separation effect, and the fabric is then solidified into a web. The nonwoven fabric of this invention exhibits durable conductivity, excellent flame retardancy, and high tensile strength.
Owner:ZHEJIANG GUIXIANG NEW MATERIAL CO LTD

A microwave assembly chip cleaning agent for double solvent vapor phase cleaning and a preparation method thereof

The application discloses a kind of microwave assembly chip cleaning agent for double solvent gas phase cleaning and preparation method thereof, belong to microelectronic cleaning technical field, the cleaning agent includes the following mass percentage components: alcohol ether solvent 10-50%, ester solvent 1-10%, nitrogen-containing and sulfur-containing solvent 1-10%, antioxidant T501 0-1%, the balance is hydrocarbon solvent.The application is synergized by alcohol ether solvent, ester solvent, nitrogen-containing and sulfur-containing solvent and hydrocarbon solvent, enhances the removal capacity to weld mark, oil stain, dust and other dirt;Preparation method is simple, suitable for large-scale industrial production;At the same time has specific density and boiling point, can cooperate with fluorine system solvent and carry out microwave assembly chip double solvent gas phase cleaning, solve the problem that fluorine system solvent is safe and environmental protection, but cleaning power is weak, difficult to meet the cleaning cleanliness requirement, other cleaning methods can also solve the problem that bare chip is easily damaged, affects product reliability.
Owner:SUNSHINE NEW TECH(TIANJIN)GRP CO LTD +1

Spin coating chamber atmosphere control structure based on gas assistance and variable angle rectifier plate

ActiveCN121222643BPretreated surfacesCoatingsSolvent vaporBevel gear
The application discloses a kind of based on gas auxiliary and variable angle rectifier plate's spin coating chamber atmosphere control structure, including synchronous cover module and main chuck;The synchronous cover module and main chuck are concentric structure;The synchronous cover module is installed on the upper portion of main chuck.The application is by the variable angle rectifier plate structure driven by bevel gear transmission in spin coating chamber, realizes the adjustable control of the direction and intensity of airflow inside chamber.By adjusting the inclination of rectifier plate, make chamber internal radial and axial flow field distribution more uniform, effectively weaken the flow instability caused by vortex, shear layer mutation etc in spin coating process, to improve the flow field uniformity in chamber, provide stable airflow condition for spin coating film thickness control.The application can dynamically adjust the solvent vapor concentration inside chamber, inhibit solvent too fast volatilization, significantly weaken the film thickness uneven caused by edge effect and local concentration gradient, to improve the uniformity of solvent volatilization.
Owner:DALIAN UNIV OF TECH