388results about "Photometry for measuring UV light" patented technology

The invention belongs to the field of laser plasmas, and discloses a device and a method for generating an extreme ultraviolet (EUV) super-continuum light source with luminous efficiency at a 10-20nm waveband, which can be used for quantity detection in advanced semiconductor manufacturing. The device comprises a vacuum pump set, a vacuum chamber, a target material, an EUV spectral measurement system, a laser, a half-wave plate and polarizer combination, a focusing lens and a beam expanding lens, the vacuum pump is used for pumping air to enable the vacuum chamber to keep a proper vacuum degree, and the target material is irradiated by laser to generate plasma to emit supercontinuum radiation of 10-20 nm. According to the invention, after spectral radiation energy and laser-EUV radiation conversion efficiency are quantified through an EUV spectral measurement system and a radiation calibration and energy calculation method, focusing spot sizes with optimal luminous efficiency under different laser wavelengths, laser pulse time and laser energy are obtained, and finally, the maximum luminous efficiency of different laser parameters in a 10-20nm wave band is realized.

The invention relates to a rapid detection device for the intensity of a light curing lamp, and relates to the technical field of light intensity detection equipment. The simulation mechanism comprises a plurality of connecting pipes, the axial directions of the connecting pipes are arranged in the length direction of the supporting cabinet, the connecting pipes are sequentially and coaxially communicated in the axial directions of the connecting pipes, supporting frames are arranged between the connecting pipes and the supporting cabinet, the connecting pipes are detachably connected with the corresponding supporting frames, and the supporting frames are slidably connected with the supporting cabinet; the detection mechanism comprises a detection pipe, the detection pipe is located between two adjacent connecting pipes, the detection pipe and the connecting pipes are coaxially arranged, the two ends of the detection pipe are detachably connected with the corresponding connecting pipes, and an ultraviolet intensity detection piece is arranged on the inner side wall of the detection pipe. According to the invention, the intensity of the photocuring lamp installed on the photocuring robot is directly detected, and rapid detection of the intensity of the photocuring lamp is realized.

Apparatuses are disclosed which include a lamp assembly having a germicidal lamp configured to emit ultraviolet light and a base supporting the germicidal lamp. The apparatuses further include a support structure holding operational components for the apparatus and an automated actuator for moving the base and the germicidal lamp relative to the support structure. In addition, the apparatuses include a processor and a storage medium having program instructions which are executable by the processor for activating the automated actuator such that the base and the germicidal lamp are repositioned relative to the support structure while the germicidal lamp is emitting ultraviolet light.

The invention provides a vacuum ultraviolet deuterium lamp spectral radiance traceability method, device and equipment, and relates to the technical field of optical metrology. The method comprises the following steps: determining relative spectral distribution of a deuterium lamp in a vacuum ultraviolet band; acquiring the spectral radiation brightness of the deuterium lamp at 200nm under the condition that the black body is used as a standard radiation source; and determining the spectral radiation brightness of the deuterium lamp in the vacuum ultraviolet band according to the relative spectral distribution of the deuterium lamp in the vacuum ultraviolet band and the spectral radiation brightness of the deuterium lamp at 200nm. The method provided by the embodiment of the invention efficiently and accurately realizes the spectral radiance traceability of the vacuum ultraviolet deuterium lamp.

The invention provides a preparation method of a photoresponse thin film material, the photoresponse thin film material and an ultraviolet light monitoring device and system.The method comprises the steps that 4, 4 '-dihydroxy hexyloxy azobenzene is added into a polymer formed by polymerizing a dihydroxy oligomer and a diisocyanate-based monomer, polyurethane containing azobenzene groups is obtained, and the polyurethane containing the azobenzene groups is added into the polymer to obtain the photoresponse thin film material. The preparation method comprises the following steps: dissolving polyurethane and a piezoelectric polymer in a high-boiling-point solvent to obtain an electrospinning solution, and carrying out electrostatic spinning by adopting the electrospinning solution to obtain the photoresponse film material. According to the invention, 4, 4 '-dihydroxy hexyloxy azobenzene containing six-carbon spacer is used as a chain extender and is added into a polymer of a dihydroxy oligomer and a diisocyanate-based monomer to obtain azobenzene group-containing ultraviolet light response polyurethane, and then the polyurethane and a piezoelectric polymer are combined, so that the ultraviolet light response performance of the piezoelectric polymer is improved. The photoresponse thin film material with better flexibility, better mechanical property and good ultraviolet response is prepared, the preparation process of the photoresponse thin film material is simple, and the preparation cost is low.

A method for determining natural illumination duration and an electronic device are provided, to more accurately determine a scenario in which a user is located and effectively determine natural illumination duration, to help the user improve vision. The method is applied to an electronic device having a display screen and includes: determining a current scenario based on a preset reference factor (S901), where the preset reference factor includes any one or more of ultraviolet intensity, illumination intensity, and locating signal strength; and counting current natural illumination duration towards cumulative natural illumination duration if the current scenario is a preset scenario (S902), where the preset scenario includes any one or more of an outdoor scenario, an indoor near-window scenario, and an outdoor blocked scenario.

The invention is a method for generating a radiation plan of a scene in particular for a disinfection robot adapted for radiating disinfection light, in the course whichproviding or generating a 3D model (136) with 3D elements,generating radiation plan candidates (112) for the first 3D model (136) based on artificial intelligence, each plan candidate (112) comprising one or more radiation position and respective radiation time,generating one or more respective irradiance ratio estimation (134) of the 3D model (136) for the plan candidates (112), andobtaining the radiation plan (135) from the plan candidates (112) based on the one or more respective irradiance ratio estimation (134) by means of the first radiation plan generator module (130).The invention is, furthermore, a system for generating a radiation plan.

Method, sterilization system and robotic system for improving duty cycle of Ultraviolet (UV) emitter modules disinfecting closed environment. Sterilization system includes robotic system and plurality of UV emitter modules. Robotic system receives signal corresponding to discharge of battery from one of plurality of UV emitter modules. Each of plurality of UV emitter modules includes UV light source for disinfecting closed environment. Robotic system detects location of UV emitter module amongst plurality of UV emitter modules and maneuvers to location of UV emitter module, mounts UV emitter module and maneuvers UV emitter module to charging dock for charging battery of UV emitter module. After charging, robotic system maneuvers UV emitter module to pre-defined area for disinfecting pre-defined area of closed environment. Robotic system includes battery charged through UV emitter module when UV emitter module is getting charged, or when UV emitter module mounted to robotic system includes battery that is fully charged.

A sensor for measuring energy of EUV radiation from combined radiation comprising EUV radiation and non-EUV radiation, the sensor (20) comprising: a radiation absorber (21) configured to absorb radiation derived from the combined radiation (15) via a surface (40) of the radiation absorber; a first reflector (30;31) having a first reflectivity to EUV radiation configured to modify the combined radiation entering the surface; a second reflector (30;32) having a second reflectivity to EUV radiation configured to modify the combined radiation entering the surface, the second reflectivity being different from the first reflectivity; a thermometer (26) configured to measure a temperature change of the radiation absorber; and a calculator configured to calculate the energy of EUV radiation based on a first temperature change associated with the combined radiation modified by the first reflector and a second temperature change associated with the combined radiation modified by the second reflector.

An arrangement (100), a method and a computer program product for system-integrated calibration of facet mirrors (18, 19) of a microlithographic illumination system (20). Beam paths (103) between a radiation source (101) and a radiation detector (102) are created by the facet mirrors (18, 19), with respectively only one pivotable micromirror (18″, 19″) of each facet mirror (18, 19) affecting said beam path. By methodically pivoting one of the micromirrors (18″, 19″) affecting the beam path (10), it is possible, based on the radiation detector (102), to find a specific optimal pivot position, the underlying orientation of the micromirror (18″, 19″) of which can also be calculated geometrically. By comparing the calculated orientation with the orientation ascertained by a tilt sensor on the micromirror (18″, 19″), it is possible to calibrate the tilt sensor or micromirror (18″, 19″) of the facet mirror (18, 19).

A thermally coupled imager includes a single photon detection pixel electrically isolated but in thermal communication with a thermal readout bus via a thermally conductive galvanic isolator, wherein the single photon detection pixel receives a single photon and produces thermal energy that is communicated to the thermal readout bus. A position and time of arrival of the single photon received by the single photon detection pixel is determined from voltage pulses produced by the thermal readout bus in response to receiving the thermal energy from the single photon detection pixel.

A calculation module for determining a localization, system, eyewear and computer implemented method. The calculation module is configured to receive, from a spectrophotometer of an optical device, data representing a power density of at least two spectral components of a light received by the spectrophotometer and to determine the localization using the power density of the at least two spectral components.

An energy detection assembly (78) is suitable for an illumination system of a mask inspection system for use with EUV illumination light (3). The assembly (78) has at least one EUV energy sensor device (77) designed to detect energy of the illumination light (3) guided along an illumination light beam path. The EUV energy sensor device (77) has at least one energy value sensor and at least one energy change sensor (79). The energy value sensor serves to detect an illumination energy of the illumination light (3) over an exposure period. The energy change sensor (79) serves to detect a temporal development of the illumination energy of the illumination light (3) over the exposure period. This results in an energy detection assembly by means of which the inspection accuracy of the mask inspection system can be improved.

A solar radiation protective band for a driver that includes a housing and an armband. The housing includes a front panel, a side panel, and a microcontroller. The front panel includes a front panel UV light sensor, a front panel IR phototransistor, and an LCD. The side panel includes a side panel UV light sensor, and a side panel IR phototransistor. A temperature sensor measures a skin temperature and generates a temperature signal. A skin color sensor detects a skin color of the driver and generates a skin color signal. The microcontroller requests an input of a SPF of a sunscreen used by the driver; calculates an exposure time threshold; generates a UV exposure warning when an exposure time exceeds the exposure time threshold; calculates an updated skin temperature; and generates an IR exposure warning when the updated skin temperature exceeds a maximum skin temperature threshold.

The invention provides a UV light monitoring system that is capable of estimating the UV irradiance on a target surface oriented at an arbitrary angle relative to a UV emitter that emits UV light. The UV light monitoring system can be used in a system or process for disinfecting a space, where the UV light monitoring system may enable a dose of UV light experienced by a surface in the space to be accurately estimated. The invention can alternatively or additionally provide a mechanism for determining the orientation of a UV light monitor to assist with the optimal placement of the UV light monitor within a space. The orientation is determined based on a comparison between signals received from first and second solar cells that are located on different faces of the UV light monitor.

The invention discloses a corrosion detection sensor. Systems, devices, articles, and methods for corrosion detection are disclosed. An example apparatus includes an adhesive for removably directly coupling the apparatus to a region of a substrate; a first sensor for measuring a first parameter at the region; a second sensor for measuring a second parameter at the region, the first parameter and the second parameter being corrosion factors at the region; and a power source for providing power to the first sensor and the second sensor.

A gas turbine engine fuel system includes a fuel delivery system, an oil cooling subsystem, a fuel delivery conditioning system, and one or more optical coking sensors. The fuel delivery subsystem delivers fuel to a gas turbine engine and the oil cooling subsystem receives heated oil from the gas turbine engine. The fuel delivery conditioning system includes a fuel / oil cooler that is in fluid communication with the fuel delivery subsystem to receive the fuel and is in fluid communication with the oil cooling subsystem to receive the heated oil. The fuel / oil cooler transfers heat from the oil to the fuel to increase a temperature of the fuel, and the optical coking sensors output a signal indicating a thermal stress of the fuel that occurs with a changing temperature of the fuel. A controller receives the voltage signal determines an onset of coking in the fuel based on the signal.

An eyewear and a method for determining user exposure wherein the eyewear includes at least one first sensor attached to a frame of the eyewear and wherein the first sensor is selected from at least one of: ultraviolet light sensor (UVS), photopic ambient light sensor (ALS), and a controller configured to receive values for a photopic light level and an ultraviolet light level from the at least one first sensor, provide a timeline for the received values of the photopic light level and the ultraviolet light level, calculate from the timeline, the photopic light level, and the ultraviolet light level, a probability of time duration the eyewear has been exposed to outdoor environment, and provide the calculated probability of time duration for a user of the eyewear.

Disclosed are a system and method for wired / wireless-online / offline communication-based continuous, real-time proportional and radiometric measurement, processing, and monitoring of the output of UV sources which generate UV radiation that can be used in water disinfection, surface disinfection, air, and room disinfection processes and for non-disinfection purposes. The system and method are provided to measure and monitor the UV output of the UV sources or in the environment continuously in real-time through externally placed sensors. In the system and method, data from the sensors is processed in a microprocessor-based electronic module, and the information is transmitted to an online / offline interface accessible to the end-user via wired / wireless communication.

This disclosure provides methods and apparatuses which advantageously stabilize beam parameters and elongate crystal lifetime. In one aspect, a UV laser apparatus (100) includes a non-linear crystal(104), a laser source(102), a beam- crystal displacer(106), a beam parameter monitor(108), and a laser control unit (110). The laser source (102) directs a source beam (1021) to the non-linear crystal (104) to produce a UV beam and the beam-crystal displacer(106) shifts the non- linear crystal (104) relative to the source beam (1021) at a plurality of shift speeds. The beam parameter monitor (108) measures the UV beam and outputs a measurement of a beam parameter. The laser control unit(110): receives the measurement; determines, based on the measurement, an adjustment in shift speed that steers the beam parameter toward a target value; and outputs the adjustment to the beam-crystal displacer(106).

An instrumented substrate may provide a metrology platform for monitoring extreme ultraviolet (EUV) radiation in an image plane of a EUV lithography tool. The instrumented substrate may include in-band dosage sensors. The in-band dosage sensors may generate dosage measurements corresponding to the illumination which is in-band. The instrumented substrate may also include out-of-band dosage sensors and in-band scattered dosage sensors. The instrumented substrate may be housed within a front opening unified pod (FOUP) of a system.

Photolithography system, comprising: a plasma generation chamber (101); a droplet generator (108) configured to deliver a stream of droplets (142) into the plasma generation chamber; a laser (102) configured to generate a plasma from the droplets by irradiating the droplets in the plasma generation chamber; one or more first charged particle detectors configured to detect the speed, intensity, and / or energy of the charged particles ejected from the plasma and to output first sensor signals indicative of the charged particles; and a control system (114) configured to receive the first sensor signals, analyze the first sensor signals, and adjust plasma generation parameters based at least in part on the first sensor signals.

A system (5) for quantifying a color change in a colorimetric indicator (15), comprising: an imaging device (22) configured to acquire an image of an object (10) including the colorimetric indicator (15); and a processing device (20) configured to compare the acquired image with reference data (30) associated with the colorimetric indicator (15) to generate a quantitative output (28) associated with the acquired image. A system with.

Ultraviolet systems and methods are described for capturing images depicting absorption or remittance of ultraviolet radiation (UVR). An example system includes a camera comprising a monochrome camera sensor that is configured to capture images, a radiation source that is configured to output a UVR waveband, a filter component that is configured to differentiate at least one of a UVA waveband and a UVB waveband of the UVR waveband, and a polarizer component that is configured to cross polarize each of the UVA waveband and the UVB waveband. Further, the camera is configured to capture an image depicting an UVA amount of UVA absorption or remittance as projected on a surface area and an UVB amount of UVB absorption or remittance as projected on the surface area.

The application provides a preparation method of a light response thin film material, the light response thin film material, an ultraviolet light monitoring device and a system. The method comprises the following steps: adding 4,4'-dihydroxyhexyloxy azobenzene into a polymer obtained by polymerization of a dihydroxy oligomer and a diisocyanate-based monomer to obtain polyurethane containing an azobenzene group; dissolving the polyurethane and a piezoelectric polymer in a high-boiling-point solvent to obtain an electrospinning solution; and performing electrospinning on the electrospinning solution to obtain the light response thin film material. The 4,4'-dihydroxyhexyloxy azobenzene containing a six-carbon spacer is added as a chain extender into the polymer of the dihydroxy oligomer and the diisocyanate-based monomer to obtain the ultraviolet light response polyurethane containing the azobenzene group. Furthermore, the light response thin film material with better flexibility, better mechanical properties and good ultraviolet light response can be prepared by combining the polyurethane and the piezoelectric polymer. The preparation process of the light response thin film material is simple, and the preparation cost is low.

A flame or gas detection method (200) includes determining (210) non-imaging sensor system detection state (16; 322, 336) for a scene of interest (14), determining (220) an imaging sensor system detection state (18; 350, 362) for the scene of interest, and validating (230) one of the non-imaging sensor system detection state and the imaging sensor system detection state with the other of the non-imaging sensor system detection state and the imaging sensor system detection state. A flame or gas detecting system detection state (26; 242, 244) is then indicated (240) at a user interface (124; 372) including the validated one of the non-imaging sensor system detection state and the imaging system detection state. Flame or gas detection systems (100; 300) and computer program products (102) are also described.

There is provided a sterilisation monitoring device for a molecular diagnostics analyser. The device comprises a sensor arranged in use to detect radiation; and an analysis unit connected to the sensor. The analysis unit is arranged in use to issue a signal when the radiation level incident on the sensor is lower than a threshold level.

The application discloses a thermoelectric pile structure for calibrating a far ultraviolet ultraviolet detector based on MEMS, which comprises a silicon substrate, a support layer, an absorption layer, a thermocouple pair, aluminum wires, aluminum electrodes and a single crystal silicon material structure on the silicon substrate. The double-layer thermocouple stacking structure is adopted to improve the device duty ratio, more thermocouple pairs can be laid in the case of keeping the size of the one-layer structure unchanged, and the response rate of the detector is improved. The circular structure conforms to the distribution trend that the temperature is radially diffused from the center of the absorption layer to the periphery in a decreasing manner, the hot end of the thermocouple pair can be closer to the area with higher temperature, the temperature of the hot end of the thermocouple pair is more uniform, and the response rate of the detector is improved. The radiant energy of the far ultraviolet ultraviolet radiation source is converted into an output thermoelectric electromotive force, a mathematical model of Fourier's law and the Seebeck effect is established for calculation, and the heat flux density of the far ultraviolet ultraviolet radiation source is measured.

One aspect relates to a device for measuring the intensity (10) of the UV radiation generated by a UV radiation source (26), in particular a UV radiation source (26) for sewer rehabilitation work, wherein the device comprises: - a receiving unit (12) with a measuring chamber (24) for receiving the UV radiation source (26) during the intensity measurement, wherein the receiving unit (12) comprises a first UV sensor (38) for measuring the intensity of the UV radiation generated by the UV radiation source (26), wherein the receiving unit (12) comprises a UV radiation source connection (28) to which the UV radiation source (26) can be connected in order to supply the UV radiation source (26) with operating voltage orto supply operating current, wherein in a first measuring mode the device is designed to measure the intensity of a UV radiation source (26) by arranging the UV radiation source (26) in the measuring chamber (24) and operating it at the UV radiation source connection (28), and wherein in a second measuring mode the device is designed to measure the intensity of a UV radiation source (26) by arranging the UV radiation source (26) in the measuring chamber (24) and operating it at an external device (27), in particular a device for curing UV-curable sewer rehabilitation materials.

The present invention provides a silicon carbide-based ultraviolet position-sensitive detector and a preparation method thereof, belonging to the technical field of position detectors. It includes an N-type silicon carbide substrate layer, an electrical isolation layer, a highly doped lower drift layer, a lowly doped middle drift layer, and a highly doped upper drift layer arranged from bottom to top. A first graphic area is provided on the highly doped lower drift layer, and the lowly doped middle drift layer and the highly doped upper drift layer are located in the first graphic area. First ohmic contact electrodes are respectively arranged on opposite sides of the first graphic area in a first direction. Two second ohmic contact electrodes are arranged at intervals along a second direction on the top of the highly doped upper drift layer, and the second direction is perpendicular to the first direction. The conductive characteristics of the highly doped lower drift layer and the highly doped upper drift layer are opposite. It can solve the technical problems of large detection structure position error and unsatisfactory measurement accuracy caused by device structure defects in the existing ultraviolet position-sensitive detectors.