An
ion implanter that facilitates channeling an
ion beam into a crystalline structure of a workpiece is disclosed. The
ion implanter includes an
ion source that generates an
ion beam, a platen that supports a workpiece having a crystalline structure, an X-
ray source that generates an X-
ray beam, where at least a portion of the X-
ray beam impinges on the workpiece to generate diffracted X-rays, an X-ray
detector positioned to receive the diffracted X-rays, and a controller in communication with the X-ray source, the platen, and the X-ray
detector. The controller includes instructions that enable the ion implanter to perform a
rocking curve test after the workpiece is placed on the platen and calculate an orientation of the platen for the
ion implantation process based on results of the
rocking curve test to facilitate channeling the
ion beam into the crystalline structure of the workpiece.