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266 results about "Bulk crystal" patented technology

Method for determining unknown crystal Bravais lattice by electric back scattering diffraction

The invention provides a method used for determining Bravais lattice of unknown crystal by electron backscatter diffraction. The invention is characterized in that the method comprises the steps as follows: 1) an electron backscatter diffraction spectrum is obtained and the crystal diffraction information in the diffraction spectrum is measured; 2) a two-dimensional reciprocal surface of the crystal is obtained; 3) a three-dimensional reciprocal primitive cell is reconstructed by the two-dimensional reciprocal surface; 4) the cell parameter of the three-dimensional reciprocal primitive cell s worked out according to the width of the Kikuchi band and the angle between the Kikuchi bands in the same Kikuchi electrode; 5) a reciprocal reduced cell of the crystal is solved; 6) the Bravais lattice of the crystal is determined in the reciprocal space; 7) the Bravais lattice of the crystal is determined. In the method, only a scanning electron microscope and an electron backscatter diffraction accessory are used to realize the analysis on unknown lattice of bulk crystals, and the exponential of the Kikuchi band and the Kikuchi electrode in the electron backscatter diffraction spectrum is marked at the same time. The method has no special requirement on the samples to be analyzed, is suitable for quickly analyzing bulk samples, and can be used for analyzing the microstructure morphologies and crystal structure in the buck samples.
Owner:SHANDONG UNIV OF TECH

Method for manufacturing composite substrate comprising wide bandgap semiconductor layer

Provided is a method for manufacturing a low-cost bonded wafer (8) which allows bulk crystals of a wide bandgap semiconductor (1) to be transferred onto a handle substrate (3) as thinly as possible without breaking the substrate. More specifically, provided is a method for manufacturing a bonded wafer (8) by forming a wide bandgap semiconductor film (4) on a surface of a handle substrate (3), the method comprising a step of implanting ions from a surface (5) of a wide bandgap semiconductor substrate (1) having a bandgap of 2.8 eV or more to form an ion-implanted layer (2), a step of applying a surface activation treatment to at least one of the surface of the handle substrate (3) and the ion-implanted surface (5) of the wide bandgap semiconductor substrate (1), a step of bonding the surface (5) of the wide bandgap semiconductor substrate (1) and the surface of the handle substrate (3) to obtain bonded substrates (6), a step of applying a heat treatment to the bonded substrates (6) at a temperature of 150° C. or more and 400° C. less, and a step of subjecting the ion-implanted layer (2) of the wide bandgap semiconductor substrate (1) to irradiation of visible light from the semiconductor substrate (1) side of the bonded substrates (6) to embrittle an interface of the ion-implanted layer (2) and transfer the wide bandgap semiconductor film (4) onto the handle substrate (3).
Owner:SHIN ETSU CHEM IND CO LTD

Europium rare earth metal-organic frame material and preparation method and application thereof

The invention relates to a europium rare earth metal-organic frame material and a preparation method and application thereof. The chemical formula of the product is {[Eu2(L)3(DMF)2]}n. The preparation method comprises the following steps: adding 5-(4-hydroxy-1,2,4-triazolyl)-4-benzene-1,3-dicarboxylic acid and europium chloride hexahydrate into a mixed solution of methanol and DMF, and stirring uniformly to obtain a mixed solution; then charging the mixed solution into a polytetrafluoroethylene lined hydrothermal synthesis high-pressure reaction kettle, cooling and filtering after reaction to obtain colorless bulk crystals; and then repetitively washing the colorless bulk crystals with the mixed solution of methanol and DMF to obtain the metal organic frame material. The europium rare earth metal-organic frame material has the advantages of simple preparation process, mild reaction conditions, high yield and low cost; and at room temperature, chlorobenzene, 1,2-dichlorobenzene, 1,2,4-trichlorobenzene, 1,2,3,4-tetrachlorobenzene, 1,2,4,5-tetrachlorobenzene, pentachlorobenzene and hexachlorobenzene have different degrees of fluorescence quenching responses on the material, and the material has good application prospects in environmental monitoring.
Owner:NANKAI UNIV
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