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Method for repairing display device and apparatus for same

A technology for display devices and surface treatment devices, applied in gaseous chemical plating, coatings, electrical components, etc., can solve problems such as the increase in the cost of inert gases, achieve the effects of reducing quality fluctuations, improving uniformity, and preventing adverse situations

Active Publication Date: 2010-03-10
JAPAN DISPLAY INC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Therefore, if the entire substrate is surrounded by the reaction chamber, the size of the device will be increased, and there will be a problem that not only it takes a lot of time to replace the inert gas such as argon in the reaction chamber, but also the cost of the inert gas will increase.

Method used

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  • Method for repairing display device and apparatus for same
  • Method for repairing display device and apparatus for same
  • Method for repairing display device and apparatus for same

Examples

Experimental program
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Effect test

Embodiment 1

[0066] figure 1 It is a schematic diagram showing a device for repairing the liquid crystal display device (hereinafter sometimes referred to as a repairing device) as Embodiment 1 of the present invention.

[0067] figure 1 Among them, the correction device is roughly composed of the following parts: a local plasma generation part 1 for correcting defects, a gas supply part 2, a plasma reaction part 3, a laser for microprocessing 4, a coating mechanism 5, and a device for identifying defects. A camera 6, a measuring mechanism 7 and a control unit 8 for monitoring the plasma state.

[0068] In the plasma generation unit 1, a thin tube 9 for plasma generation made of a dielectric such as quartz and an electrode 12 for supplying high-frequency power from a high-frequency power source 10 to the outer peripheral region of the thin tube 9 through a matching network 11 are disposed. And constitute. As a specific example, a quartz tube having an inner diameter of φ1.5 mm and an ou...

Embodiment 2

[0097] Next, as a second embodiment of the present invention, a defect correction method of a liquid crystal display device using the correction device described above will be described.

[0098] Here, before describing the defect correction method, use image 3 (a) and (b) schematically illustrate the configuration of a liquid crystal display device to be corrected for defects. image 3 (a) is a sectional view, image 3 (b) is a plan view of a pixel portion.

[0099] exist image 3 In (a), the TFT substrate 311 on which a plurality of pixel portions is formed and the color filter substrate 312 on which a plurality of color filters 308 are formed are arranged such that the pixel portions are opposed to the color filters 308, and there is a gap between them. Liquid crystal 310 is interposed therebetween. Additionally, if image 3 As shown in (b), in the above-mentioned pixel portion, the gate wiring 305 is formed on the TFT substrate 311, and the gate insulating layer 403 ...

Embodiment 3

[0131] In Embodiment 3 of the present invention, the correction device has a coating mechanism for applying a resin material such as a photoresist used as a contact mask, and a laser processing device. The processing device has a mechanism capable of performing fine processing of several μm and irradiating laser light in a wide range of several hundred μm.

[0132] The intensity of the plasma irradiated by the above-mentioned plasma jet 19 on the substrate 16 has a Gaussian distribution. Therefore, distribution of film thickness and film quality characteristics occurs from the center to the periphery of the plasma irradiation region, making it difficult to perform microfabrication on the order of μm with high precision. Therefore, a masking process using a resin-based material is used in this embodiment.

[0133] Figure 6 The correction procedure of the disconnection defect part in this contact mask method is shown. Here, with Figure 6 The manufacturing process of the sh...

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Abstract

An object of the present invention is to provide a method for repairing a display device according to which a wide variety of regions can be repaired in various ways using various materials, as well as an apparatus for the same. The present invention provides a repairing apparatus for repairing a pattern defect on a surface of a substrate in a display device where an electronic circuit pattern having the above described pattern defect is formed, characterized by having a plasma irradiation means for repairing the above described pattern defect through local irradiation of a region including the above described pattern defect with plasma.

Description

[0001] (This application claims priority from Japanese Patent Application JP2008-227750 filed on September 5, 2008 and Japanese Patent Application JP2008-247112 filed on September 26, 2008, the entire contents of which are hereby incorporated by reference.) technical field [0002] The present invention relates to a method of repairing a display device and a device thereof, and relates to returning to normal by correcting a short circuit position and an open circuit position of an electronic circuit pattern on a substrate of a display device using a plasma jet generated under atmospheric pressure Technology. [0003] In addition, the present invention also relates to a production method for locally forming a film or surface treatment and a production apparatus thereof, and particularly relates to a technique for locally forming a film or surface treatment by flowing a gas into a reaction chamber. Background technique [0004] For example, a liquid crystal display device is a...

Claims

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Application Information

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IPC IPC(8): H01L21/00C23C16/04C23C16/50H01J37/32
Inventor 新井武中须信昭枝村理夫大录范行
Owner JAPAN DISPLAY INC
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