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460 results about "Increased diameter" patented technology

Plasma uniformity control by gas diffuser hole design

Embodiments of a gas diffuser plate for distributing gas in a processing chamber are provided. The gas distribution plate includes a diffuser plate having an upstream side and a downstream side, and a plurality of gas passages passing between the upstream and downstream sides of the diffuser plate. The gas passages include hollow cathode cavities at the downstream side to enhance plasma ionization. The depths, the diameters, the surface area and density of hollow cathode cavities of the gas passages that extend to the downstream end can be gradually increased from the center to the edge of the diffuser plate to improve the film thickness and property uniformity across the substrate. The increasing diameters, depths and surface areas from the center to the edge of the diffuser plate can be created by bending the diffuser plate toward downstream side, followed by machining out the convex downstream side. Bending the diffuser plate can be accomplished by a thermal process or a vacuum process. The increasing diameters, depths and surface areas from the center to the edge of the diffuser plate can also be created computer numerically controlled machining. Diffuser plates with gradually increasing diameters, depths and surface areas of the hollow cathode cavities from the center to the edge of the diffuser plate have been shown to produce improved uniformities of film thickness and film properties.
Owner:APPLIED MATERIALS INC

Plasma uniformity control by gas diffuser hole design

Embodiments of a gas diffuser plate for distributing gas in a processing chamber are provided. The gas distribution plate includes a diffuser plate having an upstream side and a downstream side, and a plurality of gas passages passing between the upstream and downstream sides of the diffuser plate. The gas passages include hollow cathode cavities at the downstream side to enhance plasma ionization. The depths, the diameters, the surface area and density of hollow cathode cavities of the gas passages that extend to the downstream end can be gradually increased from the center to the edge of the diffuser plate to improve the film thickness and property uniformity across the substrate. The increasing diameters, depths and surface areas from the center to the edge of the diffuser plate can be created by bending the diffuser plate toward downstream side, followed by machining out the convex downstream side. Bending the diffuser plate can be accomplished by a thermal process or a vacuum process. The increasing diameters, depths and surface areas from the center to the edge of the diffuser plate can also be created computer numerically controlled machining. Diffuser plates with gradually increasing diameters, depths and surface areas of the hollow cathode cavities from the center to the edge of the diffuser plate have been shown to produce improved uniformities of film thickness and film properties.
Owner:CHOI SOO YOUNG +9

Anode for non-transferred arc plasma torch and plasma torch

The invention relates to an anode for an arc plasma torch and a non-transferred arc plasma torch with the anode. The anode comprises a stable arc section and an anode nozzle section which have evenly varied diameters, a burble section which is connected with the two sections and is provided with a groove with increasing diameter, wherein an insulating material is filled in the burble section. The plasma torch comprises a swirler, a cathode, the anode and a cathode-anode isolation sleeve which are arranged coaxially. Working gas flows into the stable arc section by rotation of the swirler, and restricts arc in an axle center position stably; the burble section ensures that air flow generates high frequency turbulence to drive an arc stream to swing in high frequency randomly and constantly impacts the inlet side of the anode nozzle; and the anode arc root moves quickly under the action of high speed air flow. The non-transferred arc plasma torch can obviously improve the arc voltage, the jump frequency and the moving speed of the anode arc root, reduces heat consumption, has the characteristics of high power, low electrode loss rate, high heat conversion efficiency, wide operation parameter range, small arc voltage fluctuation and the like, and is particularly suitable for gas heating.
Owner:UNIV OF SCI & TECH OF CHINA +1

Dual-band and dual-polarization millimeter wave feed source

ActiveCN104979638ASimple structureBreak through the technical problem of dual-frequency dual-polarization millimeter-wave feedWaveguide hornsSimultaneous aerial operationsLow-pass filterDual mode
The invention provides a dual-band and dual-polarization millimeter wave feed source which comprises a radiation end, a Ka-band orthogonal mode coupling and a W-band orthogonal mode coupling. The radiation end and the couplings use a waveguide structure. Dual bands and dual polarization are realized through single caliber. A high band is located in the middle. Low bands carry out feeding from sides. A high-band dual-mode feed source is connected with an external orthogonal mode coupling. The low bands carry out feeding from a circular waveguide segment with increasing diameter. The dual-polarization feed source has a simple main structure, and breaks through the technical problems of the dual-band and dual-polarization millimeter wave feed source. In order to prevent crosstalk and improve the feed source performance, a filter is added on an output rectangular waveguide segment of a low-band orthogonal mode coupling. The filter is a low-pass filter which has low-band passband and high-band stop-band. Two kinds of polarization exit waveguide of two bands are respectively located in four directions of a major radiation waveguide axis, are in pairwise orthogonal, are staggered up and down, are not located in the same level, and are easily connected with rear end waveguide.
Owner:ANHUI SUN CREATE ELECTRONICS
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