A plasma surface modification method for a nanomaterial

A plasma and nanomaterial technology, applied in the field of plasma surface modification, to achieve the effects of high safety, fast processing speed and low cost

Active Publication Date: 2019-04-02
SHANGHAI JIAO TONG UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, for single-type, single-component nanomaterials, some cannot directly have excellent performance, and some will have better performance due to proper doping or combination with other types of nanostructures.

Method used

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  • A plasma surface modification method for a nanomaterial
  • A plasma surface modification method for a nanomaterial

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Embodiment Construction

[0026] The following describes several preferred embodiments of the present invention with reference to the accompanying drawings to make the technical content clearer and easier to understand. The present invention can be embodied in many different forms of embodiments, and the protection scope of the present invention is not limited to the embodiments mentioned herein.

[0027] In the drawings, components with the same structure are denoted by the same numerals, and components with similar structures or functions are denoted by similar numerals. The size and thickness of each component shown in the drawings are shown arbitrarily, and the present invention does not limit the size and thickness of each component. In order to make the illustration clearer, the thickness of parts is appropriately exaggerated in some places in the drawings.

[0028] Such as figure 1 Shown, a kind of method for nanomaterial plasma surface modification, comprises the following steps:

[0029] St...

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Abstract

The invention discloses a plasma surface modification method for a nanomaterial, and relates to the field of micro and nano fabrication in electronic, material, medicine and aerospace fields. The method includes 1) arranging a dielectric barrier discharging type plasma reactor; 2) arranging a substrate material in an air gap; 3) adding a working medium solution; and 4) exciting generation of plasma and allowing the plasma to act on the surface of the substrate material. The method combining heating, reacting and phase change deposition is provided and has advantage of wide-spectrum adaptability, flexibility and reliability. A material surface modification process can be achieved at room temperature or in a natural environment temperature range with a simple device without the need of sealing, and the method is suitable for modification of plurality of special-shape structures and large-area workpieces.

Description

technical field [0001] The invention relates to the field of micro-nano processing in electronics, materials, medicine and aerospace, in particular to a method for plasma surface modification of nanomaterials. Background technique [0002] The processing and preparation technology of nanomaterials is the core key to the engineering application of nanoscience and technology, and is the key prerequisite for obtaining nanoscale effects and forming functional devices. However, for single-type, single-component nanomaterials, some cannot directly have excellent performance, and some will have better performance due to proper doping or combination with other types of nanostructures. Therefore, the surface modification of nanomaterials has received great attention in the industry, including doping inside the lattice, depositing other types of nanostructures on the surface and forming interfaces with other nanostructures, and adding chemical groups on the surface of nanostructures. ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B82B3/00B82Y30/00B82Y40/00
CPCB82B3/00B82Y30/00B82Y40/00
Inventor 侯中宇
Owner SHANGHAI JIAO TONG UNIV
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