530 results about "Metal grating" patented technology

The invention relates an electromagnetic shielding optical window with a two-double cirque metal grating structure, which belongs to the optical transparent piece electromagnetic shielding technical field; the electromagnetic shielding optical window is formed by loading two layers of cirque metal gratings on two sides of the optical window; each layer of cirque metal grating is formed by closely connecting and distributing metal cirque units in a two-dimensional orthogonal arrangement mode; an outside diameter of a cirque of the two layers of cirque metal gratings is greater than pi / 2 times of a side length of a pane of the prior monolayer pane metal grating; the space between two layers of circular metal gratings is two to four times of the outside diameter of the cirque; compared with the prior monolayer pane metal grating, the optical window with the two-double circular metal grating does not reduce light transmittance, substantially improves shielding efficiency, homogenizes high-level energy diffracting distribution and solves the problems that the influences of high light transmittance, strong electromagnetic shielding efficiency and low imaging quality can not simultaneously considered in the prior optical window electromagnetic shielding technology.

A method for extinguishing fire, wherein a gas an aerosol mixture is fed into a space includes steps of igniting a pyrotechnic composition that ensures a predetermined temperature profile during burning and a predetermined composition of the gas and aerosol mixture completely oxidizing the combustion products of incomplete combustion of the pyrotechnic composition by causing them to pass through a bed of catalytically active substances, which is located in the zone of the maximum temperature of the temperature profile of combustion of the pyrotechnic composition, with the temperature remaining constant by redistribution of said profile; cooling the combustion products and completely oxidizing them by reacting with substances having high heat absorbing capacity, concurrently with the filtering of the combustion products according to composition of the gas phase and particle size of the aerosol phase. An apparatus for extinguishing fire, having a casing (1) that has a discharge port (2), a combustion chamber (3) that is accommodated in the casing (1) and heat insulated from the walls of the casing (1), a pyrotechnic composition (4) and an igniter (5) that are received in the combustion chamber, a cooling section (9) and a complete catalytic oxidation section (6) that has a pair of spaced metal gratings (8a, 8b) between which a catalytically active substance is placed and that is located at a fixed distance from the pyrotechnic composition (4). A compensation device (10) is provided for maintaining the above-mentioned fixed distance during the burning of the pyrotechnic composition (4).

In a hybrid-type polarizer having a reflective-type polarizing filter and a color filter, a method of manufacturing the hybrid-type polarizer and a display device having the hybrid-type polarizer, the hybrid-type polarizer includes a base member and a polarizing color filter member. The polarizing color filter member includes a plurality of metal gratings in a plurality of regions of the base member. The metal gratings in the regions have different sizes from each other. Each of the metal gratings transmits a first portion of an incident light and reflects a second portion of the incident light. The invention improves image display quality and lowers the manufacturing cost.

The invention relates to an array multispectral optical filter and a manufacturing method thereof, belongs to the field of a micro-nano optical filter and solves the problem of integration of multichannel array detection in an existing nanofluidic chip. The optical filter only comprises the following four layers of structures: a two-dimensional metal grating layer, a buffer layer, a waveguide layer and a substrate. The invention also provides the manufacturing method of the optical filter, which utilizes a guided mode resonance principle of a two-dimensional metal grating and implements selection of different wavelengths by regulating the period of the grating. By the thickness of the buffer layer, the half-wave bandwidth of the cut-off wavelength also can be regulated. By regulating a suitable duty cycle of the two-dimensional metal grating layer, side lobes can be reduced. Therefore, relative to other turnable optical filters, the array multispectral optical filter manufactured by the method disclosed by the invention has the outstanding advantages of simple structure, low side lobes, adjustability of the half-wave bandwidth, high transmittance, no relation with polarization and the like. After the optical fiber disclosed by the invention is adopted, the integration of the nanofluidic chip can be implemented.

The invention relates to a sub-wavelength wire-grid polarizer, belongs to an optical polarizer, and in particular relates to a wire-grid polarizer. The polarizer aims to solve the problems that the prior wire-grid polarizer is low in transmission and extinction ratio. A wire stripe grid is arranged on a substrate; the surface of the wire stripe grid is provided with a protective layer; an interface of the substrate connected with the wire stripe grid is provided with a multi-layer dielectric film, and the other interface of the substrate is provided with a multi-layer dielectric anti-reflection film; and the multi-layer dielectric film is one of an anti-reflection film, a reflection film and a band pass filter film. Corresponding optical thin films are arranged on an incident light interface and an emergent light interface, so that the polarizer greatly improves the transmission and the polarization extinction ratio and solves the problems of low transmission and polarization extinction ratio in the prior polarizer; the polarizer can be separately used as an optical polarizer or an optical analyzer, and also can be used as a laser output coupling mirror, wherein the output of the laser is linearly polarized light with tunable wavelength. Moreover, the polarizer can be used in the fields such as optical measurement, optical communication, laser and the like.

Method for manufacturing a metal grating structure, wherein, after a concave part having an insulating layer on an inner surface thereof is formed in a silicon substrate, a portion of the insulating layer formed on a bottom part of the concave part is removed, and the silicon substrate at the bottom part of the concave part is etched to increase the surface area of the bottom part of the concave part as compared with a state before the etching, followed by filling the concave part with metal by an electroforming method.

The invention relates to a preparation method of a multilayer metal grating. The preparation method comprises the following steps of: preparing or selecting an imprinting template; spin coating a layer of imprinting glue on an upper surface of a substrate; plating a metal layer on a surface of the imprinting glue; coating a layer of protection film on an upper surface of a metal layer; placing the imprinting template on an upper surface of the protection film, and carrying out nano-imprinting; and after curing the imprinting glue, removing the imprinting template to obtain a double-layer metal grating or the multilayer metal grating. According to the preparation method of the multilayer metal grating, a step of pattern transfer is omitted, the process is simpler, the cost is lower, a metal film obtained through the method cannot be coated on a side wall of a pattern to affect the transmission efficiency, the shape of a cross section of the metal film is strictly matched with the shape of a cross section of the imprinting template, and compared with adoption of a traditional method, the fidelity of the pattern and the TM transmission rate and the polarization rejection ratio of the grating are higher.

The invention relates to a reflection type color filter, comprising pixel arrays with three colors. A pixel structure with each color comprises a substrate, a metal layer positioned on the substrate, a dielectric layer positioned on the metal layer and a two-dimensional metal grating layer positioned on the dielectric layer, wherein the thickness of the metal layer is greater than the skin depth of visible light in the metal layer, and the surface plasma resonance frequency of the pixel structure is the frequency of the complementary color of the pixel color. The reflection type color filter performs optical filtering based on the subtractive theorem, and has the characteristics of high optical energy utilization rate, low angle sensitivity and insensitivity to polarization.

The invention relates to a high-intensity, self-supporting transmission metal grating which is made based on nanometer imprinting technique, and is used for diffraction of deep ultraviolet ray, soft X ray and material particle; the line density of the metal grating is larger than 2000 bars per millimeter, the grating is not supported by any substrate, a gap between the metal lines of the grating is hollow, the metal lines are supported by metal network structure with enough intensity and relatively larger cycle (1 to 40 micrometer), the metal material of the grating is made by gold. The manufacturing steps: (1) high density metal grating is prepared on the substrate through nanometer imprinting technique, reactive ion etching technique and electrochemical filming technique; (2) metallic network supporting structure with major cycle is prepared through photo-etching technique and electrochemical filming technique; (3) the substrate is removed by a chemical etching method to lead the grating to be hollow; (4) focused ion beam technology is used for repairing local defects generated during the manufacturing process of the transmission grating. The metal grating of the invention has the advantages that the manufacture method for the nanometer imprinting technique preparation grating structure is convenient and reliable, which greatly reduces the manufacture cost.

According to a method for manufacturing a metal grating structure of the present invention, in filling a concave portion formed in a silicon substrate (30), for instance, a slit groove (SD) with metal by an electroforming method, an insulating layer (34) is formed in advance on an inner surface of the slit groove (SD) as an example of the concave portion by a thermal oxidation method. Accordingly, the metal grating structure manufacturing method is advantageous in finely forming metal parts of the grating structure. A metal grating structure of the present invention is manufactured by the above manufacturing method, and an X-ray imaging device of the present invention is incorporated with the metal grating structure.

The invention discloses a subwavelength plasmonic microcavity light coupling structure for promoting photoelectric detector response rate. The propagation direction and optical field distribution of incident light are modulated through a plasmonic microcavity, thus the incident light is limited to be propagate in the microcavity, the light escape is reduced, and the utilization rate of photons is raised. The incident light is focused in the microcavity such that the intensity is greatly enhanced, and a photoelectric detector with a high response rate can be formed through clamping photoelectric conversion material in the microcavity. The coupling structure is formed by a metal grating layer formed by upper layer periodic metal bars, a photoelectric conversion activation layer and a lower layer metal reflective layer. The subwavelength plasmonic microcavity light coupling structure has the advantages that by using the mode selection effect of an electromagnetic wave near field coupling microcavity formed by plasmonic resonance between the upper layer metal grating and the lower layer metal reflective layer, thus the photons in the microcavity are propagated along a transverse direction to form standing wave, the light field energy is gathered and the length of equivalent optical absorption is increased, and the response rate of the detector is greatly raised.

This invention provides a nanometer grating used in polarized splitting and combination beam and its process method. The metal grating bar is located in the ditch bottom of the nanometer grating and it deposit a layer of protective film with same quality with upper layer of the grating structure. The process method are the following: 1, first to make nanometer grating by use of synchronization radiation X-ray light etching method; 2, to unromantically coat a metal film with high reflection on the surface of nanometer grating; 3, to remove the metal film on the back of the optical grating by use of ion beam inclined etching method; 4, to cover material with same quality with underlay on the grating surface. The metal grating surface can have an ideal solid surface and reliable protective cover.

A display device for driving liquid drops to move on the basis of an electrowetting effect is characterized by comprising a lower substrate, an electrode plate, a nano-metal grating, a plurality of liquid drops, a super-hydrophobic coating layer, a dielectric layer, an electrode array and an upper substrate in sequence from bottom to top. A cofferdam is added on the periphery between the upper substrate and the lower substrate to form a sealed chamber, the chamber is filled with a second fluid insoluble with the liquid drops, and the single liquid drops in a chamber between the electrode array and the electrode plate which are parallel to each other at least cover two adjacent electrodes of the electrode array. The characteristic that the nano-metal grating is extremely sensitive to changes of the refractive index of an adjacent material is utilized, color filtering is finished by changing the material refractive index, active modulation of transmission and reflection spectrums of the nano-metal grating is achieved, and simultaneously due to the hydrophobic characteristic of the nano-metal grating structure, the electrowetting display modulation contrast and speed can be improved.

The invention relates to a light filter, in particular to an integrated narrowband micro light filter. The integrated narrowband micro light filter is provided with a substrate, a dielectric film layer structure and a metal grating, wherein the dielectric film layer structure is arranged on the upper surface of the substrate and provided with at least two dielectric film layers; the refractive indexes of the dielectric film layers are different; the metal grating is arranged on the upper surface of the dielectric film layer structure and is a one-dimensional metal grating or two-dimensional metal grating. By adjusting the period of the grating and the refractive indexes and thickness of the dielectric film layers, the center wavelength and bandwidth of a passing band of the light filter can be adjusted. The integrated narrowband micro light filter is small in size and can be integrated and applied on a micro optical system and a photoelectric device conveniently. The integrated narrowband micro light filter is used for integrating the micro optical system or being integrated on the photoelectric device to achieve the light filtering function. The integrated narrowband micro light filter can be manufactured on a transparent dielectric substrate to serve as a unit element to be used on the micro optical system, and can also be integrated in the photoelectric device to serve as a structural unit so as to filter light reflected by the photoelectric device.

The invention discloses a high-linearity degree-of-polarization quantum-well infrared detector with a plasmon micro-cavity coupled structure. The detector is composed of an upper metal grating layer, a quantum-well infrared photovoltaic conversion activating layer and a lower metal reflecting layer, wherein the upper metal grating layer is formed by metal strips. The detector has the advantages that under the mode selection effect of an electromagnetic wave near-field coupled micro cavity formed by plasmon resonance between the upper metal grating layer and the lower metal reflecting layer, photons capable of entering the micro cavity are mainly photons capable of achieving resonance with a detected wavelength polarization mode; the direction of electric vectors of the photons entering the micro cavity is changed to the z direction from the x direction by being modulated in a micro-cavity mode, and the photons can be absorbed by quantum-well sub-bands in a transition mode to achieve the photovoltaic conversion process. With the advantages, the polarization coupled structure can greatly improve the extinction ratio of polarization responses, and extremely-high polarization distinguishing capacity of the detector is achieved.

The invention discloses a converging enhancement photo-response superconductivity single photon detector and a preparing method thereof. The converging enhancement photo-response superconductivity single photon detector comprises a magnesium oxide (MgO) substrate, a superconductivity single photon detector, a transparent medium isolation layer, a metal reflecting layer, a transparent medium layer, a metal barrier layer and a metal grating layer. The superconductivity single photon detector, the transparent medium isolation layer, the metal reflecting layer, the transparent medium layer and the metal grating layer grow on the MgO substrate in sequence from the lower upward. The metal barrier layer is located on the periphery of the transparent medium layer, and connected with the metal reflecting layer and the metal grating layer. The metal grating layer is of a homocentric metal multi-loop structure. The metal reflecting layer is composed of a metal ring and a transparent medium ring, and the metal ring and the transparent medium ring are homocentric. The converging enhancement photo-response superconductivity single photon detector converges incident signal light in a large area scope onto a superconductivity single photon detector photosensitive surface with small area so as to observably improve responses of the superconductivity single photon detector, and can improve the responses by 30 times to the utmost.

The invention relates to a polarization-independent broadband absorber which is used for infrared band and based on a conical metal-dielectric multilayer grating structure. The polarization-independent broadband absorber comprises a metal-dielectric multilayer grating, a metal film reflecting layer and a dielectric substrate which are arranged from top to bottom, wherein the period d of the metal-dielectric multilayer grating is 1640-1645 nm, the metal-dielectric multilayer grating is formed by overlaying N pairs of metal gratings and dielectric gratings, and the duty cycle is gradually increased from top to bottom. When TE light and TM polarized light are vertically incident, the incident light in one relatively broad wave band range of the infrared band can be absorbed, bandwidth with polarization-independent absorption rate exceeding 90% is greater than 2 microns, and high polarization-independent absorption can be maintained in a great incident angle range, so that the polarization-independent broadband absorber provided by the invention has great angle independence and can be widely applied to the fields of thermo-photovoltaic devices, infrared stealth and the like. The polarization-independent broadband absorber provided by the invention is processed by combining a microelectronic deep etching technology, has easy accessibility of materials, low manufacturing cost and important practical prospect, and can realize mass production.

A waveguide coupling probe (10) for sending light into an optical waveguide on a substrate or for receiving light from an optical waveguide on a substrate is provided, the waveguide coupling probe comprising an optical element (11) for guiding the light in a propagation direction, the optical element (11) having a facet (15) where the light enters or exits the optical element (11) and means for coupling the light between the optical element (11) and the waveguide. A waveguide coupling probe (10) according to the present invention is characterized in that the light coupling means are formed on the facet (15) and comprise a diffraction structure (14). In a preferred embodiment the optical element (11) may be an optical fiber and the diffraction structure may be a strong diffraction structure, e.g. a metal grating structure. When bringing the waveguide coupling probe (10) in the vicinity of a waveguide on a substrate, the light that is guided by the waveguide may be diffracted into the optical element (11). Alternatively, light from the optical element (11) may be coupled into the waveguide. When using the waveguide coupling probe (10) for coupling light between the optical element (11) and a waveguide, the waveguide coupling probe may be positioned out of the plane of the waveguide. Furthermore a method is provided for forming an optical structure, e.g. a metal grating structure, on a facet (15) of an optical element (11).

The present invention provides a hybrid dielectric / SPP waveguide that can form either a single mode, single polarization waveguide, or a multi-mode waveguide. When multi-mode, this invention effectively transfers energy back and forth between the dielectric waveguide and metal surface. This improves on standard SPP modes, yielding longer range propagation along with high intensity near the metal surface at decisive locations. When single-mode, this hybrid waveguide allows for control of propagation and confinement for applications such as telecommunications optics integrated on silicon microchips. Gratings may be patterned in the metal for coupling light into and out of the modes or for use as mirrors in the mode. For areas where very long ranges are required, a metal grating may be used to couple light into the mode, but then the metal may be removed in other regions and make the range of the mode virtually infinite (limited by surface roughness).

The invention provides a preparation method of a nanometer metal grating and a nanometer metal grating. The method includes providing a substrate on which a metal layer is arranged; forming an impression glue layer on the metal layer; impressing the impression glue layer with an impression template with a grating period pattern; solidifying a impression glue layer, removing the impression template after the solidification, forming the impression glue with the grating period pattern, and remaining the impression glue at the bottom of the grating period pattern; removing the residual impression glue by means of oxygen ashing, exposing the metal layer at the bottom of the grating period pattern, and forming a metal oxide film on the surface of the exposed metal layer; removing the impression glue with the grating period pattern; and taking the metal oxide film as a mask layer, and patterning the metal layer to form a nanometer metal grating. The method is advantageous in that the problem that the metal layer in the prior art cannot be etched after the oxidation is solved; and the metal oxide film is taken as the mark layer for the subsequent technology, and can be used as a nanometer metal grating protective layer.

According to a method for manufacturing a metal grating structure of the present invention, in filling a concave portion formed in a silicon substrate (30), for instance, a slit groove (SD) with metal by an electroforming method, an insulating layer (34) is formed in advance on an inner surface of the slit groove (SD) as an example of the concave portion by a thermal oxidation method. Accordingly, the metal grating structure manufacturing method is advantageous in finely forming metal parts of the grating structure. A metal grating structure of the present invention is manufactured by the above manufacturing method, and an X-ray imaging device of the present invention is incorporated with the metal grating structure.

Disclosed is an electromagnetic wave transmission device with regulative and controllable magnetic field based on sub-monolayer wavelength metal grating; the device comprises a sub-monolayer wavelength metal grating and magnetoactive medium filled in the slit of the sub-monolayer metal grating; the metal part of the device and the magnetoactive medium have the same thickness, the thickness at least meets and supports the lowest-level Fabry-Perot cavity resonance demand of the designed work wavelength in the grating slit; the period and slit of the grating are shorter than the wavelength of the electromagnetic wave. By changing the size of the additional magnetic field, the propagation constant of the waveguide mode in the metal grating slit can be regulated to change the electromagnetic transmission characteristic of the device and realize the purpose of initial regulation of polarization-independent electromagnetic wave transmission spectrum and the electromagnetic wave transmission spectrum magnetic field.

The invention discloses a surface plasmon polariton-enhanced photoelectric detector based on an MIM (Metal Injection Molding) structure. The photoelectric detector comprises a substrate, and is characterized in that a lower metal film layer, a lower dielectric isolating layer, an upper metal film layer, an upper dielectric isolating layer and a metal grating layer are formed in sequence on the substrate from top to bottom. The surface plasmon polariton-enhanced photoelectric detector further comprises an upper metal film layer electrode lead, a lower metal film layer electrode lead, and a detector output port which is connected to the upper and lower metal film layers respectively. In the design, the local light trapping effect of a grating layer is achieved through the metal optical grating layer serving as a core, and an electron current tunneling effect is caused by remarkable difference between the light absorption of the upper and lower metal film layers. The photoelectric detector has the characteristics of small size (nanoscale), small number of consumables, simple structure, easiness in machining, wide spectral response, large detection angle and the like.

An apparatus for emitting polarized light and a method for fabricating such apparatus are provided. The apparatus includes a surface emission light emitting diode (LED), a first electrode, and a sub-wavelength metal grating (SWMG). The surface emission LED includes a first contact surface and a second contact surface. The first electrode is coupled to the first contact surface. The SWMG is formed on a surface of the surface emission LED.

The invention discloses an adjustable electromagnetic wave transmitting frame, which is based on sub-wavelength metal double gratings and comprises two single layer sub-wavelength metal gratings, wherein the two single layer sub-wavelength metal gratings are arranged in parallel, distance and transverse displacement of the gratings can be adjusted. The frame is based on a waveguide module of metal surface plasmons, incident electromagnetic waves which are adjustable are p-polarizations, a period of a grating is less than wave length of the electromagnetic waves, and a slot width is less than half-wave length of a electromagnetic wave. Coupling effects which are through evanescent field between the gratings can be adjusted through changing the distance G and the transverse displacement L which are between neighboring metal gratings, thereby electromagnetic transmitting property of a component can be changed, and the purpose for adjusting electromagnetic wave transmitting spectra can be achieved.

The invention discloses a polarized structure. The polarized structure comprises two transparent glass boards which are parallel, wherein a metal grating layer is arranged on the inner surface of each transparent glass board, each metal grating layer comprises a plurality of metal lines which are parallel, and the axial included angle of 90 degrees is formed between the metal lines on the two transparent glass boards. The invention further provides a liquid crystal display with the polarized structure. A transparent substrate provided with the metal grating layers formed by the metal lines which are parallel replaces an existing polarized board to achieve the polarization function, and the problem that the existing polarized board is prone to deforming due to environment temperature is solved effectively; the liquid crystal display with the polarized structure not only saves polarized materials, removes the procedure for pasting the polarized board and effectively shortens the time of the whole procedure, but also effectively solves the problem of light leakage caused by deformation of the polarized board, and increases quality of pictures.

In a hybrid-type polarizer having a reflective-type polarizing filter and a color filter, a method of manufacturing the hybrid-type polarizer and a display device having the hybrid-type polarizer, the hybrid-type polarizer includes a base member and a polarizing color filter member. The polarizing color filter member includes a plurality of metal gratings in a plurality of regions of the base member. The metal gratings in the regions have different sizes from each other. Each of the metal gratings transmits a first portion of an incident light and reflects a second portion of the incident light. The invention improves image display quality and lowers the manufacturing cost.

The invention relates to a light-emitting diode (LED) light source which produces light through a semiconductor band gap structure, in particular to an electromagnetic wave transmission structure, namely an active polarized light emission optical device with a composite micro-nano surface grating structure. The LED comprises a substrate (1), an n-type layer (2), a quantum well (3), a p-type layer (4) and a metal grating (6) and is characterized in that: a composite structure of a medium transition layer (5) and the metal grating (6) is plated or etched on the upper surface of the p-type layer (4); the refraction index of the medium transition layer meets the conditions that: n is greater than 1.0 and less than the refraction index of the p-type layer medium (4); and the transition layer is one of a thin film structure, a grating structure and an embedded structure. Due to the adoption of the structure, the transmission and extinction characteristics of the LED can be enhanced effectively; and in a period, the flatness of the side face of the grating, the duty ratio of the grating, and the range of working wavelengths are obviously improved compared with those of a conventional single-layer metal grating.

The invention discloses a method for preparing high aspect ratio metal microgratings on a metal substrate, and belongs to the micro-manufacturing technical field. A UV-LIGA technology is adopted, the photolithography technological processes such as two-time photoresist homogenizing, layered exposure and one-time developing are executed on a high-purity nickel plate substrate J to obtain an SU-8 photoresist film, and then the metal microgratings can be manufactured through micro electroforming nickel N after micro electroforming treatment; a line width compensating method is used for solving the problem that line width is decreased due to swelling; in the photoresist removing process, a 'ultrasound-soaking-ultrasound-soaking' circulating method is used for removing photoresist; in annealing operation, vacuum annealing is adopted to remove residual stress, and the binding force between the substrate and the metal gratings is improved. The method for preparing high aspect ratio metal microgratings on the metal substrate has the advantages that when the method is used for preparing the metal microgratings on the metal substrate J, the depth-to-width ratio is large, dimensional precision is high, mechanical strength is high, the preparation technology is simple, and cost is low.

The invention relates to a reflecting color filter, which comprises a substrate, a high-reflecting metal layer, a resonant cavity layer and a half-reflecting and half-transmitting metal layer, wherein an interface part of the resonant cavity layer and the half-reflecting and half-transmitting metal layer has a wire grating structure; the half-reflecting and half-transmitting metal layer covers the wire grating structure to form a metal grating; and the period of the metal grating is less than 400 nm. By adjusting parameters such as the thickness of a wire grating resonant cavity, the radio of the width to the period of a wire grating, the thickness of a reflecting layer 2 and the thickness of a coverage layer, the reflecting color filter which is low in angle sensitivity, appropriate in bandwidth and low in sideband reflectivity can be obtained, and the reflecting filtration of different colors can be realized.