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Nano level grating for polarization beam division / combination and method for making same

A manufacturing method and nano-grating technology, applied in diffraction grating, polarizing element, optics and other directions, can solve the problems of small grating area and insufficient grating line width, and achieve the effect of improving work efficiency

Inactive Publication Date: 2005-01-19
GUANGXUN SCI & TECH WUHAN
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, the grating produced by the above method either has a small area, or the line width of the grating is not thin enough.

Method used

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  • Nano level grating for polarization beam division / combination and method for making same
  • Nano level grating for polarization beam division / combination and method for making same
  • Nano level grating for polarization beam division / combination and method for making same

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Embodiment Construction

[0033] The main technical basis of the invention is to realize the ordinary nanoscale grating structure by using the synchrotron radiation X-ray photolithography process. The use of X-ray lithography to obtain nanostructures has a relatively mature process foundation in the laboratory, but in the process of practical application, the requirements of large area and uniformity put forward new requirements for the lithography process. By improving the lithography stepping device and in-depth study of the lithography process, the production of large-area nano-gratings can be realized and the uniformity of the microstructure can be ensured. Compared with the current deep ultraviolet laser holographic exposure method, its line width can be improved from about 200nm to about 100nm. Compared with the electron beam exposure method, the area size of the material can be expanded from the order of millimeters to the order of 10 centimeters. We use synchrotron radiation light sources to m...

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Abstract

This invention provides a nanometer grating used in polarized splitting and combination beam and its process method. The metal grating bar is located in the ditch bottom of the nanometer grating and it deposit a layer of protective film with same quality with upper layer of the grating structure. The process method are the following: 1, first to make nanometer grating by use of synchronization radiation X-ray light etching method; 2, to unromantically coat a metal film with high reflection on the surface of nanometer grating; 3, to remove the metal film on the back of the optical grating by use of ion beam inclined etching method; 4, to cover material with same quality with underlay on the grating surface. The metal grating surface can have an ideal solid surface and reliable protective cover.

Description

technical field [0001] The invention relates to a nano-scale grating for polarization beam splitting / combining and a manufacturing method thereof, in particular to a micro-optical device made of nano-scale artificial optical crystal material, especially for polarization beam splitting / combining nano-scale Grating design and fabrication methods. Background technique [0002] At the 2002 NFOEC meeting in the United States, NanoOpto demonstrated a light polarization beam splitter / beam combiner made of nano-scale artificial optical crystal materials, and its performance has reached or even exceeded that of devices made of traditional birefringent materials. It is widely concerned by the optical communication device industry. Its nano-optical crystal material samples have entered the laboratories of many large optical device manufacturers. [0003] The use of nanoscale artificial optical crystals to make polarization beam splitters / combiners for optical communications is just a...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02B5/18G02B5/30G02B27/28
Inventor 刘文
Owner GUANGXUN SCI & TECH WUHAN
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