Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Polarization-independent broadband absorber based on conical metal-dielectric multilayer grating structure

A grating structure, dielectric technology, applied in diffraction gratings, instruments, optics, etc., can solve the problems of limited application and difficult to manufacture polarization-independent broadband absorbers, and achieve flexible and convenient use, wide polarization-independent absorption bandwidth, and stable performance. Effect

Inactive Publication Date: 2016-06-08
SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
View PDF1 Cites 26 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Nevertheless, these polarization-independent broadband absorbers based on 2D anisotropic metamaterials are difficult to fabricate, which also limits their potential applications.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Polarization-independent broadband absorber based on conical metal-dielectric multilayer grating structure
  • Polarization-independent broadband absorber based on conical metal-dielectric multilayer grating structure
  • Polarization-independent broadband absorber based on conical metal-dielectric multilayer grating structure

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0018] The present invention will be further described below in conjunction with the embodiments and accompanying drawings, but the protection scope of the present invention should not be limited thereby.

[0019] see first figure 1 , figure 1 It is the geometric structure of the polarization-independent broadband absorber based on the tapered metal-dielectric multilayer grating structure used in the infrared band of the present invention. In the figure, regions 1 and 4 are uniform, respectively air (refractive index n 1 =1) and fused silica (refractive index n 2 = 1.45). TE polarized light (the direction of the electric field is along the y-axis) and TM polarized light (the direction of the magnetic field is along the y-axis) are incident on the device at a certain angle θ.

[0020] As can be seen from the figure, the polarization-independent broadband absorber based on the tapered metal-dielectric multilayer grating structure for the infrared band of the present inventio...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
Thicknessaaaaaaaaaa
Thicknessaaaaaaaaaa
Thicknessaaaaaaaaaa
Login to View More

Abstract

The invention relates to a polarization-independent broadband absorber which is used for infrared band and based on a conical metal-dielectric multilayer grating structure. The polarization-independent broadband absorber comprises a metal-dielectric multilayer grating, a metal film reflecting layer and a dielectric substrate which are arranged from top to bottom, wherein the period d of the metal-dielectric multilayer grating is 1640-1645 nm, the metal-dielectric multilayer grating is formed by overlaying N pairs of metal gratings and dielectric gratings, and the duty cycle is gradually increased from top to bottom. When TE light and TM polarized light are vertically incident, the incident light in one relatively broad wave band range of the infrared band can be absorbed, bandwidth with polarization-independent absorption rate exceeding 90% is greater than 2 microns, and high polarization-independent absorption can be maintained in a great incident angle range, so that the polarization-independent broadband absorber provided by the invention has great angle independence and can be widely applied to the fields of thermo-photovoltaic devices, infrared stealth and the like. The polarization-independent broadband absorber provided by the invention is processed by combining a microelectronic deep etching technology, has easy accessibility of materials, low manufacturing cost and important practical prospect, and can realize mass production.

Description

technical field [0001] This patent relates to a broadband spectral absorber, especially a polarization-independent broadband absorber based on a tapered metal-dielectric multilayer grating structure for infrared bands. Background technique [0002] Generally speaking, spectral absorbers based on subwavelength structures are divided into two types: one has ideal absorption in a narrow bandwidth, and is mainly used to design high-sensitivity detectors, thermal imaging devices, and narrow-band absorption / thermal radiation is often referred to as a selective absorber. The other has high absorption in a wide band range, called broadband absorber, which is mainly used in solar cells, thermal photovoltaic devices and stealth and other fields. At present, research on broadband absorption based on subwavelength structures has become a hot topic. [0003] However, the current absorbers have the defects of narrow absorption bandwidth and sensitivity to polarization. In order to expa...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): G02B5/18G02B27/42
CPCG02B5/1814G02B27/42
Inventor 吴俊周常河李民康项长铖
Owner SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products