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192 results about "Broadband absorption" patented technology

Semiconductor nanocrystal quantum dots and metallic nanocrystals as UV blockers and colorants for suncreens and/or sunless tanning compositions

The present invention is directed to photostable sunscreen and/or artificial tanning compositions including quantum dot nanocrystals of a material selected from semiconductor nanocrystals, modified semiconductor nanocrystals, multicomponent semiconductor/semiconductor nanocrystals, and hybrid semiconductor/metal nanocrystals, the quantum dot nanocrystals having an absorption band gap occurring at wavelengths higher than 400 nm whereby the quantum dot nanocrystals have substantial broadband absorption properties of ultraviolet light at wavelengths across the range of both UV-A (320-400 nm) and UV-B (280-320 nm), and a dermatologically acceptable carrier for the quantum dot nanocrystals. The present invention is further directed to photostable sunscreen and/or artificial tanning compositions including a material selected from metallic nanocrystals, multicomponent metal/metal nanocrystals, and alloyed metal nanocrystals, the metallic material having a surface plasmon resonance occurring sufficiently into the visible or infrared spectral region whereby broad absorption features due to electronic transitions, the broad absorption features located at higher energies, provide substantial broadband absorption properties of ultraviolet light at wavelengths across the range of both UV-A (320-400 nm) and UV-B (280-320 nm), and a dermatologically acceptable carrier for the metallic material.
Owner:LOS ALAMOS NATIONAL SECURITY

Optical modulation terahertz broadband wave absorber based on doped silicon

The invention discloses an optical modulation terahertz broadband wave absorber based on doped silicon. A three-layer structure comprises a silicon substrate layer, a metamaterial layer and an opticalpumping source, which are sequentially arranged from bottom to top; the silicon substrate layer and the metamaterial layer are both boron-doped p-type silicon materials; and the metamaterial layer iscomposed of a unit structure array. The unit structure arrays are periodically arranged on the silicon substrate layer in an xoy plane; terahertz waves are incident on the wave absorber; the opticalpumping source is coupled into the wave absorber and excites electromagnetic resonance to realize broadband absorption of terahertz waves; and the optical pumping source generates a pumping light beamwhich is directly incident on the silicon substrate layer and the metamaterial layer to change the carrier concentration of doped silicon and realize the modulation function of the wave absorber on the absorption frequency band and the absorption rate of the terahertz waves. The terahertz wave absorption device is simple in structure, single in material, easy to process, high in terahertz wave absorption rate and wide in absorption bandwidth, has a light modulation function, and can be widely applied to multiple fields of imaging, stealth, communication, terahertz detection and the like.
Owner:CHINA JILIANG UNIV

Micro-bridge structure of broadband high-absorption terahertz wave and fabrication method thereof

The invention provides a micro-bridge structure of a broadband high-absorption terahertz wave and a fabrication method thereof, which belong to the technical field of imaging of a terahertz detection array at a room temperature and are used for solving the problem of low responsivity under a wide frequency band of a terahertz detector. The micro-bridge structure comprises a metal absorption film at a top layer, a metamaterial pattern at an intermediate layer and a micro electro-mechanical system (MEMS) micro bridge at a bottom layer, wherein silicon nitride dielectric layers are arranged among the metal absorption film, the metamaterial pattern and the MEMS micro bridge in a pairwise manner at intervals; the metal absorption film is an impedance-matching nano-scale metal absorption film; and the metamaterial pattern and the MEMS micro bridge jointly form a metamaterial absorption structure. By the impedance-matching nano-scale metal absorption thin film, the broadband absorption of the terahertz wave can be achieved, and high absorption of the terahertz can be guaranteed through the metamaterial absorption structure jointly formed by the metamaterial pattern and the MEMS micro bridge; the performance for broadband spectrum response and high absorption of the terahertz wave is achieved, and the responsivity of a micro-bridge structurized detection unit to the terahertz wave is comprehensively improved.
Owner:UNIV OF ELECTRONICS SCI & TECH OF CHINA

Method and device for realizing wave absorbing of graphene at visible light waveband

ActiveCN109188579AImprove performanceExcellent broadband light absorption effectOptical elementsMicro nanoMicro structure
The invention discloses a method and a device for realizing wave absorbing of graphene at a visible light waveband, and belongs to the field of photoelectric detection and micro-nano optical, mechanical and electrical systems. A multi-groove structure provided by the invention is a periodic micro-structure, a primitive cell (a basic unit of the structure) of the periodic micro-structure is formedby a plurality of narrow metal grooves with the same width and different depths, a dielectric coating layer is filled into the grooves and above the grooves, and the graphene is deposited above the dielectric coating layer. For TM polar incident light waves, due to a cavity resonance effect of the grooves, the grooves with different depths correspond to different graphene light absorption wavelengths, and broadband absorption of the graphene at the visible light waveband can be realized through combination of the grooves with the different depths. In addition, an absorption spectrum of a waveabsorber is insensitive to the change of an incident angle, and even the incident angle is obviously changed, the graphene still has excellent broadband light absorption performance; and the method and the device have an application prospect in the fields such as light modulators, solar cells, touch screens, biological sensing and the like.
Owner:JIANGNAN UNIV

Design method of terahertz broadband absorption metamaterial

InactiveCN107093805ABroaden the absorption spectrumGuaranteed Relative Absorption BandwidthAntennasOptical elementsDielectricBroadband absorption
The invention belongs to the field of electromagnetic wave absorption and radiation control, and in particular relates to a design method of a terahertz broadband absorbing metamaterial. According to the effective medium theory, and using CST microwave studio to obtain S parameters through frequency domain simulation, the periodic unit structure is at x Both the and y directions are periodically distributed, and are set as periodic boundary conditions. Combining the parameters S11 and S21 obtained by scanning, the impedance value is calculated. By changing the period of the unit structure and the size of the metal thin film and dielectric material, the corresponding absorption frequency is adjusted, and multiple metal thin films and dielectric materials are cross-stacked in one unit period, so that the absorption lines corresponding to different resonant circular frustums are superimposed. The invention can effectively broaden the absorption spectrum of the terahertz frequency band, so that the frequency band with an absorption rate exceeding 90% can be widened, and meanwhile, a certain high relative absorption bandwidth can be guaranteed. And the first 9 absorption peaks are caused by the interior of the unit structure, so they are not affected by the period.
Owner:HUBEI UNIV OF TECH

Graphene electro-optical modulator based on high-Q-value annular resonant cavity

InactiveCN104297949AResolve Modulation DepthSolve the dilemma of modulation bandwidth trade-offNon-linear opticsModulation bandwidthBroadband absorption
The invention provides a graphene electro-optical modulator based on a high-Q-value annular resonant cavity. The graphene electro-optical modulator based on the high-Q-value annular resonant cavity comprises a high-Q-value annular resonant system. A part of the perimeter of an annular waveguide of the high-Q-value annular resonant system is adopted for covering and manufacturing a double-layer graphene thin film modulation system. The double-layer graphene thin film modulation system comprises a bottom layer dielectric layer, bottom layer graphene, a middle dielectric layer and top layer graphene. A voltage V(t) is added between the top layer graphene and the bottom layer graphene. According to the modulator, material advantages such as high broadband absorption and carrier mobility of graphene and the structure advantage of optical path amplification of the high-Q-value annular optical resonant cavity are integrated, the modulation depth is increased, the maximum modulation frequency is increased in the mode that RC delay is reduced through reduction of the area of the graphene, and therefore the problem that the modulation depth and the modulation bandwidth in an existing straight waveguide graphene modulator are decreased and increased alternately is solved. The 3dB bandwidth can reach the modulation frequency of over 100 GHz expectantly.
Owner:ZHONGBEI UNIV

Uncooled infrared focal plane integrated with broadband artificial surface and manufacturing method thereof

The invention discloses an uncooled infrared focal plane integrated with a broadband artificial surface and a manufacturing method thereof, relates to the technical field of infrared detection and imaging, and solves the problems that the existing uncooled focal plane increases the complexity of an absorption layer for achieving broadband absorption and the performance is limited due to a multi-layer micro-bridge structure. The focal plane comprises an array consisting of a plurality of picture elements, wherein each picture element sequentially comprises a readout circuit which is a silicon-based or germanium-based CMOS integrated circuit with the functions of amplifying and reducing noise, and a readout electrode pair is arranged on the CMOS integrated circuit; an adiabatic microbridge comprises a microbridge deck, two microsupport structures and two microcantilever beams; a thermistor layer is a material with the absolute value of a temperature resistance coefficient higher than 2%;the readout electrode is connected with the thermistor layer through a through hole; the thermistor layer is protected by a passivation insulating layer; a broadband absorption film layer comprises ametal layer, a dielectric layer and a metal microarray; the manufacturing method is compatible with the traditional uncooled infrared detector processing technology, and the process is simple, and the large-scale and low-cost preparation are facilitated.
Owner:CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI

Selective absorption emitter

The invention discloses a selective absorption emitter. The selective absorption emitter comprises a substrate, a metal film covering the substrate and a cell array arranged on the metal film, whereinthe unit array is composed of a plurality of basic units which are arranged at intervals and have the same shape and the same size, each basic unit is composed of a plurality of stacks which are sequentially stacked from top to bottom, each stack comprises a metal layer and a dielectric layer located on the lower side of the metal layer or two dielectric layers with different refractive indexes,and the included angle between the side surfaces of the basic units and the normal of the substrate is minus 80-80 degrees. The selective absorption emitter is a broadband absorption emitter with wavelength selectivity. The correlation degree between the working wavelength of the emitter and the diameter or the length of the tops and the bottoms of the basic units in the unit array is small, the requirement on the precision of preparation technology is low, when the working wavelength of the emitter ranges from 8 microns to 13 microns, and high absorption and high emissivity are achieved, theemitter can be used for passive radiation refrigeration, and the required absorption characteristics can be obtained in other wavelength ranges by changing array design parameters.
Owner:NINGBO INST OF MATERIALS TECH & ENG CHINESE ACADEMY OF SCI

Mn<4+> doped fluoride red light fluorescent powder for high color rendering and warm white light LED (Light Emitting Diode) and preparation method of Mn<4+> doped fluoride red light fluorescent powder

The invention discloses Mn<4+> doped fluoride red light fluorescent powder for a high color rendering and warm white light LED (Light Emitting Diode) and a preparation method of the Mn<4+> doped fluoride red light fluorescent powder. The chemical composition of a fluorescent powder material is Rb2AF6:xMn<4+>, wherein A is Zr or Ti, x is the mol percentage coefficient of Mn<4+> doped ions relative to the A, and the x is greater than or equal to 1.25 percent and smaller than or equal to 20 percent. The fluorescent powder material has the effects of broadband absorption and narrowband emission, and can be used for packaging a high-quality LED. The preparation method comprises the following steps: at room temperature, adding K2MnF6 powder into water, and stirring until the power is completely dissolved; then adding RbF powder and H2AF6 aqueous solution, continuously stirring until the substances are dissolved, centrifuging, washing and drying to obtain an orange-yellow sediment, namely the Mn<4+> doped fluoride red light fluorescent powder for the high color rendering and warm white light LED. The preparation method disclosed by the invention has the advantages of simplicity and convenience in operation, greenness, environment friendliness, mild reaction conditions, high efficiency, quickness and suitability for industrial large-scale production.
Owner:SOUTH CHINA UNIV OF TECH

Strong-absorption optothermal detector and preparation method thereof

The invention relates to the technical field of detectors, in particular to a strong-absorption optothermal detector and a preparation method thereof. The optothermal detector is constituted by a substrate layer, an optothermal detecting structure, a first electrode and a second electrode. The substrate layer is covered with the optothermal detecting structure, and the first electrode and the second electrode are connected to the two sides of the optothermal detector correspondingly. The optothermal detecting structure comprises a thermal-sensitive line, a plurality of micro holes are formed in the upper surface of the thermal-sensitive line, a noble metal particle layer adheres to each of the surface of the thermal-sensitive line and the surfaces of the inner walls of the micro holes to increase the acting area of incident light and the noble metal particle layers so as to increase absorption of the incident light, and thus stronger surface plasmon resonance is caused to form broadband absorption. The micro holes are made of thermal-sensitive materials, heat absorbed by the optothermal detecting structure is transmitted more advantageously, the detecting sensitivity is improved advantageously, the optothermal detecting precision is improved advantageously, and the application range is enlarged advantageously.
Owner:安徽唯诗杨信息科技有限公司
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