The invention relates to the field of film surface coarsening rate, in particular to a method for regulating the surface coarsening rate of a film in an in-situ large range. The method comprises a sample material, wherein the sample material is hafnium nitride; in the preparation process, an amorphous layer is introduced by adopting a magnetron co-sputtering method, and an amorphous coating effectis utilized to prevent uphill diffusion so as to obtain a low coarsening rate. According to the method, an atom-increasing diffusion theory is guided to practice, the complex diffusion is simplified,only uphill and downhill diffusion affecting the surface coarsening rate is considered, and a novel method for controlling the surface growth by the atomic level is provided. By introducing the amorphous layer, the uphill and downhill diffusion probability ratio is greatly reduced through preventing the uphill diffusion, so that the very low coarsening rate is obtained, and the ultra-smooth filmis prepared; and due to the fact that elements which are not wetted with a parent material are introduced, the uphill and downhill diffusion probability ratio is greatly reduced through preventing thedownhill diffusion, so that a very high coarsening rate is obtained, and a super-rough film is prepared.