Method for regulating surface coarsening rate of film in in-situ large range

Abstract

The invention relates to the field of film surface coarsening rate, in particular to a method for regulating the surface coarsening rate of a film in an in-situ large range. The method comprises a sample material, wherein the sample material is hafnium nitride; in the preparation process, an amorphous layer is introduced by adopting a magnetron co-sputtering method, and an amorphous coating effectis utilized to prevent uphill diffusion so as to obtain a low coarsening rate. According to the method, an atom-increasing diffusion theory is guided to practice, the complex diffusion is simplified,only uphill and downhill diffusion affecting the surface coarsening rate is considered, and a novel method for controlling the surface growth by the atomic level is provided. By introducing the amorphous layer, the uphill and downhill diffusion probability ratio is greatly reduced through preventing the uphill diffusion, so that the very low coarsening rate is obtained, and the ultra-smooth filmis prepared; and due to the fact that elements which are not wetted with a parent material are introduced, the uphill and downhill diffusion probability ratio is greatly reduced through preventing thedownhill diffusion, so that a very high coarsening rate is obtained, and a super-rough film is prepared.

Description

technical field [0001] The invention relates to the field of film surface roughening rate, in particular to a method for in-situ large-scale regulation and control of film surface roughening rate. Background technique [0002] With the rapid development of modern life sciences, physics, and chemistry, more and more thin film materials with special surfaces are being used in emerging technology fields such as energy storage, superconductivity, metasurfaces, catalysis, and biomedicine. In these applications, the control of thin film surface topography and roughness is critical. For example, in order to improve the durability and reliability of small mobile mechanical parts in micro-electro-mechanical systems, the roughness of the durable protective film plated on the sliding pin needs to reach at least an ultra-smooth state below 1nm; in order to reduce frictional resistance and be able to adhere to lubrication For oil, the roughness of the gear surface needs to be in the int...

AI Technical Summary

Problems solved by technology

Although researchers attach great importance to the study of the microscopic mechanism of film surface roughening and correlate it with atomic diffusion, since atomic diffusion is random, complex, and difficult to observe directly, the dependence of microscopic atomic diffusion on macroscopic surface roughening The relationship has not been well explored, and the method of precisely controlling the surface roughness at the atomic level has not been proposed; (2) There is a lack of relevant methods and technologies that can be used for reference

The existing technology discloses the influence of deposition conditions such as deposition temperature and substrate bias on the change of film surface roughening rate, but these conventional methods have different effects on different materials, sometimes even opposite, and do not have good universality. properties, and this conventional method cannot adjust the roughening rate to the state where ultra-smooth or ultra-rough films can be prepared

On the basis of these conventional methods, how to further expand the control range of the surface roughening rate in situ by other methods has not been reported.

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