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An Atomized Diffusion Model with Controlled Coarsening Rate

A technology of atomic diffusion and rate, applied in ion implantation plating, design optimization/simulation, vacuum evaporation plating, etc., can solve problems such as low surface roughness and uneven film surface

Active Publication Date: 2020-12-15
JILIN UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Although the surface roughness of the film prepared by various chemical methods can reach a large degree, the surface of the film is very uneven, and the surface roughness varies from high to low, which cannot meet the needs of practical applications.

Method used

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  • An Atomized Diffusion Model with Controlled Coarsening Rate
  • An Atomized Diffusion Model with Controlled Coarsening Rate
  • An Atomized Diffusion Model with Controlled Coarsening Rate

Examples

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Embodiment

[0021] An atomic diffusion model that regulates the coarsening rate, comprising the following steps:

[0022] (1) The film thickness is measured by a step meter as d, and the root mean square roughness is measured by an atomic force microscope as RMS;

[0023] (2) By calculating the slope of the straight line of RMS-d, the slope is the coarsening rate νR;

[0024] (3) RMS and d in the step (1) are imported into the Gwyddion software, and the surface morphology is simulated by the Gwyddion software;

[0025] (4) Through Gwyddion software simulation, it can be known that the protrusion size data h and s on the surface of the film, h is the size of the protrusion in the vertical direction, and s is the size of the protrusion in the horizontal direction;

[0026] (5) Select a thin film for deposition. With the continuous deposition of atoms, when the thickness of the film increases to d0+Δd, the size of the protrusion in the vertical direction is h0+Δh, and the size in the horizo...

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Abstract

The invention relates to the technical field of films, in particular to an adatom diffusion model for adjusting and controlling the coarsening rate. An adatom diffusion theory is used for guiding practice, complex diffusion is simplified, uphill diffusion and downhill diffusion which influence the surface coarsening rate are only considered, the 'adatom diffusion' model is established, and the relationship between microcosmic adatom diffusion and macroscopic surface coarsening is quantitatively revealed; and according to the adatom diffusion model for controlling the coarsening rate, experiments can be guided to prepare films with various surface roughness in situ, the changing degree of the surface roughness of the films can further be predicted, and the adatom diffusion model is widely applied to various sedimentation preparation methods.

Description

technical field [0001] The invention relates to the technical field of thin films, in particular to an augmented atom diffusion model for regulating the coarsening rate. Background technique [0002] In recent years, more and more thin-film materials with special surfaces have been applied in popular fields such as electrochemistry, energy storage, and catalysis. In these applications, the surface roughness of the film plays a crucial role in order to obtain the corresponding surface properties. For example, in order to obtain fast hydrophilic-oleophobic transition performance, the roughness of the copolymer-fluorosurfactant composite film needs to be less than 10nm; in order to improve the durability and reliability of small mobile mechanical parts in MEMS, the sliding pin The roughness of the plated durable protective film needs to be at least 1nm or less; in order to improve the heat conduction efficiency and increase the solar energy collection rate, the roughness of th...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/35C23C14/06C23C14/16C23C14/08G06F30/20
Inventor 胡超权毕超斌文懋郑伟涛
Owner JILIN UNIV
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