The invention discloses a rapid
deposition process for a combined-type spectrally selective absorption film layer. The combined-type spectrally selective absorption film layer is composed of an
infrared reflection layer, an
absorption layer and an anti-reflection layer from inside to outside in a sequential superposing manner, wherein the
infrared reflection layer and the
absorption layer are obtained by adopting a magnetron
sputtering method, and the anti-reflection layer is obtained by adopting a hollow
cathode airflow sputtering method. With the adoption of the process disclosed by the invention, the high purity of the
infrared reflection layer and the
absorption layer prepared by the magnetron
sputtering method is adequately utilized, and the
advantage of accurately controlling the content of metals in the film layer and the thickness of the film layer, of the magnetron sputtering method can be accurately exerted, thus obtaining the solar spectrally selective absorption film layer with a
high absorption ratio and a
low emission ratio; and the
metal compound prepared by virtue of
airflow reaction sputtering has the advantages of being high in purity, compact, and high in deposition speed, thus improving the
oxidation resistance,
corrosion resistance and high-
temperature resistance of the whole spectrally selective absorption film layer. The process disclosed by the invention has the advantages of being high in deposition efficiency, high in deposition speed, firm in the combination of the film layer, and greatly improved in the performance of the film layer.