Collector device for collecting the
electromagnetic radiation (30) emitted by a
radiation source (14), wherein the
collector device (15) is configured such that
electromagnetic radiation (30) incident at a first focal point (26) is directed to a second focal point (27). The
collector device comprises a first shell (31, 32, 33) made of a material transparent to the
electromagnetic radiation (30), wherein the first shell (31, 32, 33) is coated with a first
reflective layer (35, 36, 37) made of aluminum. The
collector device comprises a second shell (32, 33, 34) made of a material transparent to the electromagnetic
radiation (30), wherein the second shell (32, 33, 34) is coated with a second
reflective layer (36, 37, 38) made of aluminum.The first shell (35, 36, 37) and the second shell (36, 37, 38) are arranged coaxially with respect to an axis (28) spanning between the first focal point (26) and the second focal point (27), wherein the first shell (31, 32, 33) forms a first back mirror off which the electromagnetic
radiation (30) between the first focal point (26) and the second focal point (27) is reflected, and wherein the second shell (32, 33, 34) forms a second back mirror off which the electromagnetic radiation (30) between the first focal point (26) and the second focal point (27) is reflected. The invention also relates to a
wafer inspection
system with such a collector device.