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Subwavelength plasmonic microcavity light coupling structure for promoting photoelectric detector response

A photodetector and plasmon technology, which is applied in the direction of electrical components, circuits, semiconductor devices, etc., can solve the problem of low utilization rate of incident photons, achieve high enhancement ability, increase response rate, and improve the effect of response rate

Inactive Publication Date: 2015-02-04
SHANGHAI INST OF TECHNICAL PHYSICS - CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] Ordinary photodetectors that do not use an optical coupling structure are limited by the effective conversion area of ​​photoelectric conversion materials (such as the thickness of the junction region of the p-n junction or the thickness of the photoconductive active layer) and the effective transport length of photogenerated carriers (diffusion length and lifetime ), so that the utilization rate of incident photons is low, and a considerable part of incident photons does not participate in the process of photoelectric conversion but escapes from the detector

Method used

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  • Subwavelength plasmonic microcavity light coupling structure for promoting photoelectric detector response
  • Subwavelength plasmonic microcavity light coupling structure for promoting photoelectric detector response
  • Subwavelength plasmonic microcavity light coupling structure for promoting photoelectric detector response

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Embodiment 1

[0029] Embodiment 1: The upper metal is a one-dimensional grating, the line width s is 5.5 microns, the period p is 9.6 microns, and the thickness of the viscous titanium metal is 20 nanometers.

Embodiment 2

[0030] Embodiment 2: The upper metal layer is a one-dimensional grating, and the line width s is taken as 1.36 microns, which is one-tenth of the detection wavelength. The period p is taken as 2.6 microns, which satisfies the condition of being greater than the line width s. The sticky metal titanium is 5 nanometers thick.

Embodiment 3

[0031] Embodiment 3: The upper metal layer is a one-dimensional grating, and the line width s is taken as 13.6 microns, which is ten tenths of the detection wavelength. The period p is taken as 40 microns, which is thirty-tenths of the detection wavelength. The viscous titanium metal is 30 nanometers thick.

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Abstract

The invention discloses a subwavelength plasmonic microcavity light coupling structure for promoting photoelectric detector response rate. The propagation direction and optical field distribution of incident light are modulated through a plasmonic microcavity, thus the incident light is limited to be propagate in the microcavity, the light escape is reduced, and the utilization rate of photons is raised. The incident light is focused in the microcavity such that the intensity is greatly enhanced, and a photoelectric detector with a high response rate can be formed through clamping photoelectric conversion material in the microcavity. The coupling structure is formed by a metal grating layer formed by upper layer periodic metal bars, a photoelectric conversion activation layer and a lower layer metal reflective layer. The subwavelength plasmonic microcavity light coupling structure has the advantages that by using the mode selection effect of an electromagnetic wave near field coupling microcavity formed by plasmonic resonance between the upper layer metal grating and the lower layer metal reflective layer, thus the photons in the microcavity are propagated along a transverse direction to form standing wave, the light field energy is gathered and the length of equivalent optical absorption is increased, and the response rate of the detector is greatly raised.

Description

technical field [0001] The invention relates to a semiconductor photodetector, in particular to a photodetector integrated on a picture element and adopting a sub-wavelength plasmon microcavity coupling structure with improved photodetection capability. Background technique [0002] Semiconductor photodetectors realize the detection of light by absorbing incident photons to form electrons or hole transitions and then changing their conductive state to form photocurrent or photovoltage induced by photogenerated carriers. General photodetectors can directly receive incident light to complete photoelectric detection. However, continuously improving the performance of photodetectors is the goal that people are always pursuing. The figure of merit of a photodetector is the detectivity, and its value directly reflects the performance of the detector. The detectivity is directly proportional to the photoresponsivity, therefore, increasing the photoresponsivity of the photodetecto...

Claims

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Application Information

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IPC IPC(8): H01L31/0232H01L31/0216
CPCH01L31/02327H01L31/02161
Inventor 李倩李志锋陆卫陈效双李宁陈平平李天信王文娟甄红楼王少伟景友亮廖开升
Owner SHANGHAI INST OF TECHNICAL PHYSICS - CHINESE ACAD OF SCI
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