Preparation method of multilayer metal grating

Abstract

The invention relates to a preparation method of a multilayer metal grating. The preparation method comprises the following steps of: preparing or selecting an imprinting template; spin coating a layer of imprinting glue on an upper surface of a substrate; plating a metal layer on a surface of the imprinting glue; coating a layer of protection film on an upper surface of a metal layer; placing the imprinting template on an upper surface of the protection film, and carrying out nano-imprinting; and after curing the imprinting glue, removing the imprinting template to obtain a double-layer metal grating or the multilayer metal grating. According to the preparation method of the multilayer metal grating, a step of pattern transfer is omitted, the process is simpler, the cost is lower, a metal film obtained through the method cannot be coated on a side wall of a pattern to affect the transmission efficiency, the shape of a cross section of the metal film is strictly matched with the shape of a cross section of the imprinting template, and compared with adoption of a traditional method, the fidelity of the pattern and the TM transmission rate and the polarization rejection ratio of the grating are higher.

Description

technical field [0001] The invention relates to a micrographic processing method in the field of semiconductor processing, in particular to a method for preparing a multilayer metal grating based on nano-imprinting. Background technique [0002] Nano-imprinting technology is to use stamps with nano-scale graphics to produce nano-patterns on imprinting glue by hot pressing or ultraviolet curing. It has many advantages such as high resolution, low cost, and high yield. Since it was proposed in 1995 Various imprinting techniques have evolved. At present, nanoimprinting technology mainly includes hot embossing, ultraviolet imprinting and microcontact printing. A general nanoimprint process includes four main steps: film preparation, imprinting process, mold release, and pattern transfer. Usually, reactive ion etching and other methods are required to remove the residual adhesive layer after demoulding, and pattern transfer requires the use of etching or stripping technology to...

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Problems solved by technology

However, this method requires a very high degree of vacuum, requires high equipment, and is expensive

In another way, as in the document Sang Hoon Kim et al, Nanotechnology 17 (2006) 4436-4438, the metal grating is fabricated by using the electron beam oblique evaporation method. The experimental results show that when the inclination angle is greater than 60°, only the grating protrusions and The upper part of the side wall is plated with metal, and when the inclination angle is less than 40°, the protrusions, grooves and the entire side wall of the grating are covered with metal, so it is difficult to precisely control the distribution of metal

However, the optical efficiency of this method is not high, and it is difficult to mass produce

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