Self-supporting transmission metal grating based on nanometer stamping technology and its preparation method

Abstract

The invention relates to a high-intensity, self-supporting transmission metal grating which is made based on nanometer imprinting technique, and is used for diffraction of deep ultraviolet ray, soft X ray and material particle; the line density of the metal grating is larger than 2000 bars per millimeter, the grating is not supported by any substrate, a gap between the metal lines of the grating is hollow, the metal lines are supported by metal network structure with enough intensity and relatively larger cycle (1 to 40 micrometer), the metal material of the grating is made by gold. The manufacturing steps: (1) high density metal grating is prepared on the substrate through nanometer imprinting technique, reactive ion etching technique and electrochemical filming technique; (2) metallic network supporting structure with major cycle is prepared through photo-etching technique and electrochemical filming technique; (3) the substrate is removed by a chemical etching method to lead the grating to be hollow; (4) focused ion beam technology is used for repairing local defects generated during the manufacturing process of the transmission grating. The metal grating of the invention has the advantages that the manufacture method for the nanometer imprinting technique preparation grating structure is convenient and reliable, which greatly reduces the manufacture cost.

Description

technical field [0001] The invention belongs to the field of nano-scale structure devices and micro-nano processing technology manufacturing nano-scale structure devices, and specifically prepares a self-supporting transmission metal grating based on nano-imprinting technology and a preparation method, which are applied in nuclear fusion detection, space detection and other fields. Background technique [0002] High-resolution (grating lines > 2000 lines / mm) self-supporting transmission metal grating is the key dispersion element in deep ultraviolet and soft X-ray bands, as well as in atomic beams, neutron beams and other material particle rays. At present, its most important application fields are in laser inertial confinement nuclear fusion plasma diagnosis; X-ray laser experimental diagnosis and X-ray astrophysics and other fields of spectrum measurement. The atomic or "matter wave" interferometry has a variety of potential fundamental research and practical applicatio...

AI Technical Summary

Problems solved by technology

[0007] Both of the above two methods for manufacturing high-resolution grating patterns can obtain high-resolution grating patterns with a line density > 2000 lines / mm, but the manufacturing equipment is expensive and the experimental process complex

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