A kind of preparation method of mems atomic vapor chamber and atomic vapor chamber

Abstract

The invention relates to a preparation method for a micro-electro-mechanical system (MEMS) atomic vapor chamber and the atomic vapor chamber. The chamber is prepared by bonding a Pyrex glass sheet, a silicon wafer and a Pyrex glass sheet by an anodic bonding technology; the Pyrex glass sheet is taken as a window of the chamber; a chamber space is formed by etching or corroding the silicon wafer; paraffin packaged alkali metal such as rubidium (Rb) or cesium (Cs) is put into the chamber, and buffer gas with appropriate pressure is introduced simultaneously; paraffin is taken as a packaging material of the alkali metal, so that active alkali metal is isolated from oxidants such as oxygen, water vapor and the like in an environment; the paraffin is also used as a plating material of the chamber, so that collision between Rb or Cs atoms and a chamber wall is slowed down; and a CO2 laser is used for melting the paraffin to release the alkali metal, so that a uniform paraffin plating is formed on the chamber wall. The problem of long-term drift caused by reaction residues generated by a field preparation mode is solved, the collision between the Rb or Cs atoms and the chamber wall is slowed down, and the contrast of atomic resonance line width of the alkali metal is improved.

Description

technical field [0001] The invention relates to an atomic vapor chamber using MEMS technology and a preparation method thereof, belonging to the field of micro-electro-mechanical systems (Micro-Electro-Mechanical Systems, MEMS), in particular to a preparation and packaging process of an atomic vapor chamber with a micro-nano structure . The atomic vapor chamber can be used for MEMS atomic devices such as MEMS atomic clocks, MEMS atomic gyroscopes, and MEMS atomic magnetometers. Background technique [0002] The miniaturization and multifunctional integration of integrated circuit technology and electronic devices have promoted the rapid development of MEMS technology. MEMS uses advanced semiconductor technology and technology to integrate machinery, electronics and even systems into one chip. It has great application prospects in military defense, aerospace, information communication, biomedical and other fields. In recent years, with the development of atomic physics, sem...

AI Technical Summary

Problems solved by technology

[0006] The invention proposes a preparation method of an atomic vapor chamber using MEMS technology and the atomic vapor chamber, which solves the key problem that the atomic state preparation needs to encapsulate alkali metal atoms, and at the same time solves the problem of chemically active alkali metals and atomic vapor chambers Fabrication process compatibility issues, making it possible to integrate the atomic vapor chamber with other physical parts

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