154 results about "Ion accelerators" patented technology

A system and method of accelerating ions in an accelerator to optimize the energy produced by a light source. Several parameters may be controlled in constructing a target used in the accelerator system to adjust performance of the accelerator system. These parameters include the material, thickness, geometry and surface of the target.

The electrode lengths of a plurality of electrodes linearly arranged in an acceleration cavity are proportional to the velocity of a traveling ion beam. Further, the electrode length is so designated that, in each half of a predetermined cycle in the ion beam direction of travel, the absolute value of a difference, relative to a length that is proportional to the beam traveling velocity is equal to or greater than a value corresponding to the phase width of the traveling ion beam, is provided for electrodes that do not exceed three units and that are fewer than electrodes allotted to half the predetermined cycle.

The disclosed apparatus includes a multi-reflecting time-of-flight mass spectrometer (MR-TOF MS) (11) comprising a pair of grid- free ion mirrors (12), a drift space (13), an orthogonal ion accelerator (14), an optional deflector (15), an ion detector (16), a set of periodic lenses (17), and an edge deflector (18). To improve the duty cycle of the ion injection at a low repetition rate dictated by a long flight in the MR-TOF MS, multiple measures may be taken. The incoming ion beam and the accelerator may be oriented substantially transverse to the ion path in the MR-TOF, while the initial velocity of the ion beam is compensated by tilting the accelerator and steering the beam for the same angle. To further improve the duty cycle of any multi-reflecting or multi-turn mass spectrometer, the beam may be time-compressed by modulating the axial ion velocity with an ion guide. The residence time of the ions in the accelerator may be improved by trapping the beam within an electrostatic trap. Apparatuses with a prolonged residence time in the accelerator provide improvements in both sensitivity and resolution.

A neutron generator includes an ion source disposed in a pressurized environment containing an ionizable gas. The ion source includes a substrate with a bundle of carbon nanotubes extending therefrom. The ends of the nanotubes are spaced from a grid. Ion source voltage supply circuitry supplies a positive voltage potential between the substrate and the grid of the ion source to cause ionization of the ionizable gas and emission of ions through the grid. An ion accelerator section is disposed between the ion source and a target. The ion accelerator section accelerates ions that pass through the grid towards the target such that collisions of the ions with the target cause the target to generate and emit neutrons therefrom. The ion source, accelerator section and target are housed in a sealed tube and preferably the carbon nanotubes of the bundle are highly ordered with at least 106 carbon nanotubes per cm2 that extend in a direction substantially parallel to the central axis of the tube. The neutron generator provides gas ionization at much higher atomic to molecular ratio that the prior art, which allows for small compact size designs suitable for logging tools that are used in space-constrained downhole environments.

A tandem TOF mass spectrometer includes a first TOF mass analyzer that generates an ion beam comprising a plurality of ions and that selects a group of precursor ions from the plurality of ions. A pulsed ion accelerator accelerates and refocuses the selected group of precursor ions. An ion fragmentation chamber is positioned to receive the selected group of precursor ions that is refocused by the pulsed ion accelerator. At least some of the selected group of precursor ions is fragmented in the ion fragmentation chamber. A second TOF mass analyzer receives the selected group of precursor ions and ion fragments thereof from the ion fragmentation chamber and separates the ion fragments and then detects a fragment ion mass spectrum.

A magnet structure for use in a circular ion accelerator, such as e.g. a synchrocyclotron comprises a cold-mass structure including superconducting magnetic coils (20, 25), at least one dry cryocooler unit (10, 11, 12, 13) coupled with the cold-mass structure for cooling the latter and a magnetic yoke structure (30) with a return yoke (35) configured radially around said coils (20, 25). The return yoke (35) comprises an opening in which said dry cryocooler unit (10, 11, 12, 13) is received so as to be in thermal contact with said cold-mass structure.

This invention relates to paper products and / or substrates suitable for being made and / or converted into wallboard tape; which also may be known as joint tape and / or drywall tape, having a pH of at least 7.0 and containing a plurality of cellulose fibers, a wet strength additive, an alkaline sizing agent, and an anionic promoter, as well as methods of making and using the same.

A time-of-flight mass spectrometer includes an ion source that generates ions. A two-field ion accelerator receives the ions generated by the ion source and generates an electric field that accelerates the ions through an ion flight path. A pulsed ion accelerator generates an accelerating electric field that focuses the ions to a focal plane where the ion flight time to the focal plane for an ion of predetermined mass-to-charge ratio is substantially independent to first order of an initial velocity of the ions prior to acceleration. An ion detector is positioned at the focal plane to detect ions. The two-field ion accelerator generates electric fields that cause the ion flight time to the ion detector for an ion of predetermined mass-to-charge ratio to be substantially independent to first order of both the initial position and the initial velocity of the ions prior to acceleration.

An accelerator capable of accelerating all-species ions to an arbitrary energy level on the same accelerator. An all-species ion accelerator which uses the generating timing and applying time of an induction voltage applied, by a confining and accelerating induction acceleration cell used in an induction acceleration synchrotron, to an ion beam injected by a front-end accelerator to generate a confining and accelerating gate signal pattern by a confining and accelerating digital signal processor and a confining and accelerating pattern generator based on an ion beam passing signal, a position signal and an induction voltage signal used to recognized an induction voltage value applied to an ion beam, and feedback-controls the one / off of the confining and accelerating induction acceleration cell by a confining and accelerating intelligent control device.

A method and apparatus that may comprise an EUV light producing mechanism utilizing an EUV plasma source material comprising a material that will form an etching compound, which plasma source material produces EUV light in a band around a selected center wavelength comprising: an EUV plasma generation chamber; an EUV light collector contained within the chamber having a reflective surface containing at least one layer comprising a material that does not form an etching compound and / or forms a compound layer that does not significantly reduce the reflectivity of the reflective surface in the band; an etchant source gas contained within the chamber comprising an etchant source material with which the plasma source material forms an etching compound, which etching compound has a vapor pressure that will allow etching of the etching compound from the reflective surface. The etchant source material may comprises a halogen or halogen compound. The etchant source material may be selected based upon the etching being stimulated in the presence of photons of EUV light and / or DUV light and / or any excited energetic photons with sufficient energy to stimulate the etching of the plasma source material. The apparatus may further comprise an etching stimulation plasma generator providing an etching stimulation plasma in the working vicinity of the reflective surface; and the etchant source material may be selected based upon the etching being stimulated by an etching stimulation plasma. There may also be an ion accelerator accelerating ions toward the reflective surface. The ions may comprise etchant source material. The apparatus and method may comprise a part of an EUV production subsystem with an optical element to be etched of plasma source material.