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152 results about "Ion accelerators" patented technology

EUV collector debris management

A method and apparatus that may comprise an EUV light producing mechanism utilizing an EUV plasma source material comprising a material that will form an etching compound, which plasma source material produces EUV light in a band around a selected center wavelength comprising: an EUV plasma generation chamber; an EUV light collector contained within the chamber having a reflective surface containing at least one layer comprising a material that does not form an etching compound and/or forms a compound layer that does not significantly reduce the reflectivity of the reflective surface in the band; an etchant source gas contained within the chamber comprising an etchant source material with which the plasma source material forms an etching compound, which etching compound has a vapor pressure that will allow etching of the etching compound from the reflective surface. The etchant source material may comprises a halogen or halogen compound. The etchant source material may be selected based upon the etching being stimulated in the presence of photons of EUV light and/or DUV light and/or any excited energetic photons with sufficient energy to stimulate the etching of the plasma source material. The apparatus may further comprise an etching stimulation plasma generator providing an etching stimulation plasma in the working vicinity of the reflective surface; and the etchant source material may be selected based upon the etching being stimulated by an etching stimulation plasma. There may also be an ion accelerator accelerating ions toward the reflective surface. The ions may comprise etchant source material. The apparatus and method may comprise a part of an EUV production subsystem with an optical element to be etched of plasma source material.
Owner:ASML NETHERLANDS BV

Thermonuclear plasma reactor for rocket thrust and electrical generation

A reactor system produces plasma rocket thrust using alpha-initiated atomic fuel pellets without the need for a critical mass of fissionable material. The fuel pellets include an outer layer reactive material to alpha particles to generate neutrons (e.g., porous lead or beryllium), an under-layer of fissionable material (e.g., thorium or enriched uranium), and an optional inner core of fusion material (e.g., heavy water ice, boron hydride). The pellets are injected one at a time into a charged reaction chamber containing a set of alpha beam channels, possibly doubling as ion accelerators, all directed toward a common point. Alpha particles converging on each successive pellet initiate an atomic reaction in the fissionable under-layer, via a neutron cascade from the pellet outer layer, producing plasma that is confined within the chamber. This may be enhanced by atomic fusion of the optional inner core. The resulting high-energy plasma creates electrostatic pressure on the chamber and is allowed to exit the chamber through a port. An ion accelerator at the exhaust port of the chamber accelerates outgoing plasma ions, possibly with added reaction mass, to generate the rocket thrust. An electric circuit that includes the charged chamber may collect the electrons in the plasma to help power the ion accelerator(s).
Owner:YURASH GREG J

Ion accelerator injection device and using method

The invention relates to an ion accelerator injection device, and belongs to the technical field of nuclear energy. The ion accelerator injection device is characterized in that the ion accelerator injection device comprises an ion beam current ECR ion source, a first solenoid, a second solenoid, an RFQ linear accelerator and a mixed type ion accelerating device, wherein the ion beam current ECR ion source is used for generating high intensity, and the first solenoid and the second solenoid are connected with the RFQ linear accelerator and the mixed type ion accelerating device through vacuum pipelines. The RFQ linear accelerator and the mixed type ion accelerating device are connected through a flange. The ion accelerator injection device has the advantages that in the accelerating process of high intensity ion beam currents, the quality of the beam currents is made to be better due to the fact that the structure is more compact; the accelerating function and the transverse and longitudinal focusing function are combined in the same high-frequency structure by using the accelerating function of a mixed type DTL, cavity shunt impedance is high, and high-frequency power dissipation is lowered greatly; acceleration is carried out by using a zero phase, acceleration efficiency is higher, the length of a cavity can be reduced effectively, and effective accelerating gradients can be improved; an additional transmission matching section is not needed between an RFQ and the mixed type DTL, manufacturing cost can be lowered, and the length of the device can be shortened. The ion accelerator injection device is mainly applied to acceleration of high intensity low energy ion beam currents, and can be applied to injection devices of high-current accelerators, industrial accelerators and other application type accelerating devices.
Owner:INST OF MODERN PHYSICS CHINESE ACADEMY OF SCI

Polyester alkali decrement and one-bath-dyeing one-step low-temperature processing method

ActiveCN103590271ALower glass transition temperatureReduce alkali reduction processing efficiencyDyeing processDisperse dyeAccelerant
The invention discloses a polyester alkali decrement and one-bath-dyeing one-step low-temperature processing method. The method comprises the steps: carrying out alkali decrement and one-bath-dyeing one-step processing on polyester by using a dipping process, and dissolving sodium hydroxide, a cation accelerant, a carrier, a dispersing agent and a disperse dye into a dye liquid, wherein the dye liquid is prepared from water, the concentration of the carrier is 4-15g/L, the concentration of the sodium hydroxide is 2-4g/L, and the concentration of the cation accelerant is 1*10<-5> to 10*10<-5>mol/L; placing a polyester fabric into the dye liquid according to the bath ratio of 1: (10-100); then, heating to 90-100 DEG C at the speed of 0.5-2 DEG C/min, preserving the heat for 20-100min; taking out the polyester fabric after the heat preservation is ended, washing the polyester fabric 2-5 times by using tap water, and then, carrying out reduction clearing at the temperature of 70-80 DEG C and the bath ratio of 1:50 for 10min by using 2g/L sodium hydroxide and 2g/L sodium hydrosulfite; next, taking out the fabric, and washing 2-6 times by using water; and finally, drying the fabric at the temperature of 70-80 DEG C. By using the method, the polyester alkali decrement and dyeing processing flow is shortened, the alkali decrement processing temperature is reduced, the consumptions of the sodium hydroxide and the cation accelerant are reduced, the production efficiency is increased, the energy sources are saved, the process is simple, no special requirement for the polyester fabric and equipment are needed, and the large-scale production can be realized by using conventional equipment, so that the method has a wide application prospect.
Owner:绍兴通盛印染有限公司

EUV collector debris management

A method and apparatus that may comprise an EUV light producing mechanism utilizing an EUV plasma source material comprising a material that will form an etching compound, which plasma source material produces EUV light in a band around a selected center wavelength comprising: an EUV plasma generation chamber; an EUV light collector contained within the chamber having a reflective surface containing at least one layer comprising a material that does not form an etching compound and / or forms a compound layer that does not significantly reduce the reflectivity of the reflective surface in the band; an etchant source gas contained within the chamber comprising an etchant source material with which the plasma source material forms an etching compound, which etching compound has a vapor pressure that will allow etching of the etching compound from the reflective surface. The etchant source material may comprises a halogen or halogen compound. The etchant source material may be selected based upon the etching being stimulated in the presence of photons of EUV light and / or DUV light and / or any excited energetic photons with sufficient energy to stimulate the etching of the plasma source material. The apparatus may further comprise an etching stimulation plasma generator providing an etching stimulation plasma in the working vicinity of the reflective surface; and the etchant source material may be selected based upon the etching being stimulated by an etching stimulation plasma. There may also be an ion accelerator accelerating ions toward the reflective surface. The ions may comprise etchant source material. The apparatus and method may comprise a part of an EUV production subsystem with an optical element to be etched of plasma source material.
Owner:ASML NETHERLANDS BV

Digital pulse power supply synchronous timing trigger system

ActiveCN103064328AMeet the requirements of flexible timing and synchronous startHighly integratedProgramme controlComputer controlRemote controlComputer module
The invention relates to a digital pulse power supply synchronous timing trigger system for achieving a remote synchronous timing trigger control with many sets of digital pulse power supply.. The digital pulse power supply synchronous timing trigger system is characterized in that the trigger system comprises a trigger source server and the trigger source server is mutually connected with a control computer, the hardware of the trigger source server is a field programmable gata array (FPGA). The trigger source server is connected with a first-level fan-out machine which is respectively connected with multichannel second fan-out machines without time differences. The second fan-out machine is connected with a digital pulse power supply module. The digital pulse power supply synchronous timing trigger system achieves the synchronous starting or the grouped synchronous starting control of ion accelerator digital pulse power supply or related industry many sets of digital pulse power supply according to the setting time series. And the digital pulse power supply synchronous timing trigger system meets the requirements that the digital pulse power in the relevant fields can be started flexible timing synchronization under the remote control method.
Owner:INST OF MODERN PHYSICS CHINESE ACADEMY OF SCI

Bent wing-type radio-frequency quadrupole accelerator

The invention relates to the technical field of an acceleration mechanism of an ion accelerator, in particular to a bent wing-type radio-frequency quadrupole accelerator. The bent wing-type radio-frequency quadrupole accelerator is characterized by comprising a cavity, wherein four wings are arranged in the cavity, end plates are respectively arranged at the two ends of the cavity, a beam hole is arranged at the central position of each end plate, the central line of the two beam holes and the central axis of the cavity are on the same straight line, and a Pi-model stabilization rod and a tuner for adjusting frequency are further arranged on the cavity. By bending wings at pole head parts, the cross section size of the cavity is greatly reduced on the condition of no change on the total transverse length of the wings, and the bent wing-type radio-frequency quadrupole accelerator is very suitable for low-frequency beams; and meanwhile, due to the compatibility with the advantages of simplicity and effectiveness of a cooling system of the traditional four-wing radio-frequency quadrupole acceleration mechanism, the bent wing-type radio-frequency quadrupole accelerator is very suitable for a continuous-wave working state. Obvious advantages are shown on the aspects of reduction on processing difficulty of the radio-frequency quadrupole accelerator, reduction on engineering cost, improvement on running reliability and stability of a device and the like.
Owner:科近泰基新技术有限公司
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