Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Method for manufacturing WS2 solid lubrication film

A technology of solid lubrication and manufacturing method, applied in ion implantation plating, metal material coating process, coating and other directions, can solve the problems that cannot fully meet the requirements of long-life solid lubrication equipment and equipment, the influence of wear resistance of film layers, and the surface of film layers. Large roughness and other problems, to achieve the effect of short preparation time, long wear life and excellent wear resistance

Active Publication Date: 2015-09-23
BEIJING RES INST OF AUTOMATION FOR MACHINERY IND
View PDF3 Cites 7 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] In the existing research results, magnetron sputtering technology is generally used to prepare tungsten disulfide solid lubricating film, but this technology has the problems of low production efficiency and inability to prepare thicker coatings
The film deposition speed is faster by ion plating, which can effectively improve production efficiency by replacing magnetron sputtering technology to prepare tungsten disulfide solid lubricating film, but ion plating will deposit a large number of large particles (5-10μm) on the surface of the workpiece, resulting in a film layer The surface roughness is relatively large, and the particles wrapped inside are easy to cause the film to peel off and fail, which affects the wear resistance of the film and cannot fully meet the needs of long-life solid lubrication equipment and instruments

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Method for manufacturing WS2 solid lubrication film
  • Method for manufacturing WS2 solid lubrication film
  • Method for manufacturing WS2 solid lubrication film

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0052] 1) Put the sample to be processed into the magnetic filtration equipment, and use WS 2 / Ag composite target;

[0053] 2) Turn on the mechanical pump and molecular pump, turn on the circulating water system, and evacuate to 6.0×10 -4 Pa, start process;

[0054] 3) Introduce Ar gas to make the working pressure 5Pa ~ 10Pa, turn on the negative bias to -400V ~ -1000V, perform glow discharge, and clean the surface of the workpiece;

[0055] 4) The specific control parameters are: the arc voltage is 20V~36V, the negative bias voltage is -100V~-800V, and the arc current is 90A~100A. The duty ratio is 50-90%, and the deposition time is 1h. The diameter of the magnetic filter tube is 200mm, the arc of the elbow is 0°, and the magnetic field deflection current is 1.6A~2.2A.

Embodiment 2

[0057] 1) Put the sample to be processed into the magnetic filtration equipment, and use WS 2 / Ag composite target;

[0058] 2) Turn on the mechanical pump and molecular pump, turn on the circulating water system, and evacuate to 6.0×10 -4 Pa, start process;

[0059] 3) Introduce Ar gas to make the working pressure 5Pa ~ 10Pa, turn on the negative bias to -400V ~ -1000V, perform glow discharge, and clean the surface of the workpiece;

[0060] 4) The specific control parameters are: the arc voltage is 20V~36V, the negative bias voltage is -100V~-800V, and the arc current is 90A~100A. The duty ratio is 50-90%, and the deposition time is 1h. The diameter of the magnetic filter tube is 200mm, the arc of the elbow is 90°, and the magnetic field deflection current is 1.6A~2.2A.

[0061] The invention controls the growth of the film by adjusting parameters such as arc voltage, arc current, negative pressure, and duty cycle to optimize the structure of the film and improve the fri...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention provides a method for manufacturing a WS2 solid lubrication film. The WS2 solid lubrication film is formed by depositing a magnetic filter cathode vacuum arc on the surface of a metal material substrate. The method comprises the steps that the metal material substrate is preprocessed; the WS2 solid lubrication film is generated, and the metal material substrate is put into a vacuum chamber and is vacuumized; Ar gas is pumped in, the back bias voltage of a magnetic filter cathode vacuum arc deposition device is started to be -400 V to -1000 V, glow discharge is conducted, and the surface of the metal material substrate is washed; a WS2 / Ag composite target is used as a target material, the magnetic filter cathode vacuum arc deposition device is used for depositing a WS2 / Ag film layer on the surface of the metal material substrate, wherein the arc voltage of the magnetic filter cathode vacuum arc deposition device is 20 V to 36 V, the back bias voltage is -100 V to -800 V, the arc current is 90 A to 100 A, the duty ratio is 50%-90%, and the deposition time is 1 h; and the metal material substrate is sealed up for safekeeping.

Description

technical field [0001] The invention relates to the manufacture of a solid lubricating film, in particular to a method for preparing a super-long-life tungsten disulfide solid lubricating film on a metal surface by using a magnetic filter cathodic vacuum arc deposition technique. Background technique [0002] Currently tungsten disulfide (WS 2 ) is the main research direction in the field of new solid lubrication at home and abroad. It has a lower coefficient of friction, higher extreme pressure resistance, and better oxidation resistance than MoS 2 , so it is suitable for harsh conditions such as high temperature, high vacuum, high load, high speed, high radiation, strong corrosion, and ultra-low temperature. The United States took the lead in applying it to military fields such as Mars exploration robots, airplanes, and space shuttles. [0003] In the existing research results, magnetron sputtering technology is generally used to prepare tungsten disulfide solid lubrica...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): C23C14/06C23C14/28
Inventor 金杰黄晓林王月张昕
Owner BEIJING RES INST OF AUTOMATION FOR MACHINERY IND
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com