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770 results about "Tungsten disulfide" patented technology

Tungsten disulfide is an inorganic chemical compound composed of tungsten and sulfur with the chemical formula WS₂. This compound is part of the group of materials called the transition metal dichalcogenides. It occurs naturally as the rare mineral tungstenite. This material is a component of certain catalysts used for hydrodesulfurization and hydrodenitrification.

Compound nano material of graphene nano slice and WS2 and preparation method thereof

The invention discloses a compound nano material of graphene nano slice and tungsten disulfide (WS2), and a synthesis method and a preparation method thereof. The compound material is formed by mixing graphene and a WS2 nano material in a mass ratio of (1 to 1)-(4 to 1). The preparation method comprises the following steps of: preparing an oxidized graphite nano slice from graphite by a chemical oxidization method; then dissolving tungstic acid into deionized water so as to form 0.02 to 0.07M of solution; adding L-cysteine serving as a sulfur source and a reduction agent, wherein the mass ratio of the L-cysteine to the tungstic acid is (5 to 1)-(12 to 1); adding the oxidized graphite nano slice into the solution, and ultrasonically treating so that the oxidized graphite nano slice can be fully dispersed in the hydrothermal reaction solution; transferring the mixture into a hydrothermal reaction kettle and sealing; and synthesizing by a one-step hydrothermal method to obtain the compound nano material of graphene and WS2, wherein the mass ratio of the graphene nano slice to the WS2 is (1 to 1)-(4 to 1). The method has the characteristics of mild reaction condition and simple process. The compound nano material of graphene and WS2 synthesized by the method can be widely used as electrode materials of new energy batteries, high-performance national lubricants, catalyst carriers and the like.
Owner:ZHEJIANG UNIV

Solid lubricating high-temperature anti-wearing powder composition and preparation method of compound coating of composition

InactiveCN102836996ASignificant progressImprove high temperature wear resistance and friction reduction performanceLiquid/solution decomposition chemical coatingDecompositionEvaporation
The invention relates to a solid lubricating high-temperature anti-wearing powder composition and a preparation method of a compound coating of the composition. The powder composition comprises the following components in percentage by mass: 14-17.5% of nickel, 3-3.5% of chromium, 49-52.5% of chromium carbide and 25-30% of tungsten disulfide with a surface coated by an alloy-phosphorus alloy. A solid self-lubricating high-temperature anti-wearing compound coating is prepared by the powder composition through utilizing a laser smelting technology. According to the invention, NiCr-Cr3C2 compound powder is used as a metal substrate and the compound coating is formed by a ceramic anti-wearing phase and a metal toughening phase; WS2 is a solid lubricating phase and one layer of a micron-grade Ni-P alloy is coated on the surface of a WS2 powder grain by utilizing a chemical plating method, so that the thermal stability and the chemical stability of WS2 are increased, the decomposition and evaporation of the WS2 in a laser smelting process are effectively inhibited and the compatibility of the WS2 and the metal substrate is increased; and the compound material coating has the characteristic of high-temperature self-lubricating wearing resistance.
Owner:SUZHOU UNIV

A method of preparing large-area high-quality completely single-layered tungsten disulfide

The invention relates to the field of tungsten disulfide, and particularly relates to a method of preparing large-area high-quality completely single-layered tungsten disulfide. A chemical vapor deposition technique is adopted. Gold the tungsten solubility of which is extremely low is adopted as a growth substrate, and a tungsten source and a sulfur source under atmospheric pressure at high temperature are subjected to a catalytic reaction on the surface of the gold substrate to grow, in a self-limiting manner, completely single-layered tungsten disulfide large-size monocrystalline and large-area continuous film. The characteristic that bonding between the prepared tungsten disulfide and the gold substrate under atmospheric pressure is weak is utilized, a bubbling transferring process and a process combining bubbling and reel-to-reel transferring are respectively adopted to transfer the large-area completely single-layered tungsten disulfide to rigid and flexible substrates under the premise of not destroying the gold substrate. The completely single-layered high-quality millimeter-level tungsten disulfide monocrystalline and large-area continuous film can be prepared through the method, thus laying foundations for application of single-layered tungsten disulfide in the fields of electron/optoelectronic devices, spinning devices, solar cells, gas/light sensors, flexible film electronic/optoelectronic devices, and the like.
Owner:INST OF METAL RESEARCH - CHINESE ACAD OF SCI
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