Nano multilayer gradient composite anti-erosion coating structure and preparation method thereof

A nano-multilayer, anti-erosion technology, applied in the coating, superimposed layer plating, metal material coating process and other directions, can solve the problem that the bonding force of the film base cannot meet the sand and dust erosion resistance, and achieve impact toughness. Good results

Active Publication Date: 2017-11-07
XI AN JIAOTONG UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

At present, most scholars are adding a layer of transitional metal Ti between the TiN ceramic layer and the substrate in order to improve the bonding force of the coating. Although this method helps to release the internal stress between the ceramic layer and the substrate, it can be

Method used

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  • Nano multilayer gradient composite anti-erosion coating structure and preparation method thereof
  • Nano multilayer gradient composite anti-erosion coating structure and preparation method thereof
  • Nano multilayer gradient composite anti-erosion coating structure and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0035] 1) Polishing and cleaning of the substrate

[0036] Use 400-600, 800-1000, 1200 and 2000 mesh sandpaper in turn to rough and finely grind the TC4 substrate sample until there are no obvious horizontal and vertical grinding marks, and then use polishing flannelette and diamond polishing paste to polish the finely ground sample Process until the surface roughness of the sample reaches Ra=0.02±0.005 μm.

[0037] The polished substrate must be ultrasonically cleaned twice with absolute ethanol and acetone before clamping and coating, each time for 10 minutes, and quickly dried with high-purity nitrogen.

[0038] 2) surface nitriding treatment

[0039] The process of nitriding the surface of the substrate is as follows: using the glow plasma nitriding technology, the surface nitriding treatment of the substrate is carried out, and the nitriding gas is NH 3 , the glow voltage is 800V, the current is 13A, the vacuum in the furnace is 100Pa, the nitriding temperature is 400°C...

Embodiment 2

[0051] 1) Polishing and cleaning of the substrate

[0052] Use 400-600, 800-1000, 1200 and 2000 mesh sandpaper in sequence to rough and finely grind the TC4 matrix sample, and then use polishing flannelette and diamond polishing paste to polish the finely ground sample until the surface of the sample is rough The degree reaches Ra=0.02±0.005μm.

[0053] After polishing, the substrate must be ultrasonically cleaned with absolute ethanol and acetone for 10 minutes before clamping and coating, and then quickly dried with high-purity nitrogen.

[0054] 2) surface nitriding treatment

[0055] The process of nitriding the surface of the substrate is as follows: using the glow plasma nitriding technology, the surface nitriding treatment of the substrate is carried out, and the nitriding gas is NH 3 , the glow voltage is 800V, the current is 13A, the vacuum in the furnace is 100Pa, the nitriding temperature is 400°C, and the nitriding time is 1h.

[0056] 3) Preparation of "Embedde...

Embodiment 3

[0069] 1) Polishing and cleaning of the substrate

[0070] Use 400-600, 800-1000, 1200 and 2000 mesh sandpaper in sequence to rough and finely grind the TC4 matrix sample, and then use polishing flannelette and diamond polishing paste to polish the finely ground sample until the surface of the sample is rough The degree reaches Ra=0.02±0.005μm.

[0071] After polishing, the substrate must be ultrasonically cleaned with absolute ethanol and acetone for 10 minutes before clamping and coating, and then quickly dried with high-purity nitrogen.

[0072] 2) surface nitriding treatment

[0073] The process of nitriding the surface of the substrate is as follows: using the glow plasma nitriding technology, the surface nitriding treatment of the substrate is carried out, and the nitriding gas is NH 3 , the glow voltage is 800V, the current is 13A, the vacuum in the furnace is 100Pa, the nitriding temperature is 400°C, and the nitriding time is 1h.

[0074] 3) Preparation of "Embedde...

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Abstract

The invention discloses a nano multilayer gradient composite anti-erosion coating structure and additionally further discloses a preparation method of the coating strcuture. From a matrix to the surface of the coating surface, the coating structure sequentially comprises a nitriding layer, an embedded type combined layer and a structure body formed by circularly overlaying a Ti metal layer, a Ti-TiN gradient layer and a TiN/Ti nano multi-layer. The preparation method comprises the steps that through surface nitridation, the material property of the surface and subsurface of the matrix is similar to that of a coating material so as to relieve the stress concentration phenomenon of the film-matrix junction; by adoption of a metal vacuum steam ion source injection method, the nitrided matrix surface is subjected to ion injection to form the embedded type combined layer; and by adoption of a magnetic filtering vacuum cathode arc deposition method, by continuously controlling the flow of input N2, the periodically-circulated structure body which is sequentially composed of the Ti metal layer, the Ti-TiN gradient layer and the TiN/Ti nano multi-layer is deposited on the combined layer. The nano gradient multilayer composite coating structure simultaneously has high hardness, high toughness and excellent film-matrix combining force, so that the very good anti-erosion performance is achieved.

Description

technical field [0001] The invention relates to the technical field of material surface modification, in particular to an anti-erosion composite coating which integrates a nitriding structure, an ion implantation structure, a nano-multilayer structure and a gradient structure, and has high film-base bonding force and high toughness structure; and the corresponding coating preparation method that effectively combines various surface strengthening treatment technologies such as surface nitriding, ion implantation and magnetic filtration vacuum cathode arc plasma deposition. Background technique [0002] Helicopters are indispensable and important equipment for my country's land aviation, sea aviation, and airborne troops to carry out diverse combat tasks such as ground attack, fire suppression, and logistics transportation in complex ground environments. The site is usually very simple, even temporary sand, earth or grass. When the helicopter takes off and lands and flies at l...

Claims

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Application Information

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IPC IPC(8): C23C28/00C23C14/48C23C14/35C23C14/06C23C8/36C23C14/18
CPCC23C8/36C23C14/0617C23C14/185C23C14/35C23C14/48C23C28/322C23C28/34
Inventor 张虹虹何卫锋何光宇聂祥樊李应红廖斌
Owner XI AN JIAOTONG UNIV
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