47 results about "Glow plasma" patented technology

The present invention belongs to the technical field of metal materials and their processing, and discloses a treatment method for double glow plasma nitriding on the inner wall surface of a titanium alloy round tube, and obtains a TC4 round tube with a nitriding layer on the inner wall, which significantly improves the hardness and wear resistance of the inner wall of the TC4 titanium alloy round tube, prolongs the service life of the parts, and meets the urgent needs of modern industry for high wear-resistant parts. After cleaning, drying, vacuuming, double glow plasma nitriding, furnace cooling, and precise control of parameters such as heating rate, gas ratio and nitriding time, the thickness and performance of the nitriding layer are precisely controlled, ensuring the stability and repeatability of the treatment effect. The obtained TC4 round tube sample was tested, and the metallographic structure of the nitriding layer on the inner wall was closely combined with the matrix, with a small risk of falling off and a relatively thick layer thickness of up to 17±1µm, and an average hardness of up to 713.04HV, which can reach 2.2 times the hardness of the matrix.

The invention discloses a medium-entropy (Zr, Ta, W) C coating and a preparation method and application thereof. The medium-entropy (Zr, Ta, W) C gradient coating is prepared on the surface of the titanium alloy or the iron-based alloy through the double-layer glow plasma surface metallurgy technology, and gradient temperature annealing treatment is conducted. The preparation method has the specific advantages that (1) the prepared coating is of a continuous gradient structure, good interface metallurgical bonding is formed between the coating and a matrix, the bonding force of the coating is not lower than 50 N, and the coating is not prone to cracking and stripping in the service process due to the high bonding strength; and (2) the hardness of the medium-entropy (Zr, Ta, W) C coating prepared by the method is 25-30 GPa, the fracture toughness is 4.0-5.0 MPa * m < 1 / 2 >, and the coating system has balanced hardness and toughness, so that the coating is endowed with excellent wear resistance. The prepared coating has excellent wear resistance and antifriction performance, and has wide application prospects in the field of wear-resistant protective coatings.

The invention discloses a preparation method of a molten salt corrosion resistant coating on the surface of a TiAl alloy, relates to the technical field of surface treatment, and aims to solve the technical problems of low binding force between an existing TiAl alloy matrix and a coating interface and poor corrosion resistance of the coating. The preparation method of the molten salt corrosion resistant coating on the surface of the TiAl alloy comprises the steps that a Zr-Y alloy is infiltrated on the surface of the TiAl alloy through a double glow plasma method, and a Zr-Y infiltrated layer is formed on the surface of the TiAl alloy; the TiAl alloy is subjected to heat preservation for 1-5 hours under the condition that the temperature ranges from 850 DEG C to 900 DEG C; a Zr-Cr-Y alloy is infiltrated on the surface of the TiAl alloy, and a Zr-Y / Zr-Cr-Y infiltrated layer is formed on the surface of the TiAl alloy; the TiAl alloy is subjected to heat preservation for 2-3 hours under the condition that the temperature ranges from 900 DEG C to 950 DEG C, and is oxidized under the condition that the temperature ranges from 860 DEG C to 920 DEG C;

The invention belongs to the technical field of metal materials and machining treatment thereof, and discloses a double glow plasma nitriding treatment method for the surface of the inner wall of a titanium alloy circular tube, a TC4 circular tube with a nitriding layer on the inner wall is prepared, the hardness and the wear resistance of the inner wall of the TC4 titanium alloy circular tube are remarkably improved, the service life of parts is prolonged, and the service life of the parts is prolonged. And the urgent demand of the modern industry on high-wear-resistance parts is met. Through cleaning, drying, vacuumizing, double glow plasma nitriding and furnace cooling and through accurate control of parameters such as the heating rate, the gas proportion and the nitriding time, accurate regulation and control of the thickness and performance of a nitriding layer are achieved, and the stability and repeatability of the treatment effect are ensured. A prepared TC4 round tube sample is detected, the metallographic structure of the nitriding layer on the inner wall of the TC4 round tube sample is tightly combined with a matrix, the falling risk is small, the layer thickness can reach 17 + / -1 m, and the average hardness reaches 713.04 HV and can reach 2.2 times of the hardness of the matrix.

The invention discloses a high bias transition carbon fiber composite material vacuum coating method, and relates to a carbon fiber composite material vacuum coating technology. The invention aims to solve the problems of high-voltage breakdown of resin and etching damage of carbon fibers caused by high-bias-voltage transition deposition of vacuum coating on the surface of the existing carbon fiber resin-based composite material. The method comprises the following steps: 1, fixing the carbon fiber composite material on the electric insulator; 2, bias voltage self-glow plasma cleaning; 3, depositing a transition layer; and 4, depositing a working coating. On the basis of an initial non-conductive mode of an electric insulator, during plasma pretreatment, the problems of electric breakdown of non-conductive resin and etching damage of conductive and low-sputtering-resistance carbon fibers are effectively solved, and non-homogeneous conductive and low-sputtering-resistance material surface bias self-glow plasma cleaning is achieved; according to the invention, the aluminum and copper coatings with compact structures are deposited by adopting HiPIMS, so that the electromagnetic wave absorption and multiple emission absorption effects are improved, and the overall electromagnetic shielding performance of the material is enhanced.

The invention relates to the technical field of target sputtering, in particular to laser and glow plasma magnetron sputtering equipment and method.The laser and glow plasma magnetron sputtering equipment is characterized in that a target is in a hollow cylindrical shape and transversely connected to a target support in a sleeving mode, a base frame is transmission shafts arranged in the width direction in a sputtering cavity, and a base material is conveyed along the multiple sets of transmission shafts; a magnet assembly is arranged at the top end in the target support and used for forming a glow plasma area on the outer side of a target material, laser beams emitted by the laser irradiation assembly irradiate the reflector assembly, the reflector assembly rotates in different directions so that the laser beams can be reflected to the glow plasma area, cooperative sputter coating is achieved, and the target material is coated with the glow plasma area. Different forms of coating effects are achieved through mutual influence and interaction of laser beams and glow plasmas or sputtered target material atoms, the laser and the magnetic field are coupled, the sputtering voltage can be reduced, the temperature of a base material can be reduced, damage of sputtering ions to a substrate film layer can be reduced, the battery efficiency can be improved, and the film forming quality can be improved.

The invention belongs to the technical field of back contact cells, and particularly relates to a low UVID back contact cell and a preparation method and application thereof, and the method comprises the steps: S02, sequentially depositing a phosphorus-free oxygen-doped silicon layer and a phosphorus-doped oxygen-doped silicon layer on a light receiving surface of a silicon wafer; wherein the phosphorus-free oxygen-doped silicon layer and the phosphorus-doped oxygen-doped silicon layer are deposited by adopting a tubular PECVD (Plasma Enhanced Chemical Vapor Deposition) in a continuous coating manner under the continuous existence of glow plasma, and the following conditions are met: H0gt; h1, W0lt; w1 and C1 are smaller than or equal to (3D0 * 1019) / D1, D0 ranges from 1 nm to 5 nm, and D1 ranges from 1 nm to 5 nm; s03, depositing an anti-reflection layer; s04, then annealing is carried out; and S05, forming a second semiconductor layer on the backlight surface. According to the invention, silicon oxide does not need to be deposited on the light receiving surface of the passivation layer of the light receiving surface in advance, hydrogen does not need to be doped into the film layer of the anti-reflection layer, a high passivation level can be ensured, and the attenuation of UVID can be reduced.

Provided are methods, apparatus and systems for stabilization of a glow discharge from a plasma. Also provided are methods, apparatus and systems for processing optical signals from a stabilised glow plasma with enhanced signal to noise recovery. A first method comprises: generating an electric field within a plasma cell using an alternating excitation voltage to excite particles within the cell, to produce a glow discharge from a plasma in the plasma cell in a resonant condition; monitoring, in each excitation cycle of the alternating excitation voltage, one or more signals that correlate with glow discharge optical emissions from the plasma in the plasma cell; and, in response to said monitoring, controlling one or more operating conditions for the plasma cell to maintain the glow discharge emissions from the plasma within a desired operating range in each excitation cycle of the alternating excitation voltage. A relatively stable glow discharge optical emission is maintained via dynamic resonant feedback control of operating conditions such as the electric field that is used to excite particles within the plasma cell. The stabilization of the glow plasma can be used in glow discharge optical emission spectroscopy (GD-OES) for gas analysis and in other applications.

The present invention relates to the technical field of target sputtering, and particularly relates to a laser-assisted glow plasma magnetron sputtering device and method. The target is in the shape of a hollow cylinder and is horizontally sleeved on a target support. The base frame is a transmission shaft arranged along the width direction of the sputtering chamber. The substrate is conveyed along multiple groups of transmission shafts. A magnet assembly is provided at the inner top position of the target support to form a glow plasma region outside the target. The laser beam emitted by the laser irradiation assembly irradiates the mirror assembly, and the mirror assembly rotates in different directions so that the laser beam is reflected towards the glow plasma region to achieve collaborative sputtering coating. The laser beam interacts with the glow plasma or the sputtered target atoms to achieve different forms of coating effects. The coupling of the laser and the magnetic field can reduce the sputtering voltage, reduce the temperature of the substrate, reduce the damage of sputtered ions to the substrate film layer, improve the battery efficiency, and improve the film formation quality.

An embodiment of the present invention provides an electrostatic field dust removal device, which belongs to the technical field of electrostatic dust removal. The electrostatic field dust removal device includes: at least one negative electrode plate for releasing negative charges; at least one positive electrode plate, which is arranged alternately in parallel with at least one negative electrode plate, for receiving the negative charges released by at least one negative electrode plate; an electrostatic dust removal area and a glow plasma area are formed between each negative electrode plate of at least one negative electrode plate and each positive electrode plate of at least one positive electrode plate; the exhaust gas flows between each negative electrode plate and each positive electrode plate and is alternately purified, wherein the exhaust gas is corona purified in the electrostatic dust removal area and ionized in the glow plasma area. The electrostatic dust removal device of the present invention simultaneously realizes the corona dust removal purification and plasma ionization antibacterial and deodorization of the exhaust gas through two negative charge release modes.

The invention discloses a high-entropy nitride ceramic coating as well as a preparation method and application thereof. The high-entropy ceramic coating material prepared on the surface of the TC21 alloy by adopting a double-layer glow plasma surface metallurgy process and a vacuum annealing technology sequentially comprises a plating layer and an N diffusion layer from top to bottom, and the composition of the plating layer is x + y + z + m + n + t = 1. The high-entropy ceramic coating has excellent mechanical properties while having high hardness, a diffusion layer can relieve the problem of mismatching of thermal expansion coefficients between the coating and a matrix while providing good binding force, and the phenomena of cracking and stripping of the coating are reduced. The ceramic coating prepared by adopting a double-layer glow plasma surface metallurgy process and a vacuum annealing technology can greatly improve the service environment and the service life of the TC21 alloy, and has wide application prospects in the field of aerospace engines.

The embodiment of the invention provides a manufacturing method of an electrostatic field dust removal device, and belongs to the technical field of electric dust removal. The manufacturing method includes: manufacturing at least one negative electrode plate for releasing negative charges; manufacturing at least one positive electrode plate which is alternately arranged in parallel with the at least one negative electrode plate and is used for receiving negative charges released by the at least one negative electrode plate; an electrostatic dust collection area and a glow plasma area are formed between each negative electrode plate of the at least one negative electrode plate and each positive electrode plate of the at least one positive electrode plate; waste gas flows between each negative electrode plate and each positive electrode plate and is alternately purified, and the waste gas is subjected to corona purification in the electrostatic dust collection area and is ionized in the glow plasma area. The electrostatic field dust removal device manufactured by the manufacturing method disclosed by the invention simultaneously realizes corona dust removal purification and plasma ionization bacteriostasis and deodorization of waste gas through two negative charge release modes.

The invention relates to the technical field of coating preparation, and discloses a preparation method and application of a SiC / SiC ceramic-based composite material with a Si-based Hf-doped coating. The bonding layer is prepared on the surface of the SiC / SiC composite material by adopting a double-layer glow plasma surface metallurgy process and consists of an outer Si-Hf deposition layer and an inner mutual diffusion layer, and the contents of Si, Hf and C in the diffusion layer are changed in a gradient manner, so that the failure caused by component mutation and property difference is relieved. The high-temperature water oxygen corrosion resistance of the Si-based doped Hf coating is improved, meanwhile, the service environment temperature of an engine is increased, the service life of the engine is prolonged, and the Si-Hf coating prepared through the method has wide application prospects in the aerospace field.

Cathode based on glow discharge and hollow cathode effect belongs to the technical field of space electric propulsion electron source, and aims to solve the problems of high failure risk of heater and difficulty in working in oxygen environment of traditional hollow cathode.The cathode comprises a gas supply pipe, a negative electrode, a contact electrode and an extraction electrode; the contact electrode is sleeved outside the discharge chamber from the top end of the negative electrode, and the extraction electrode is sleeved outside the contact electrode from the top end; the bottom plate of the negative electrode is provided with an air inlet hole in the center and is communicated with the gas supply pipe; the top cover of the contact electrode is provided with a throttle hole in the center for maintaining the air pressure of the discharge chamber; the top cover of the extraction electrode is provided with an extraction hole; a discharge power source is loaded between the negative electrode and the contact electrode, which is used for carrying out glow discharge on the gas working medium entering the discharge chamber to generate plasma; the glow plasma generates hollow cathode effect in the cylindrical negative electrode; an extraction power source is loaded between the contact electrode and the extraction electrode, which is used for making electrons pass through the throttle hole and the extraction hole in sequence and spray to form electron emission.

The invention belongs to the technical field of back contact cells, and particularly relates to an anti-LID-effect back contact cell and a preparation method thereof, and the preparation method comprises the steps: forming suede surfaces on the light receiving surface of a silicon wafer and an opening region of a second semiconductor; sequentially forming a passivation layer and an anti-reflection layer on the light receiving surface of the silicon wafer, wherein the passivation layer comprises a compact oxide layer and a phosphorus-doped oxygen-doped amorphous silicon layer which are sequentially formed; wherein the formation of the compact oxide layer comprises the following steps of: performing ozone flow gradient increasing oxidation, and then performing hydrogen plasma treatment; the formation of the phosphorus-doped and oxygen-doped amorphous silicon layer comprises the step of introducing at least one gradient change of gas under the continuous existence of glow plasma to carry out continuous coating, and the at least one gradient change of the introduced gas enables the phosphorus doping concentration in the phosphorus-doped and oxygen-doped amorphous silicon layer to be gradually increased from inside to outside. According to the invention, the anti-LID attenuation performance of the battery can be improved, and the overall passivation level and the battery efficiency can be effectively improved.

The application discloses a kind of TC4 alloy surface wear-resistant CrZrN solid solution ceramic coating and preparation method thereof, belong to TC4 alloy surface treatment field, the coating is prepared CrZrN ceramic coating using double-glow plasma surface metallurgy technology for TC4 alloy surface, the coating includes deposition layer and diffusion layer, Cr, Zr, N, Ti content in diffusion layer gradient change, alleviate the failure of coating caused by composition mutation and property difference;Compared with CrN binary coating, the CrZrN ceramic coating prepared by the application has the advantages of realizing solid solution strengthening, refining the grain and realizing metallurgical bonding between the coating and the substrate, which can effectively improve the service life of TC4 alloy substrate and can be applied to wear-resistant parts protection in the fields of aviation industry and shipbuilding industry.

The present invention discloses a method for preparing a corrosion-resistant steel strip, comprising the following steps: (1) ball-milling niobium carbide powder, sieving the sieved powder, degreasing the sieved powder, and immersing the sieved powder in a chemical plating solution to obtain a plating powder; (2) subjecting the plating powder to a plasma glow nitriding furnace for glow plasma treatment to obtain a plasma-treated powder; (3) uniformly mixing carbon steel powder, Fe-Cr alloy powder, Fe-Mo alloy powder, Fe-Si alloy powder, and Fe-Al alloy powder to obtain a mixed alloy powder, melting the mixed powder into a melt, stirring, desulfurizing, deoxidizing, and skimming the slag, then adding the plasma-treated powder, stirring, and immediately pouring the mixture into a mold for casting to obtain a cast plate; and (4) performing a constant temperature homogenization treatment, rough rolling, and finish rolling to obtain a corrosion-resistant steel strip. The steel strip prepared by the method of the present invention has good mechanical strength and corrosion resistance, is suitable for working in an environment with a certain corrosive medium or an environment with high stress requirements, improves the durability of steel components, and reduces maintenance costs.

The invention discloses a Ti-Zr-C / Ti-Zr wear-resistant co-permeation coating on the surface of TA15 titanium alloy and a preparation method thereof. A Ti-Zr-C / Ti-Zr wear-resistant modified layer is prepared on the surface of the TA15 alloy through the double glow plasma metallurgy technology, the coating is mainly composed of a Ti-Zr-C deposition layer on the outer layer and a Ti-Zr transition layer on the inner layer, the transition layer is a gradient structure layer, the content of the Zr element is continuously decreased from the surface to the inside, and the content of the Ti element is continuously increased from the surface to the inside. Under the action of 5.3 N, the lubricating oil shows a stable and lower friction coefficient, and by observing the shape of a grinding crack, the lubricating oil mainly shows slight abrasive wear and slight adhesive wear. Meanwhile, firm metallurgical bonding is formed between the coating and the base body through preparation and high-temperature diffusion of the transition layer, excellent bonding strength is shown, large external force can be borne, the service life of the TA15 alloy base body is effectively prolonged, and good application prospects are achieved.

The invention discloses a double glow plasma low-temperature carbonitriding method for a titanium alloy screw, and relates to the technical field of metal material surface treatment.The key point of the technical scheme is that a safety protection method specifically comprises the following steps that S1, screw surface cleaning is conducted, specifically, oil stains, particle impurities and oxide layers on the surfaces of the titanium alloy screw and a graphite barrel are cleaned; the cleaned screws and graphite barrels are placed in a furnace; after the air in the furnace body is removed, argon and nitrogen are introduced into the furnace until the air pressure in the furnace reaches a set value, and H2 is added to adjust the atmosphere activity; s2, pre-bombardment treatment is conducted, specifically, voltage is applied to the screws and the graphite barrel, and adsorbed impurities and oxide skin on the surfaces are cleaned; and S3, composite layer diffusion is conducted, through the titanium alloy screw double glow plasma low-temperature carbonitriding method, a Ti (C, N) diffusion layer of 10 micrometers and a TiN hardened layer of 5 micrometers are formed on the surface of a titanium alloy screw base body, the total alloy layer thickness is 15 micrometers, and the performance of the titanium alloy screw is improved.

The application belongs to the technical field of alloy surface coating preparation, and particularly relates to a nickel-based alloy surface NiCoCr medium-entropy alloy coating and a preparation method thereof. The method comprises the following steps: firstly, pretreating the nickel-based alloy surface; and then, performing double-glow plasma surface NiCoCr alloying treatment on the nickel-based alloy surface to obtain a NiCoCr medium-entropy alloy layer coating. The NiCoCr medium-entropy alloy coating has uniform internal organization and composition, a compact structure, and a metallurgical bond with the nickel-based high-temperature alloy substrate, and mutual diffusion exists at the interface between the coating and the substrate. The thickness of the coating is 30-70 microns, the coating has a compact structure, the configuration entropy is 8.314-12.471 Jmol ‑1 K ‑1 , and the coating can serve for 100 hours at a high-temperature environment of 1000 DEG C without peeling.

The invention discloses a preparation method of a corrosion-resistant steel strip, which comprises the following steps: (1) carrying out ball milling and crushing on niobium carbide powder, sieving, deoiling the sieved powder, and soaking in a chemical plating solution to obtain plating powder; (2) the plating powder is placed in a plasma glow nitriding furnace to be subjected to glow plasma treatment, and powder subjected to plasma treatment is obtained; (3) uniformly mixing carbon steel powder, Fe-Cr alloy powder, Fe-Mo alloy powder, Fe-Si alloy powder and Fe-Al alloy powder to obtain mixed alloy powder, melting the mixed powder into a melt, stirring, desulfurizing, deoxidizing and slagging off, then adding the plasma treated powder, stirring, and then immediately pouring into a mold for casting molding to obtain a casting blank plate; and (4) carrying out constant-temperature homogenization treatment, rough rolling and finish rolling to obtain the corrosion-resistant steel strip. The steel strip prepared through the method has good mechanical strength and corrosion resistance and is suitable for working in the environment with a certain corrosive medium or the environment with the high stress requirement, the durability of a steel assembly is improved, and the maintenance cost is reduced.

The invention discloses a method for preparing a porous coating on the surface of titanium alloy, and belongs to the field of material coatings. According to the method, a double glow plasma surface alloying device is adopted, one or more refractory metal elements serve as target materials, inert gas serves as protective gas, titanium alloy serves as a workpiece, an alloy layer with a certain thickness is prepared on the surface of the titanium alloy at first, then negative electrode voltage and source electrode voltage are adjusted, and therefore reverse sputtering of plasma is achieved; the surface of a workpiece containing an alloy layer is bombarded and sputtered by inert gas ions and alloying elements sputtered by a target material, and meanwhile, formation of a porous structure is induced by utilizing different diffusion rates of atoms moving inside and outside an interface in a Kirkendall effect, so that a uniform porous morphology is formed on the surface of the workpiece containing the alloy layer, and the surface of the workpiece containing the alloy layer is formed. And the titanium alloy is endowed with double properties of function and structure. The porous alloy layer prepared through the method is metallurgically bonded with the base body, and the porous alloy layer has good mechanical performance.

The utility model discloses a composite current collector, a pole piece and a battery. The composite current collector provided by the utility model comprises a base material layer, a first metal coating and a metal cementation layer, the first metal coating is arranged on at least one side surface of the base material layer; the metal cementation layer is arranged on the surface of the side, away from the base material layer, of the first metal coating; wherein the cementation metallization layer comprises a permeation part extending towards the base material layer, and the permeation part penetrates through the first metal plating layer and is embedded into the base material layer. According to the composite current collector, the conductive layer is thickened to improve the conductivity, and meanwhile, permeation connection of the base material layer is realized through a double glow plasma permeation metallization process, so that the binding force between the base material layer and the metal conductive layer is effectively improved, the use performance of a product is improved, and the service life of the product is prolonged.

The application discloses a tubular object inner wall double-glow plasma processing device, which comprises an electrode rod and a bottom disc; the bottom disc is connected with a target material tray through a first ceramic support, and the bottom disc is connected with a workpiece tray through a second ceramic support; the target material tray is provided with a target material one and a target material two, and the target material one and the target material two are in a disc shape; a hole with the same inner diameter as the workpiece is reserved on the workpiece tray, and a hollow heat preservation cover is further arranged on the workpiece tray; the workpiece is arranged at the middle position of the target material one and the target material two, and the center lines of the target material one, the target material two, the workpiece and the hollow heat preservation cover are coincident; the target material tray is connected with an electrode rod one, and the workpiece tray is connected with an electrode rod two. The application further discloses a processing method of the tubular object inner wall double-glow plasma processing device. The outer walls of the two metal target materials and the inner wall of the tubular object are at equal intervals and are located on the upper and lower sides of the tubular object, the film layer is uniform and dense, no hole and crack appear, the film layer is combined with the base body in a metallurgical way, and the service life is improved.

The present invention belongs to the technical field of corrosion-resistant coatings, and specifically relates to a Cr2N corrosion-resistant coating for the inner wall of a carbon steel storage tank and a preparation method thereof. The preparation method comprises the following steps: first, irradiating the steel with an argon ion radiation source, with the target chamber in a vacuum state during the irradiation process; then, subjecting the inner wall of the carbon steel storage tank to a double glow plasma chromium alloying treatment; and then subjecting the Cr alloy layer to an active screen ion nitriding treatment to prepare the Cr2N coating. The Cr2N coating prepared by this method exhibits a gradient distribution of internal microstructure components, with the Cr and N content gradually decreasing from the surface to the interior. The Cr2N coating is metallurgically bonded to the inner wall of the carbon steel storage tank, and interdiffusion occurs at the interface between the coating and the substrate, resulting in a dense coating structure that is resistant to corrosion from high and medium concentrations of sulfuric acid.

The invention discloses a corrosion and wear resistant high-entropy alloy coating and a preparation method thereof, the high-entropy alloy coating is arranged on the surface of a matrix, and a Cr diffusion layer, a TiVCr medium-entropy alloy intermediate layer, a TiVCrZrNb high-entropy alloy diffusion layer and a TiVCrZrNb high-entropy alloy deposition layer are sequentially arranged on the surface of the matrix. The preparation method comprises the following steps that in a vacuum environment, the Cr diffusion layer and the TiVCr medium-entropy alloy middle layer are sequentially prepared on the surface of a pretreated base body through a magnetron sputtering method; and a TiVCrZrNb high-entropy alloy diffusion layer and a TiVCrZrNb high-entropy alloy deposition layer are sequentially prepared on the surface of the TiVCr medium-entropy alloy intermediate layer through a double glow plasma surface metallurgy method. The obtained high-entropy alloy coating is good in corrosion resistance and good in wear resistance; and the interface bonding strength between the coatings and between the coating and the matrix is obviously enhanced, and the overall stability of the coating system is greatly improved.

The application provides a thermal barrier composite coating with a gradient structure, comprising a substrate and a composite coating arranged on the substrate, wherein the composite coating comprises a bonding layer arranged on the substrate and an oxygen barrier layer arranged on the bonding layer; the bonding layer is made of a NiCrAlTiHfSi coating layer; the oxygen barrier layer has a continuous gradient structure; the oxygen barrier layer is made of a Si-HfO2 coating layer; the Si-HfO2 coating layer comprises 20%-80% of Si and 20%-80% of HfO2; and along the vertical direction of the Si-HfO2 coating layer close to the bonding layer, the content of HfO2 gradually decreases. The NiCrAlTiHfSi metal bonding layer and the Si-HfO2 oxygen barrier layer are prepared by a double-layer glow plasma surface metallurgy process, the working temperature is higher than 1250 DEG C, the prepared impregnation layer is dense and uniform, has a continuous gradient structure, and the atomic combination between the bonding layer and the oxygen barrier layer forms a gradient metallurgical interface, the prepared oxygen barrier layer has good bonding strength with the bonding layer, the stress concentration in the mechanical stress or the thermal cycle process is reduced, and the safety and service life are improved.

The invention discloses a hydrogen element standard sample in zirconium and zirconium alloy and a preparation method and application thereof. Advanced processes such as magnetic confinement glow plasma hydrogen permeation and high-temperature argon protection homogenization treatment are adopted, and the problems of control and nonuniformity of hydrogen elements in zirconium and zirconium alloy are successfully solved; homogeneity inspection is carried out by adopting a variance method, and the result shows that the hydrogen element standard sample has good homogeneity; according to eight domestic qualified laboratories, different principles and reliable analysis methods are adopted for cooperative valuing, and valuing results are accurate and reliable. A comparison result shows that the main technical indexes of the hydrogen element standard sample reach the advanced level of domestic similar standard samples.

The application provides a method for improving the performance of laser selective melting forming pure tungsten grid. By adding rare earth tantalate RETaO4 as a nucleating agent, the strength and hardness of the tungsten grid are improved, and it is more durable. In addition, the use of double-layer glow plasma surface alloying technology can further improve its performance, making it more corrosion resistant and wear resistant. The tungsten grid sample prepared by the tungsten composite powder formula and surface modification of the application can effectively improve the tensile properties and elongation, and can improve its toughness and high temperature resistance. The toughness is increased by about three times, and the specific wear rate is reduced by one unit.

The application discloses a high-temperature-resistant multi-medium-corrosion-resistant thermal / environmental barrier coating and a preparation method and application thereof. The coating has a four-layer structure, and sequentially comprises, from a substrate, a Si-Hf composite bonding layer, a double ytterbium silicate layer, a single ytterbium silicate layer and a high-entropy hafnate top layer. The bonding layer is prepared by a double-glow plasma metallurgy technology, has a continuous gradient structure, realizes good combination with a ceramic matrix composite substrate and thermal expansion matching, the double ytterbium silicate layer, the single ytterbium silicate layer and the high-entropy hafnate top layer are prepared by a plasma spraying-physical vapor deposition technology, and low porosity, high bonding strength and excellent phase stability of each layer are ensured. The coating can resist CMAS+NaVO3+H2O+O2 multi-medium corrosion for more than 100 hours in a high-temperature environment of 1600 DEG C. Through material composition design and multi-layer structure design, and in combination with a special preparation method, the service life of the coating under high-temperature multi-medium corrosion conditions is remarkably improved, and the coating has a good application prospect.