27 results about "Glow plasma" patented technology

The invention discloses a medium-entropy (Zr, Ta, W) C coating and a preparation method and application thereof. The medium-entropy (Zr, Ta, W) C gradient coating is prepared on the surface of the titanium alloy or the iron-based alloy through the double-layer glow plasma surface metallurgy technology, and gradient temperature annealing treatment is conducted. The preparation method has the specific advantages that (1) the prepared coating is of a continuous gradient structure, good interface metallurgical bonding is formed between the coating and a matrix, the bonding force of the coating is not lower than 50 N, and the coating is not prone to cracking and stripping in the service process due to the high bonding strength; and (2) the hardness of the medium-entropy (Zr, Ta, W) C coating prepared by the method is 25-30 GPa, the fracture toughness is 4.0-5.0 MPa * m < 1 / 2 >, and the coating system has balanced hardness and toughness, so that the coating is endowed with excellent wear resistance. The prepared coating has excellent wear resistance and antifriction performance, and has wide application prospects in the field of wear-resistant protective coatings.

The invention discloses a preparation method of a molten salt corrosion resistant coating on the surface of a TiAl alloy, relates to the technical field of surface treatment, and aims to solve the technical problems of low binding force between an existing TiAl alloy matrix and a coating interface and poor corrosion resistance of the coating. The preparation method of the molten salt corrosion resistant coating on the surface of the TiAl alloy comprises the steps that a Zr-Y alloy is infiltrated on the surface of the TiAl alloy through a double glow plasma method, and a Zr-Y infiltrated layer is formed on the surface of the TiAl alloy; the TiAl alloy is subjected to heat preservation for 1-5 hours under the condition that the temperature ranges from 850 DEG C to 900 DEG C; a Zr-Cr-Y alloy is infiltrated on the surface of the TiAl alloy, and a Zr-Y / Zr-Cr-Y infiltrated layer is formed on the surface of the TiAl alloy; the TiAl alloy is subjected to heat preservation for 2-3 hours under the condition that the temperature ranges from 900 DEG C to 950 DEG C, and is oxidized under the condition that the temperature ranges from 860 DEG C to 920 DEG C;

Cathode based on glow discharge and hollow cathode effect belongs to the technical field of space electric propulsion electron source, and aims to solve the problems of high failure risk of heater and difficulty in working in oxygen environment of traditional hollow cathode.The cathode comprises a gas supply pipe, a negative electrode, a contact electrode and an extraction electrode; the contact electrode is sleeved outside the discharge chamber from the top end of the negative electrode, and the extraction electrode is sleeved outside the contact electrode from the top end; the bottom plate of the negative electrode is provided with an air inlet hole in the center and is communicated with the gas supply pipe; the top cover of the contact electrode is provided with a throttle hole in the center for maintaining the air pressure of the discharge chamber; the top cover of the extraction electrode is provided with an extraction hole; a discharge power source is loaded between the negative electrode and the contact electrode, which is used for carrying out glow discharge on the gas working medium entering the discharge chamber to generate plasma; the glow plasma generates hollow cathode effect in the cylindrical negative electrode; an extraction power source is loaded between the contact electrode and the extraction electrode, which is used for making electrons pass through the throttle hole and the extraction hole in sequence and spray to form electron emission.

The application discloses a kind of TC4 alloy surface wear-resistant CrZrN solid solution ceramic coating and preparation method thereof, belong to TC4 alloy surface treatment field, the coating is prepared CrZrN ceramic coating using double-glow plasma surface metallurgy technology for TC4 alloy surface, the coating includes deposition layer and diffusion layer, Cr, Zr, N, Ti content in diffusion layer gradient change, alleviate the failure of coating caused by composition mutation and property difference;Compared with CrN binary coating, the CrZrN ceramic coating prepared by the application has the advantages of realizing solid solution strengthening, refining the grain and realizing metallurgical bonding between the coating and the substrate, which can effectively improve the service life of TC4 alloy substrate and can be applied to wear-resistant parts protection in the fields of aviation industry and shipbuilding industry.

The present invention discloses a method for preparing a corrosion-resistant steel strip, comprising the following steps: (1) ball-milling niobium carbide powder, sieving the sieved powder, degreasing the sieved powder, and immersing the sieved powder in a chemical plating solution to obtain a plating powder; (2) subjecting the plating powder to a plasma glow nitriding furnace for glow plasma treatment to obtain a plasma-treated powder; (3) uniformly mixing carbon steel powder, Fe-Cr alloy powder, Fe-Mo alloy powder, Fe-Si alloy powder, and Fe-Al alloy powder to obtain a mixed alloy powder, melting the mixed powder into a melt, stirring, desulfurizing, deoxidizing, and skimming the slag, then adding the plasma-treated powder, stirring, and immediately pouring the mixture into a mold for casting to obtain a cast plate; and (4) performing a constant temperature homogenization treatment, rough rolling, and finish rolling to obtain a corrosion-resistant steel strip. The steel strip prepared by the method of the present invention has good mechanical strength and corrosion resistance, is suitable for working in an environment with a certain corrosive medium or an environment with high stress requirements, improves the durability of steel components, and reduces maintenance costs.

The invention discloses a double glow plasma low-temperature carbonitriding method for a titanium alloy screw, and relates to the technical field of metal material surface treatment.The key point of the technical scheme is that a safety protection method specifically comprises the following steps that S1, screw surface cleaning is conducted, specifically, oil stains, particle impurities and oxide layers on the surfaces of the titanium alloy screw and a graphite barrel are cleaned; the cleaned screws and graphite barrels are placed in a furnace; after the air in the furnace body is removed, argon and nitrogen are introduced into the furnace until the air pressure in the furnace reaches a set value, and H2 is added to adjust the atmosphere activity; s2, pre-bombardment treatment is conducted, specifically, voltage is applied to the screws and the graphite barrel, and adsorbed impurities and oxide skin on the surfaces are cleaned; and S3, composite layer diffusion is conducted, through the titanium alloy screw double glow plasma low-temperature carbonitriding method, a Ti (C, N) diffusion layer of 10 micrometers and a TiN hardened layer of 5 micrometers are formed on the surface of a titanium alloy screw base body, the total alloy layer thickness is 15 micrometers, and the performance of the titanium alloy screw is improved.

The application belongs to the technical field of alloy surface coating preparation, and particularly relates to a nickel-based alloy surface NiCoCr medium-entropy alloy coating and a preparation method thereof. The method comprises the following steps: firstly, pretreating the nickel-based alloy surface; and then, performing double-glow plasma surface NiCoCr alloying treatment on the nickel-based alloy surface to obtain a NiCoCr medium-entropy alloy layer coating. The NiCoCr medium-entropy alloy coating has uniform internal organization and composition, a compact structure, and a metallurgical bond with the nickel-based high-temperature alloy substrate, and mutual diffusion exists at the interface between the coating and the substrate. The thickness of the coating is 30-70 microns, the coating has a compact structure, the configuration entropy is 8.314-12.471 Jmol ‑1 K ‑1 , and the coating can serve for 100 hours at a high-temperature environment of 1000 DEG C without peeling.

The invention discloses a method for preparing a porous coating on the surface of titanium alloy, and belongs to the field of material coatings. According to the method, a double glow plasma surface alloying device is adopted, one or more refractory metal elements serve as target materials, inert gas serves as protective gas, titanium alloy serves as a workpiece, an alloy layer with a certain thickness is prepared on the surface of the titanium alloy at first, then negative electrode voltage and source electrode voltage are adjusted, and therefore reverse sputtering of plasma is achieved; the surface of a workpiece containing an alloy layer is bombarded and sputtered by inert gas ions and alloying elements sputtered by a target material, and meanwhile, formation of a porous structure is induced by utilizing different diffusion rates of atoms moving inside and outside an interface in a Kirkendall effect, so that a uniform porous morphology is formed on the surface of the workpiece containing the alloy layer, and the surface of the workpiece containing the alloy layer is formed. And the titanium alloy is endowed with double properties of function and structure. The porous alloy layer prepared through the method is metallurgically bonded with the base body, and the porous alloy layer has good mechanical performance.

The utility model discloses a composite current collector, a pole piece and a battery. The composite current collector provided by the utility model comprises a base material layer, a first metal coating and a metal cementation layer, the first metal coating is arranged on at least one side surface of the base material layer; the metal cementation layer is arranged on the surface of the side, away from the base material layer, of the first metal coating; wherein the cementation metallization layer comprises a permeation part extending towards the base material layer, and the permeation part penetrates through the first metal plating layer and is embedded into the base material layer. According to the composite current collector, the conductive layer is thickened to improve the conductivity, and meanwhile, permeation connection of the base material layer is realized through a double glow plasma permeation metallization process, so that the binding force between the base material layer and the metal conductive layer is effectively improved, the use performance of a product is improved, and the service life of the product is prolonged.

The application discloses a tubular object inner wall double-glow plasma processing device, which comprises an electrode rod and a bottom disc; the bottom disc is connected with a target material tray through a first ceramic support, and the bottom disc is connected with a workpiece tray through a second ceramic support; the target material tray is provided with a target material one and a target material two, and the target material one and the target material two are in a disc shape; a hole with the same inner diameter as the workpiece is reserved on the workpiece tray, and a hollow heat preservation cover is further arranged on the workpiece tray; the workpiece is arranged at the middle position of the target material one and the target material two, and the center lines of the target material one, the target material two, the workpiece and the hollow heat preservation cover are coincident; the target material tray is connected with an electrode rod one, and the workpiece tray is connected with an electrode rod two. The application further discloses a processing method of the tubular object inner wall double-glow plasma processing device. The outer walls of the two metal target materials and the inner wall of the tubular object are at equal intervals and are located on the upper and lower sides of the tubular object, the film layer is uniform and dense, no hole and crack appear, the film layer is combined with the base body in a metallurgical way, and the service life is improved.

The present invention belongs to the technical field of corrosion-resistant coatings, and specifically relates to a Cr2N corrosion-resistant coating for the inner wall of a carbon steel storage tank and a preparation method thereof. The preparation method comprises the following steps: first, irradiating the steel with an argon ion radiation source, with the target chamber in a vacuum state during the irradiation process; then, subjecting the inner wall of the carbon steel storage tank to a double glow plasma chromium alloying treatment; and then subjecting the Cr alloy layer to an active screen ion nitriding treatment to prepare the Cr2N coating. The Cr2N coating prepared by this method exhibits a gradient distribution of internal microstructure components, with the Cr and N content gradually decreasing from the surface to the interior. The Cr2N coating is metallurgically bonded to the inner wall of the carbon steel storage tank, and interdiffusion occurs at the interface between the coating and the substrate, resulting in a dense coating structure that is resistant to corrosion from high and medium concentrations of sulfuric acid.

The invention discloses a corrosion and wear resistant high-entropy alloy coating and a preparation method thereof, the high-entropy alloy coating is arranged on the surface of a matrix, and a Cr diffusion layer, a TiVCr medium-entropy alloy intermediate layer, a TiVCrZrNb high-entropy alloy diffusion layer and a TiVCrZrNb high-entropy alloy deposition layer are sequentially arranged on the surface of the matrix. The preparation method comprises the following steps that in a vacuum environment, the Cr diffusion layer and the TiVCr medium-entropy alloy middle layer are sequentially prepared on the surface of a pretreated base body through a magnetron sputtering method; and a TiVCrZrNb high-entropy alloy diffusion layer and a TiVCrZrNb high-entropy alloy deposition layer are sequentially prepared on the surface of the TiVCr medium-entropy alloy intermediate layer through a double glow plasma surface metallurgy method. The obtained high-entropy alloy coating is good in corrosion resistance and good in wear resistance; and the interface bonding strength between the coatings and between the coating and the matrix is obviously enhanced, and the overall stability of the coating system is greatly improved.

The application provides a thermal barrier composite coating with a gradient structure, comprising a substrate and a composite coating arranged on the substrate, wherein the composite coating comprises a bonding layer arranged on the substrate and an oxygen barrier layer arranged on the bonding layer; the bonding layer is made of a NiCrAlTiHfSi coating layer; the oxygen barrier layer has a continuous gradient structure; the oxygen barrier layer is made of a Si-HfO2 coating layer; the Si-HfO2 coating layer comprises 20%-80% of Si and 20%-80% of HfO2; and along the vertical direction of the Si-HfO2 coating layer close to the bonding layer, the content of HfO2 gradually decreases. The NiCrAlTiHfSi metal bonding layer and the Si-HfO2 oxygen barrier layer are prepared by a double-layer glow plasma surface metallurgy process, the working temperature is higher than 1250 DEG C, the prepared impregnation layer is dense and uniform, has a continuous gradient structure, and the atomic combination between the bonding layer and the oxygen barrier layer forms a gradient metallurgical interface, the prepared oxygen barrier layer has good bonding strength with the bonding layer, the stress concentration in the mechanical stress or the thermal cycle process is reduced, and the safety and service life are improved.

The application provides a method for improving the performance of laser selective melting forming pure tungsten grid. By adding rare earth tantalate RETaO4 as a nucleating agent, the strength and hardness of the tungsten grid are improved, and it is more durable. In addition, the use of double-layer glow plasma surface alloying technology can further improve its performance, making it more corrosion resistant and wear resistant. The tungsten grid sample prepared by the tungsten composite powder formula and surface modification of the application can effectively improve the tensile properties and elongation, and can improve its toughness and high temperature resistance. The toughness is increased by about three times, and the specific wear rate is reduced by one unit.

The application discloses a high-temperature-resistant multi-medium-corrosion-resistant thermal / environmental barrier coating and a preparation method and application thereof. The coating has a four-layer structure, and sequentially comprises, from a substrate, a Si-Hf composite bonding layer, a double ytterbium silicate layer, a single ytterbium silicate layer and a high-entropy hafnate top layer. The bonding layer is prepared by a double-glow plasma metallurgy technology, has a continuous gradient structure, realizes good combination with a ceramic matrix composite substrate and thermal expansion matching, the double ytterbium silicate layer, the single ytterbium silicate layer and the high-entropy hafnate top layer are prepared by a plasma spraying-physical vapor deposition technology, and low porosity, high bonding strength and excellent phase stability of each layer are ensured. The coating can resist CMAS+NaVO3+H2O+O2 multi-medium corrosion for more than 100 hours in a high-temperature environment of 1600 DEG C. Through material composition design and multi-layer structure design, and in combination with a special preparation method, the service life of the coating under high-temperature multi-medium corrosion conditions is remarkably improved, and the coating has a good application prospect.

The invention provides graphene powder and a preparation method and application thereof.The preparation method of the graphene powder comprises the steps that in a high-vacuum-degree state, inert gas serves as background gas in a microwave plasma device, and uniform and stable glow plasmas are spontaneously generated under the action of microwaves; increasing the flow of the inert gas and increasing the system pressure to a low vacuum degree state, so that the glow plasma is converted into a state in which the glow plasma and an electric arc coexist; saturated steam of a liquid carbon source is brought into a reaction cavity of a microwave plasma device through negative pressure of a system, carbon source molecules are cracked under the impact of high-energy particles under the action of glow plasmas and electric arcs, and cracked activated carbon components are nucleated and grow to obtain graphene powder. According to the method, the graphene powder is prepared by adopting a microwave plasma technology, and the nanoscale graphene powder with excellent dispersity can be continuously and efficiently prepared.

The present invention discloses a method for alloying and preparing a coating on the surface of pure magnesium, comprising the following steps: (1) alloying the surface of pure magnesium: using dual-glow plasma alloying technology, the heat-insulating cover used is a pure zinc plate, connected to the cathode stage, the heat-insulating cover is connected to the target zinc sheet, the pure magnesium is connected to another cathode electrode as a substrate, and the cavity is grounded as an anode; (2) preparing a composite coating: using magnetron sputtering technology to plate the zinc-alloyed pure magnesium, using one or both of high-purity metal oxides or precious metals as targets. The present invention uses dual-glow plasma surface alloying to prepare a pure magnesium surface alloy layer, which serves as a transition layer, and then uses magnetron sputtering to prepare a functional coating on the transition layer. The method used is safe and pollution-free, and the resulting coating has uniform composition, low porosity, a large deposition area, strong bonding with the substrate, and easy control of the thickness and composition of the coating.

According to the thin-wall special-shaped metal sealing ring surface toughening CoMoCrSi coating, a double-layer glow plasma surface metallurgy technology is utilized, a CoMoCrSi alloy serves as a target material, a nickel-based high-temperature alloy thin-wall special-shaped metal sealing ring serves as a workpiece, and the thin-wall special-shaped metal sealing ring surface toughening CoMoCrSi coating is obtained through three steps. The method comprises the following steps: 1, regulating and controlling surface micro-area plastic deformation of a metal sealing ring by controlling current density, and realizing gradient change of roughness from a boundary to a center by virtue of an edge effect; secondly, remelting of the protruding position of the plastic deformation area is caused through the hollow cathode effect, target material element diffusion is accelerated, and interface mechanical-metallurgical bonding is achieved; and thirdly, the surface toughening CoMoCrSi coating with the gradient structure is formed through deposition. The mechanical occlusion depth between the coating and a workpiece is 2-6 microns, the thickness of a deposition layer is 10-30 microns, the thickness of a metallurgical diffusion layer is 1-5 microns, and the coating is high in toughness, simple and convenient in process, high in production efficiency, low in cost and suitable for batch processing.

An electrostatic field dust removal device, which relates to a technical field of electrostatic precipitation, includes: at least one negative electrode plate for releasing negative charges; and at least one positive electrode plate, which is alternately arranged in parallel with the at least one negative electrode plate, for receiving the negative charges released by the at least one negative electrode plate; wherein an electrostatic dust removal region and a glow plasma region are formed between each negative electrode plate of the at least one negative electrode plate and each positive electrode plate of the at least one positive electrode plate; and waste gas flows between each negative electrode plate and each positive electrode plate and is alternately purified, wherein it is purified by corona in the electrostatic dust removal region and ionized in the glow plasma region.

This invention discloses a method for physical vapor deposition of a ceramic coating on the surface of an extrusion die working belt, belonging to the technical field of coating on the surface of extrusion die working belts. The method includes the following steps: surface pretreatment of the extrusion die working belt, including cleaning and degreasing, polishing, and activation treatment; the activation treatment refers to sequentially performing acid washing, primary salt washing, water washing, glow discharge plasma treatment, secondary salt washing, and water washing on the surface of the extrusion die working belt using an activation treatment solution; preparing a ceramic coating material by depositing the ceramic coating material on the surface of the extrusion die working belt using physical vapor deposition equipment to form a ceramic coating with a thickness of 4 micrometers to 6 micrometers; and post-treatment of the extrusion die working belt surface. The ceramic coating of this invention has high hardness, strong bonding strength with the die surface, excellent impact resistance, and is less prone to cracking, peeling, or even breakage.

The invention discloses a deep purification method of graphite, which comprises the following steps: placing graphite in a double glow plasma metallurgical furnace, and vacuumizing; argon or argon and nitrogen are introduced, and the vacuum pressure is maintained to be 20-100 Pa; and starting a double glow plasma bias power supply, heating the graphite to 2800 DEG C or above, preserving heat, and removing impurities through high-temperature physical gasification to achieve the required purity. According to the double glow plasma metallurgy method, graphite is deeply purified, a double glow plasma metallurgy furnace adopts ultra-pure graphite or a C / C composite material as a source electrode, a workpiece electrode and an energy gathering ring, the graphite can be heated to 2800 DEG C or above through the discharge effect of a hollow cathode and the heat preservation and constraint effect of the energy gathering ring, heat preservation is conducted for a long enough time, and the graphite can be further purified. Hydrogen and halogen alkane gas are not adopted, impurities are removed only through a high-temperature physical gasification method, deep purification of graphite is achieved, the requirements for third-generation semiconductor preparation and the like are met, equipment is simple, tail gas does not need to be treated, and safety and environment friendliness are achieved.

An electrostatic field dust removal device, comprising: at least one negative electrode plate (10) for releasing negative charges; at least one positive electrode plate (20) alternately arranged in parallel with the at least one negative electrode plate (10) and used for receiving the negative charges released by the at least one negative electrode plate (10), wherein an electrostatic dust removal region and a glow plasma region are formed between each negative electrode plate (11) among the at least one negative electrode plate (10) and each positive electrode plate (21) among the at least one positive electrode plate (20); and exhaust gas flows between each negative electrode plate (11) and each positive electrode plate (21) and is alternately purified, wherein the exhaust gas undergoes corona-based purification in the electrostatic dust removal region and is ionized in the glow plasma region.

The application discloses a method for preparing high-strength oxygen-free copper rods, and steps of the method comprise the following steps: (1) screening copper-chromium intermediate alloy powder and copper-cerium intermediate alloy powder, mixing, cleaning and degreasing, alkali washing, and obtaining cleaned powder; (2) pickling the cleaned powder, activating, and chemically plating phosphorus-nickel to obtain composite powder coated with phosphorus-nickel; (3) carrying out glow plasma heat preservation and pressure preservation treatment on the composite powder coated with phosphorus-nickel to obtain additive powder; (4) melting cathode copper blocks, adding the additive powder after melting, carrying out electromagnetic stirring, casting into ingots, and covering graphite scales after casting to cool; and (5) carrying out homogenizing annealing treatment on the cooled ingots to obtain the high-strength oxygen-free copper rods. The oxygen-free copper rods prepared by the method have good strength, i.e., high tensile strength, and can better adapt to the requirements of modern industry on the mechanical properties of high-quality copper materials.

The present invention belongs to the technical field of back-contact cells, specifically relating to a back-contact cell with resistance to the LID effect and a method for preparing the same. The method comprises: forming a velvet surface on the light-receiving surface of a silicon wafer and a second semiconductor opening region; then sequentially forming a passivation layer and an anti-reflection layer on the light-receiving surface of the silicon wafer, the passivation layer comprising a dense oxide layer and a phosphorus-doped and oxygen-doped amorphous silicon layer formed in sequence; wherein the dense oxide layer is formed by first oxidizing the layer with an ozone flow gradient, followed by a hydrogen plasma treatment; and the phosphorus-doped and oxygen-doped amorphous silicon layer is formed by continuously coating the layer with at least one gradient variation in the gas in the continuous presence of a glow plasma, wherein the at least one gradient variation in the gas causes the phosphorus doping concentration in the phosphorus-doped and oxygen-doped amorphous silicon layer to gradually increase from the inside out. The present invention can enhance the cell's resistance to LID attenuation while effectively improving the overall passivation level and cell efficiency.

The application discloses a coating preparation method for enhancing the interface bonding force of nickel / nickel-based superalloy, adopts double-layer glow plasma surface metallurgy technology, takes pure nickel as a target material, controls the surface temperature of the nickel-based superalloy workpiece and grows the coating through two-step regulation, the first step is to form the Ni-Fe-Cr interdiffusion layer interface with the micron-sized pinning structure, and the second step is to form the nickel deposition layer with the columnar crystal structure, so that the coating with high interface bonding strength is obtained. The application utilizes the high interface compatibility of the nickel layer and the nickel-based superalloy, the coating structure is composed of the interface pinning and the columnar crystal of the pure nickel layer, the single interface pin size is 20-50 microns and is embedded into the base material, the pure nickel layer is the columnar crystal structure, and the bonding strength of the coating and the base interface is improved. In the 800 DEG C thermal shock experiment, the thermal shock resistance times of the coating are greater than 200 times, the coating bonding force is higher than 70 N through the scratch test, and the mechanical properties are excellent.

The present application belongs to the field of electrochemistry, and particularly relates to a titanium-based metal oxide electrode containing a double-layer glow plasma tantalum permeation gradient intermediate layer and a preparation method thereof. The main structure of the electrode comprises a titanium base at the bottom, a mixed metal oxide electrocatalytic layer on the surface, and a double-layer glow plasma tantalum permeation gradient intermediate layer between the two. The electrode preparation method is to prepare a tantalum permeation gradient alloy layer on the surface of a pretreated titanium base by a double-layer glow plasma alloying method, and then prepare a mixed metal oxide electrocatalytic coating on the tantalum permeation intermediate layer by a thermal decomposition method. The tantalum permeation gradient intermediate layer not only has good conductivity and adhesion, but also can significantly enhance the corrosion resistance and stability of the electrode, effectively prevent the passivation of the titanium base, so that the electrode can still have a long service life under a large current density and a strong oxygen evolution environment, meet the needs of engineering, and have a wide application prospect.

The present invention belongs to the technical field of back contact cells, and specifically relates to a low UVID back contact cell, a preparation method thereof, and an application thereof, comprising: SO2, sequentially depositing a phosphorus-free oxygen-doped silicon layer and a phosphorus-doped oxygen-doped silicon layer on the light-receiving surface of a silicon wafer; wherein the phosphorus-free oxygen-doped silicon layer and the phosphorus-doped oxygen-doped silicon layer are deposited by continuous coating using tubular PECVD in the presence of a continuous glow plasma, and satisfying the following conditions: H0>H1, W0 <W1,C1≤(3D0×10 19 ) / D1, D0 is 1-5nm, and D1 is 1-5nm; S03, depositing an anti-reflection layer; S04, then performing annealing; S05, then forming a second semiconductor layer on the backlight side. This invention eliminates the need for pre-depositing silicon oxide on the light-receiving surface for the passivation layer, and eliminates the need to dope hydrogen into the anti-reflection layer, thereby ensuring a high passivation level and reducing UVID attenuation.