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Apparatus for generating atmosphere pressure microwave glow plasma

A plasma and atmospheric pressure technology, applied in the direction of plasma, electrical components, discharge tubes, etc., can solve the problems of high maintenance costs, unfavorable continuous production, etc., and achieve the effects of high energy density, high active particle concentration, and high efficiency

Inactive Publication Date: 2009-03-25
WUHAN INSTITUTE OF TECHNOLOGY
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Low-pressure plasma has disadvantages such as high maintenance costs and unfavorable continuous production in industrial applications. Therefore, the excitation of plasma under atmospheric pressure and its application in industry is the key to the wider industrial application of plasma.
At present, the plasma generated by microwaves under atmospheric pressure mainly includes plasma jets and torches, and there are few research reports on the generation of uniform glow.

Method used

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  • Apparatus for generating atmosphere pressure microwave glow plasma

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Embodiment Construction

[0013] The present invention will be further described below in conjunction with the embodiments and accompanying drawings, but it cannot be regarded as a limitation of the present invention.

[0014] As shown in Figure 1, a device for generating atmospheric pressure microwave glow plasma includes a plasma reactor 3, a microwave control and monitoring system 2, and a microwave source 1, and the microwave source 1 is connected to the microwave control and monitoring system through a flange A microwave quartz window is also provided between the microwave control and monitoring system and the plasma reactor, and a short-circuit piston 8 is provided at the left end of the plasma reactor. The plasma reactor 3 is composed of a rectangular waveguide, a rod-shaped electrode 6 , plate electrode 11, short-circuit piston 8, quartz tube 4, water cooling jacket, upper flange 5, and lower flange 7. A through hole with a diameter of 40-60mm is opened on the wide side of the rectangular wavegu...

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Abstract

The invention relates to a device for generating atmospheric pressure microwave glow plasma. The device comprises a plasma reactor, a microwave regulating and monitoring system and a microwave source. The microwave source is connected with the left end of the microwave regulating and monitoring system through a coupling flange. The plasma reactor consists of a rectangular waveguide, a bar-shaped electrode, a flat electrode, a short-circuiting piston, a silica tube, a water-cooled jacket, an upper flange and a lower flange. Through holes are formed on the parts of the wide edges of the rectangular waveguide; the silica tube is installed on the rectangular waveguide by passing through the through holes; the water-cooled jacket is installed on the outer side of the silica tube; the silica tube is hermetically connected with the upper flange and the lower flange to form a working chamber; the bar-shaped electrode is hermetically connected with the upper flange through threads; the flat electrode is hermetically connected with the lower flange through threads; and the short-circuiting piston is arranged on the end part of the left side of the plasma reactor. The device can operate the microwave glow plasma at atmospheric pressure, thereby facilitating continuous production. The produced plasma has higher energy density, active particle concentration and efficiency.

Description

technical field [0001] The invention relates to the generation of plasma source under atmospheric pressure, in particular to a device for generating atmospheric pressure microwave glow plasma. Background technique [0002] As the fourth state of matter, plasma has higher temperature and energy density, and contains a large number of active components, thereby inducing physical changes and chemical reactions that cannot or are difficult to achieve in conventional chemical reactions. In addition, plasma engineering can provide more advantageous industrial processing methods, including the ability to achieve industrially relevant results more efficiently and cheaper, achieve the same purpose without generating large quantities of unwanted by-products and waste materials, and generate less pollution and toxicity. The same purpose is achieved in the case of waste. Therefore, plasma technology has a wide range of applications in industry, including microelectronic etching process...

Claims

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Application Information

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IPC IPC(8): H05H1/46H01J37/32
Inventor 马志斌汪建华张磊吴振辉吴利峰
Owner WUHAN INSTITUTE OF TECHNOLOGY
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